Crystalline multilayer oxide thin films structure in semiconductor device
First Claim
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1. A corundum-structured crystalline oxide film comprising:
- metal elements that contain gallium (Ga),in which the corundum-structured crystalline oxide film has a thickness of 1 μ
m or more and an electrical resistivity of 80 mΩ
cm or less, andin which the corundum-structured crystalline oxide film has an atomic ratio of gallium (Ga) to all of the metal elements comprised in the corundum-structured crystalline oxide film to be 0.5 or more.
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Abstract
Provided is a highly conductive crystalline multilayer structure including a corundum-structured crystalline oxide thin film whose resistance has not increased even after annealing (heating). The crystalline multilayer structure includes a base substrate and the corundum-structured crystalline oxide thin film disposed directly on the base substrate or with another layer therebetween. The crystalline oxide thin film is 1 μm or more in a thickness and 80 mΩcm or less in an electrical resistivity. A semiconductor device includes the crystalline multilayer structure.
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Citations
15 Claims
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1. A corundum-structured crystalline oxide film comprising:
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metal elements that contain gallium (Ga), in which the corundum-structured crystalline oxide film has a thickness of 1 μ
m or more and an electrical resistivity of 80 mΩ
cm or less, andin which the corundum-structured crystalline oxide film has an atomic ratio of gallium (Ga) to all of the metal elements comprised in the corundum-structured crystalline oxide film to be 0.5 or more. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A semiconductor device comprising:
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a corundum-structured crystalline oxide film comprising metal elements that contain gallium (Ga), in which the corundum-structured crystalline oxide film has a thickness of 1 μ
m or more and an electrical resistivity of 80 mΩ
cm or less, andin which the corundum-structured crystalline oxide film has an atomic ratio of gallium (Ga) to all of the metal elements comprised in the corundum-structured crystalline oxide film to be 0.5 or more. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15)
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Specification