Plasma processing system with direct outlet toroidal plasma source
First Claim
1. A plasma processing system, comprising:
- a process chamber that includes a wafer pedestal, wherein the process chamber extends upwards at least from the wafer pedestal to a plane that is horizontal and above a top surface of the wafer pedestal; and
a plasma source, comprising an induction coil, a magnetic core element and a plasma generation block that defines a toroidal plasma cavity, wherein;
in operation, the plasma source generates a plasma in the plasma cavity;
the plasma generation block and the plasma cavity are substantially radially symmetric about a toroidal axis that defines an axial direction and a radial direction;
the plasma generation block defines a plurality of outlet apertures on a first axial side of the plasma cavity, wherein plasma products produced by the plasma pass in the axial direction, through the plurality of outlet apertures, from the plasma cavity, through the plane and into the process chamber;
the induction coil winds at least partially about the magnetic core element, andthe magnetic core element is disposed adjacent to the plasma generation block, and extends from a first end that is at or above the plane, on a radially outward side of the plasma generation block, passes above the plasma generation block on a second axial side of the plasma cavity that is axially opposite to the first axial side, and to a second end that is at or above the plane, on a radially inward side of the plasma generation block, but does not extend below the plane;
such that during operation, a current in the induction coil induces a magnetic flux in the magnetic core element, and the magnetic flux in the magnetic core element induces an azimuthal electric current within the plasma cavity, to generate the plasma.
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Abstract
A plasma processing system includes a process chamber and a plasma source that generates a plasma in a plasma cavity. The plasma cavity is substantially symmetric about a toroidal axis. The plasma source defines a plurality of outlet apertures on a first axial side of the plasma cavity Plasma products produced by the plasma pass in the axial direction, through the plurality of outlet apertures, from the plasma cavity toward the process chamber. A method of plasma processing includes generating a plasma within a substantially toroidal plasma cavity that defines a toroidal axis, to form plasma products, and distributing the plasma products to a process chamber through a plurality of outlet openings substantially azimuthally distributed about a first axial side of the plasma cavity, directly into a process chamber.
1875 Citations
14 Claims
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1. A plasma processing system, comprising:
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a process chamber that includes a wafer pedestal, wherein the process chamber extends upwards at least from the wafer pedestal to a plane that is horizontal and above a top surface of the wafer pedestal; and a plasma source, comprising an induction coil, a magnetic core element and a plasma generation block that defines a toroidal plasma cavity, wherein; in operation, the plasma source generates a plasma in the plasma cavity; the plasma generation block and the plasma cavity are substantially radially symmetric about a toroidal axis that defines an axial direction and a radial direction; the plasma generation block defines a plurality of outlet apertures on a first axial side of the plasma cavity, wherein plasma products produced by the plasma pass in the axial direction, through the plurality of outlet apertures, from the plasma cavity, through the plane and into the process chamber; the induction coil winds at least partially about the magnetic core element, and the magnetic core element is disposed adjacent to the plasma generation block, and extends from a first end that is at or above the plane, on a radially outward side of the plasma generation block, passes above the plasma generation block on a second axial side of the plasma cavity that is axially opposite to the first axial side, and to a second end that is at or above the plane, on a radially inward side of the plasma generation block, but does not extend below the plane; such that during operation, a current in the induction coil induces a magnetic flux in the magnetic core element, and the magnetic flux in the magnetic core element induces an azimuthal electric current within the plasma cavity, to generate the plasma. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A single wafer plasma processing system, comprising:
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a process chamber, wherein the process chamber is substantially radially symmetric about a toroidal axis, the process chamber includes a pedestal that positions a single wafer for processing within the process chamber, and the pedestal is disposed substantially concentric with the toroidal axis and positions the single wafer concentric with the toroidal axis; a plasma source that, during operation, generates a plasma in a toroidal plasma cavity, the plasma source comprising a plasma generation block, comprising at least two metal sections interspersed with at least two dielectric breaks along a major circumference of the toroidal plasma cavity, wherein each of the dielectric breaks consists of dielectric material that encircles a minor circumference of the plasma cavity, such that no metal exists within an azimuthal section of the plasma generation block at each of the dielectric breaks; and at least two magnetic elements adjacent to the toroidal plasma cavity that partially encircle, but do not completely encircle, a minor circumference of the toroidal plasma cavity, wherein each of the magnetic elements is adjacent to the toroidal plasma cavity on a radially inner side of the toroidal plasma cavity, a side of the toroidal plasma cavity that faces away from the process chamber, and a radially outer side of the toroidal plasma cavity, and wherein the major circumference of the toroidal plasma cavity is substantially radially symmetric about the toroidal axis, the plasma source defines a plurality of outlet apertures on a first axial side of the toroidal plasma cavity, during operation, plasma products produced by the plasma pass in the axial direction, through the plurality of outlet apertures, from the toroidal plasma cavity, toward the process chamber, and at least some of the outlet apertures penetrate the dielectric breaks. - View Dependent Claims (10, 11, 12, 13, 14)
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Specification