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Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

  • US 10,227,692 B2
  • Filed: 03/09/2018
  • Issued: 03/12/2019
  • Est. Priority Date: 12/21/2015
  • Status: Active Grant
First Claim
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1. A magnetically enhanced high density plasma source comprising:

  • a hollow cathode target assembly;

    an anode positioned on top of the hollow cathode target assembly, thereby forming a gap between the anode and the hollow cathode target assembly;

    a cathode magnet assembly;

    two rows of magnets facing each other with the same magnetic field direction that generate a cusp magnetic field in the gap and a magnetic field on a surface of the hollow cathode target assembly with the cathode magnet assembly, the cusp magnetic field comprising magnetic field lines that are substantially perpendicular to the hollow cathode target assembly; and

    a radio frequency (RF) power supply connected to the hollow cathode target assembly, the RF power supply generating output voltage with a frequency and amplitude that generates an electric field in the gap substantially perpendicular to the cusp magnetic field lines in the gap, the electric field igniting and sustaining RF plasma discharge between the anode and the hollow cathode target assembly, a frequency and power of the RF power supply being selected to increase a degree of ionization of feed gas atoms.

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