Adaptive charge balanced edge termination
First Claim
1. A method comprising:
- generating a junction extension region within an upper surface of an epitaxial layer of a semiconductor device, wherein said epitaxial layer comprising a first type dopant and said junction extension region comprising a second type dopant;
generating a field ring within said junction extension region and comprising a higher concentration of said second type dopant than said junction extension region; and
forming a field plate above and in physical contact with said field ring, said field plate comprises a metal and a polysilicon that are both located above and extend beyond said junction extension region,wherein an edge termination of said semiconductor device comprises said junction extension region, said field ring, and said field plate.
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Abstract
In one embodiment, a semiconductor device can include a substrate including a first type dopant. The semiconductor device can also include an epitaxial layer located above the substrate and including a lower concentration of the first type dopant than the substrate. In addition, the semiconductor device can include a junction extension region located within the epitaxial layer and including a second type dopant. Furthermore, the semiconductor device can include a set of field rings in physical contact with the junction extension region and including a higher concentration of the second type dopant than the junction extension region. Moreover, the semiconductor device can include an edge termination structure in physical contact with the set of field rings.
409 Citations
20 Claims
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1. A method comprising:
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generating a junction extension region within an upper surface of an epitaxial layer of a semiconductor device, wherein said epitaxial layer comprising a first type dopant and said junction extension region comprising a second type dopant; generating a field ring within said junction extension region and comprising a higher concentration of said second type dopant than said junction extension region; and forming a field plate above and in physical contact with said field ring, said field plate comprises a metal and a polysilicon that are both located above and extend beyond said junction extension region, wherein an edge termination of said semiconductor device comprises said junction extension region, said field ring, and said field plate. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method comprising:
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generating a junction extension region within an upper surface of an epitaxial layer of a metal oxide semiconductor field effect transistor (MOSFET) device, wherein said epitaxial layer comprising a first type dopant and said junction extension region comprising a second type dopant; generating a plurality of field rings within said junction extension region, each of said plurality of field rings comprising a higher concentration of said second type dopant than said junction extension region; and forming a plurality of field plates, a field plate of said plurality of field plates is above and in physical contact with a field ring of said plurality of field rings, said field plate comprises a metal and a polysilicon that are both located above and extend beyond said junction extension region, wherein an edge termination of said MOSFET device comprises said junction extension region, said plurality of field rings, and said plurality of field plates. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A method comprising:
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generating a junction extension region within an upper surface of an epitaxial layer of a semiconductor device, wherein said epitaxial layer comprising a first type dopant and said junction extension region comprising a second type dopant, said junction extension region comprises laterally varying doping of said second type dopant; forming a tub region within said epitaxial layer and comprising said second type dopant; generating a field ring within said junction extension region and comprising a higher concentration of said second type dopant than said junction extension region; and forming a field plate above and in physical contact with said field ring, said field plate comprises a metal and a polysilicon that are both located above and extend beyond said junction extension region, wherein an edge termination of said semiconductor device comprises said junction extension region, said field ring, and said field plate. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification