Temperable three layer antireflective coating, coated article including temperable three layer antireflective coating, and/or method of making the same
First Claim
1. A coated article comprising an antireflective coating supported by a first major surface of a substrate, wherein the antireflective coating comprises, in order moving away from the substrate:
- a silicon-inclusive medium index layer disposed, directly or indirectly, on the first major surface of the substrate;
a high index layer disposed over and contacting the medium index layer, the high index layer having a thickness of at least 85 nm;
a low index layer disposed over and contacting the high index layer;
wherein the medium index layer comprises silicon oxynitride and has an index of refraction of from about 1.65 to 2.0 at 380 nm, 550 nm, and 780 nm wavelengths, the high index layer has an index of refraction of at least about 2.0 at 380 nm, 550 nm, and 780 nm wavelengths, and the low index layer has an index of refraction of from about 1.4 to 1.6 at 380 nm, 550 nm, and 780 nm wavelengths.
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Abstract
A coated article includes a temperable antireflection (AR) coating that utilizes medium and low index (index of refraction “n”) layers having compressive residual stress in the AR coating. In certain example embodiments, the coating may include the following layers from the glass substrate outwardly: silicon oxynitride (SiOxNy) medium index layer/high index layer/low index layer. In certain example embodiments, depending on the chemical and optical properties of the high index layer and the substrate, the medium and low index layers of the AR coating are selected to cause a net compressive residual stress and thus optimize the overall performance of the antireflection coating when the coated article is tempered and/or heat-treated.
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Citations
3 Claims
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1. A coated article comprising an antireflective coating supported by a first major surface of a substrate, wherein the antireflective coating comprises, in order moving away from the substrate:
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a silicon-inclusive medium index layer disposed, directly or indirectly, on the first major surface of the substrate; a high index layer disposed over and contacting the medium index layer, the high index layer having a thickness of at least 85 nm; a low index layer disposed over and contacting the high index layer; wherein the medium index layer comprises silicon oxynitride and has an index of refraction of from about 1.65 to 2.0 at 380 nm, 550 nm, and 780 nm wavelengths, the high index layer has an index of refraction of at least about 2.0 at 380 nm, 550 nm, and 780 nm wavelengths, and the low index layer has an index of refraction of from about 1.4 to 1.6 at 380 nm, 550 nm, and 780 nm wavelengths. - View Dependent Claims (2, 3)
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Specification