Systems and processes that singulate materials
First Claim
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1. A method for material singulation, the method comprising:
- focusing a first laser output from a first laser device to a depth within a material, the depth being located between a top surface of the material and a bottom surface of the material, the focused first laser output having a beam width in the material, the first laser output comprising ultrafast laser pulses having a duration less than or equal to 50 picoseconds, the first laser output having a wavelength selected from near-infrared and visible wavelengths;
applying the focused first laser output to the material along a beam path, an electric field of the ultrafast lasers pulses in the focused first laser output causing rapid acceleration of electrons, the focused first laser output thereby causing a permanent change in refractive index, optical absorption, density, or mechanical stress of the material exposed to the focused first laser output while the material exposed to the focused first laser output remains in a solid phase; and
sequentially applying a second laser output from a second laser device to the material along and directly adjacent to the beam path, the second laser output heating the material or generating an acoustic shockwave in the material, thereby separating the material along the beam path while reducing impartation of defects into the material, the second laser output having a beam width larger than the beam width of the focused first laser output, the second laser output having a higher average power and a lower peak power relative to the first laser output.
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Abstract
Systems and methods for material singulation. According to some embodiments, methods for material singulation may include applying a first laser output to the material, the first laser output causing a modification of a material property of the material when exposed to the first laser output; and applying a second laser output to the material that was exposed to the first laser output to cause singulation of the material in such a way that surfaces created by the singulation of the material are substantially free from defects.
404 Citations
14 Claims
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1. A method for material singulation, the method comprising:
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focusing a first laser output from a first laser device to a depth within a material, the depth being located between a top surface of the material and a bottom surface of the material, the focused first laser output having a beam width in the material, the first laser output comprising ultrafast laser pulses having a duration less than or equal to 50 picoseconds, the first laser output having a wavelength selected from near-infrared and visible wavelengths; applying the focused first laser output to the material along a beam path, an electric field of the ultrafast lasers pulses in the focused first laser output causing rapid acceleration of electrons, the focused first laser output thereby causing a permanent change in refractive index, optical absorption, density, or mechanical stress of the material exposed to the focused first laser output while the material exposed to the focused first laser output remains in a solid phase; and sequentially applying a second laser output from a second laser device to the material along and directly adjacent to the beam path, the second laser output heating the material or generating an acoustic shockwave in the material, thereby separating the material along the beam path while reducing impartation of defects into the material, the second laser output having a beam width larger than the beam width of the focused first laser output, the second laser output having a higher average power and a lower peak power relative to the first laser output. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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