Scanner based optical proximity correction system and method of use

• US 10,234,756 B2
• Filed: 08/30/2017
• Issued: 03/19/2019
• Est. Priority Date: 01/18/2007
• Status: Active Grant

• Current Assignee: Nikon Corporation, Nikon Precision Incorporated (Nikon Corporation)
• Original Assignee: Nikon Corporation, Nikon Precision Incorporated (Nikon Corporation)
• Inventors: Tyminski, Jacek, Popescu, Raluca, Matsuyama, Tomoyuki
• Primary Examiner(s): Parihar, Suchin
• Application Number:
  US15/691,388
• Publication Number:
  US 20170363951A1
• Time in Patent Office: 566 Days
• Field of Search: 716 53
• CPC Class Codes: G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
• CPC Class Codes: G03F 1/68 Preparation processes not covered by groups G03F1/20 - G03F1/50
• CPC Class Codes: G06F 30/00 Computer-aided design [CAD]
• CPC Class Codes: G06F 30/398 Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM] optical proximity correction [OPC] design processes G03F1/36

Abstract

A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether δ₁<ε₁, wherein δ₁ represents model vs. exposure difference and ε₁ represents predetermined criteria. The technique further includes completing the model when δ₁<ε₁.

Claims

1. A reticle design method, comprising:

preparing an OPC (Optical Proximity Correction) model which simulates a pattern image;

inputting at least one tool parameter of an exposure apparatus into the OPC model;

inputting reticle design data, which represents a design of a layout to be imaged, into the OPC model which inputted the tool parameter;

predicting a result by using the OPC model after inputting the reticle design data into the OPC model;

exposing a pattern including the layout;

comparing an exposure result and the predicted result; and

determining whether a difference (δ

₂) between the prediction made on the basis of the OPC model and the exposure result is less than a predetermined criteria (ε

₂),

wherein the tool parameters include at least one of;

lens signature as defined in terms of a Jones Matrix Map, and transverse and longitudinal synchronization data, and

wherein when the difference (δ

₂) is less than the predetermined criteria (ε

₂), the reticle design is completed, and when (δ

₂) is greater than the predetermined criteria (ε

₂), the reticle is redesigned and the pattern is corrected.

2. The method of claim 1, wherein the reticle design data including a series of numerals represents the design of the layout to be imaged.

3. The method of claim 1, wherein the tool parameters further include at least one of:

illuminator details, local and global flare data, longitudinal chromatic aberrations, and an illuminator spectrum.

4. The method of claim 3, wherein the tool parameters further include at least one of NA error, sigma error, and thermal aberration.

5. A reticle manufacturing method comprising designing a reticle by using the method of claim 1.

6. An exposure method comprising:

preparing a reticle by using the method of claim 5; and

exposing a pattern by using the reticle.

7. A device manufacturing method comprising

exposing a pattern by using the method of claim 6.

8. The reticle design method of claim 1, wherein the tool parameter includes the lens signature, and the Jones Matrix Map includes information about at least one of phase, amplitude and polarization transformations taking place in a lens of the exposure apparatus.

9. The reticle design method of claim 8, wherein the amplitude and polarization transformations represent wave front aberration and apodization of the lens.

10. The reticle design method of claim 1, wherein the OPC model is implemented in an Electronic Design Automation (EDA) tool.

11. The reticle design method of claim 1, wherein the OPC model is implemented in an Electronic Computer-Aided Design (ECAD) tool.

12. The reticle design method of claim 1, wherein the tool parameter includes the transverse and longitudinal synchronization data, and the transverse and longitudinal synchronization data pertains to synchronization errors.