Radially tensioned wound or skin treatment devices and methods

• US 10,213,350 B2
• Filed: 03/07/2013
• Issued: 02/26/2019
• Est. Priority Date: 02/08/2012
• Status: Active Grant

• Current Assignee: Neodyne Biosciences, Inc.
• Original Assignee: Neodyne Biosciences, Inc.
• Inventors: Jackson, Jasper, Beasley, William R., Zepeda, John A., Caligaris, Richard T.
• Primary Examiner(s): Rodriquez, Kari
• Assistant Examiner(s): Nguyen, Camtu
• Application Number:
  US13/789,512
• Publication Number:
  US 20140228731A1
• Time in Patent Office: 2,182 Days
• Field of Search: 606201, 606213-216
• CPC Class Codes: A61F 13/01038 Flexibility, stretchability or elasticity
• CPC Class Codes: A61F 15/005 Bandage applicators

Abstract

Devices, kits and methods described herein may be for treatment to skin, including but not limited to wound healing, the treatment, amelioration, and/or prevention of scars or keloids. An applicator and/or tensioning device may be used to apply a dressing to a subject. The applicator and/or tensioning device applies and/or maintains a strain in an elastic dressing, wherein at least some of the strain is out-of-plane or at a non-orthogonal, non-parallel and non-aligned orientation to other strains in the dressing.

Claims

1. A dressing system, comprising:

a dressing comprising a first edge and a second edge, wherein the second edge has an orientation that is non-parallel and non-orthogonal to the first edge when the dressing is in an unstrained state, and a first face comprising an adhesive;

a frame removably attached to the first edge and the second edge of the dressing, the frame comprising an outer edge, an inner edge, and an opening surrounded by the inner edge wherein the dressing is releasably attached to the frame by an attachment structure and is positioned over the opening; and

a straining structure configured to be pushed through the opening to apply a straining force to a central region of the dressing that radiates from the central region orthogonally to the first edge of the dressing and to the second edge of the dressing by displacing the central region of the dressing by a predetermined distance from the opening.

2. The dressing system of claim 1 wherein the dressing is circular or oval.

3. The dressing system of claim 1 wherein the first edge comprises an arcuate edge with a first radius of curvature.

4. The dressing system of claim 3 wherein the second edge comprises an arcuate edge with a second radius of curvature wherein the second radius of curvature is different from the first radius of curvature.

5. The dressing of claim 1 wherein the straining structure is configured to apply uniform straining forces that are orthogonal to the first and second edges of the dressing.

6. The dressing of claim 1 wherein the straining force radiating orthogonally to the first edge of the dressing is higher than the straining force radiating to the second edge of the dressing.

7. The dressing system of claim 1, wherein the attachment structure comprises a release region configured to separate the dressing from the frame.

8. The dressing system of claim 7, wherein the release region comprises at least one of a scored region, a perforated region, or comprises a pull line.

9. The dressing system of claim 1 wherein the frame is configured to be adhered to the straining structure.

10. The dressing system of claim 1 wherein the straining structure comprises a base and raised protrusion.

11. The dressing system of claim 1 wherein the frame forms a mechanical interfit with the straining structure.

12. The dressing system of claim 1, wherein the frame is coupled to a second face of the dressing opposite the first face and wherein the straining structure comprises a distal face configured to push against the second face of the dressing.

13. The dressing system of claim 12, wherein the distal face of the straining structure comprises a shape that is similar to at least one of the dressing, the opening of the frame, a base of the straining structure or a shape of a side wall at an intersection with the base.