Airgap formation with damage-free copper
First Claim
1. An etching method comprising:
- forming an inert plasma within a processing region of a semiconductor processing chamber;
modifying a surface of an exposed material on a semiconductor substrate within the processing region of the semiconductor processing chamber with effluents of the inert plasma, wherein the exposed material on the semiconductor substrate comprises a silicon-containing material located proximate a copper wire positioned along the semiconductor substrate;
forming a remote plasma from a fluorine-containing precursor to produce plasma effluents;
flowing the plasma effluents to the processing region of the semiconductor processing chamber; and
removing the modified surface of the exposed material from the semiconductor substrate.
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Accused Products
Abstract
Processing methods may be performed to remove unwanted materials from a substrate, such as an oxide footing. The methods may include forming an inert plasma within a processing region of a processing chamber. Effluents of the inert plasma may be utilized to modify a surface of an exposed material on a semiconductor substrate within the processing region of the semiconductor chamber. A remote plasma may be formed from a fluorine-containing precursor to produce plasma effluents. The methods may include flowing the plasma effluents to the processing region of the semiconductor processing chamber. The methods may also include removing the modified surface of the exposed material from the semiconductor substrate.
1813 Citations
19 Claims
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1. An etching method comprising:
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forming an inert plasma within a processing region of a semiconductor processing chamber; modifying a surface of an exposed material on a semiconductor substrate within the processing region of the semiconductor processing chamber with effluents of the inert plasma, wherein the exposed material on the semiconductor substrate comprises a silicon-containing material located proximate a copper wire positioned along the semiconductor substrate; forming a remote plasma from a fluorine-containing precursor to produce plasma effluents; flowing the plasma effluents to the processing region of the semiconductor processing chamber; and removing the modified surface of the exposed material from the semiconductor substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An etching method comprising:
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forming an inert plasma within a processing region of a semiconductor processing chamber; modifying an exposed region of dielectric on a semiconductor substrate within the processing region of the semiconductor processing chamber with effluents of the inert plasma, wherein the modifying reduces an amount of carbon within the region of dielectric; contacting the modified dielectric with plasma effluents of a fluorine-containing precursor; and etching the modified dielectric, wherein the modifying, contacting, and etching are all performed in the semiconductor processing chamber. - View Dependent Claims (12, 13, 14, 15, 16)
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17. An etching method comprising:
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forming an inert plasma within a processing region of a semiconductor processing chamber, wherein the inert plasma comprises a hydrogen plasma formed by a bias power of less than or about 200 W; modifying an exposed region of carbon-containing material on a semiconductor substrate within the processing region of the semiconductor processing chamber with effluents of the inert plasma, wherein the exposed region of carbon-containing material comprises a dielectric material positioned between copper interconnects formed on the semiconductor substrate, wherein a pressure within the semiconductor processing chamber is maintained below about 50 mTorr during the modifying; forming a plasma of a fluorine-containing precursor in a remote region of the semiconductor processing chamber that is separated from the processing region of the semiconductor processing chamber by a showerhead; contacting the modified dielectric material with plasma effluents of the fluorine-containing precursor; and etching the modified dielectric material at a temperature of at least about 80°
C., wherein the modifying, contacting, and etching are all performed in the semiconductor processing chamber, and wherein no solid byproducts are produced during the etching. - View Dependent Claims (18, 19)
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Specification