Vertical structure LEDs
First Claim
1. A light emitting diode, comprising:
- a metal support layer;
a GaN-based semiconductor structure having a less than 5 microns thickness on the metal support layer, the GaN-based semiconductor structure comprising;
a p-type GaN-based semiconductor layer,an active layer on the p-type GaN-based semiconductor layer, andan n-type GaN-based semiconductor layer on the active layer;
a p-type electrode on the metal support layer, wherein the p-type electrode includes a plurality of metal layers;
an n-type electrode on a flat portion of an upper surface of the GaN-based semiconductor structure, wherein the n-type electrode contacts the flat portion;
a metal pad layer on the n-type electrode; and
an insulating layer comprising;
a first part disposed on the upper surface of the GaN-based semiconductor structure, anda second part disposed on an entire side surface of the GaN-based semiconductor structure,wherein the metal pad layer comprises;
a first portion having a flat bottom surface on the n-type electrode, anda second portion having stepped surfaces,wherein the first part of the insulating layer is patterned to form an open space exposing the n-type electrode,wherein the metal pad layer is disposed at the open space,wherein the first part of the insulating layer contacts the upper surface of the GaN-based semiconductor structure and a side surface of the n-type electrode,wherein the second part of the insulating layer is separated from the n-type electrode, andwherein the n-type electrode overlaps at least a portion of the p-type electrode in a thickness direction of the GaN-based semiconductor structure.
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Accused Products
Abstract
A light emitting diode can include a metal support layer: a GaN-based semiconductor structure having a less than 5 microns thickness on the metal support layer, the GaN-based semiconductor structure including a p-type GaN-based semiconductor layer, an active layer on the p-type GaN-based semiconductor layer, and an n-type GaN-based semiconductor layer on the active layer; a p-type electrode on the metal support layer and including a plurality of metal layers; an n-type electrode on a flat portion of an upper surface of the GaN-based semiconductor structure, and the n-type electrode contacts the flat portion; a metal pad layer on the n-type electrode; and an insulating layer including a first part disposed on the upper surface of the GaN-based semiconductor structure, and a second part disposed on an entire side surface of the GaN-based semiconductor structure, in which the metal pad layer includes a first portion having a flat bottom surface on the n-type electrode, and a second portion having stepped surfaces.
112 Citations
20 Claims
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1. A light emitting diode, comprising:
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a metal support layer; a GaN-based semiconductor structure having a less than 5 microns thickness on the metal support layer, the GaN-based semiconductor structure comprising; a p-type GaN-based semiconductor layer, an active layer on the p-type GaN-based semiconductor layer, and an n-type GaN-based semiconductor layer on the active layer; a p-type electrode on the metal support layer, wherein the p-type electrode includes a plurality of metal layers; an n-type electrode on a flat portion of an upper surface of the GaN-based semiconductor structure, wherein the n-type electrode contacts the flat portion; a metal pad layer on the n-type electrode; and an insulating layer comprising; a first part disposed on the upper surface of the GaN-based semiconductor structure, and a second part disposed on an entire side surface of the GaN-based semiconductor structure, wherein the metal pad layer comprises; a first portion having a flat bottom surface on the n-type electrode, and a second portion having stepped surfaces, wherein the first part of the insulating layer is patterned to form an open space exposing the n-type electrode, wherein the metal pad layer is disposed at the open space, wherein the first part of the insulating layer contacts the upper surface of the GaN-based semiconductor structure and a side surface of the n-type electrode, wherein the second part of the insulating layer is separated from the n-type electrode, and wherein the n-type electrode overlaps at least a portion of the p-type electrode in a thickness direction of the GaN-based semiconductor structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A light emitting diode, comprising:
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a metal support layer; a GaN-based semiconductor structure on the metal support layer, the GaN-based semiconductor layer comprising; a p-type GaN-based semiconductor layer, an active layer on the p-type GaN-based semiconductor layer and an n-type GaN-based semiconductor layer on the active layer; a p-type electrode between the metal support layer and the p-type GaN-based semiconductor layer; an n-type electrode on the GaN-based semiconductor structure; a metal pad layer on the n-type electrode; and an insulating layer comprising; a first part disposed on an upper surface of the GaN-based semiconductor structure, and a second part disposed on a side surface of the GaN-based semiconductor structure, wherein the first part of the insulating layer contacts the upper surface of the GaN-based semiconductor structure, a side surface of the n-type electrode and a top surface of the n-type electrode, wherein the n-type electrode overlaps at least a portion of the p-type electrode in a thickness direction of the GaN-based semiconductor structure, wherein the p-type electrode contacts a top surface of the metal support layer and a bottom surface of the GaN-based semiconductor structure, wherein the upper surface of the GaN-based semiconductor structure has a flat top portion contacting the n-type electrode, wherein an area of a portion contacting the p-type GaN-based semiconductor layer in the insulating layer is smaller than an area of a portion contacting the n-type GaN-based semiconductor layer in the insulating layer, wherein the first part of the insulating layer is patterned to form an open space exposing the n-type electrode, wherein the metal pad layer is disposed at the open space, wherein the metal pad layer comprises; a first portion having a flat bottom surface on the n-type electrode and a second portion having stepped surfaces, wherein a first width of the first portion of the metal pad layer is different than a second width of the second portion of the metal pad layer, wherein the second portion of the metal pad layer overlaps the first portion of the metal pad layer in the thickness direction of the GaN-based semiconductor structure, and wherein a thickness of the GaN-based semiconductor structure is less than 5 μ
m. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18)
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19. A light emitting diode, comprising:
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a metal support layer comprising Ti and a non-metal material; a GaN-based semiconductor structure having a less than 5 microns thickness on the metal support layer, the GaN-based semiconductor layer comprising; a p-type GaN-based semiconductor layer, an active layer on the p-type GaN-based semiconductor layer and an n-type GaN-based semiconductor layer on the active layer; a p-type electrode between the metal support layer and the p-type GaN-based semiconductor layer, wherein the p-type electrode includes a plurality of metal layers; an n-type electrode on the GaN-based semiconductor structure; a metal pad layer on the n-type electrode; and an insulating layer including at least one of SiO2 or Si3N4, the insulating layer comprising; a first part disposed on an upper surface of the GaN-based semiconductor structure, and a second part disposed on an entire side surface of the GaN-based semiconductor structure, wherein the first part of the insulating layer contacts the upper surface of the GaN-based semiconductor structure, wherein the n-type electrode overlaps at least a portion of the p-type electrode in a thickness direction of the GaN-based semiconductor structure, wherein the p-type electrode contacts a top surface of the metal support layer and a bottom surface of the GaN-based semiconductor structure, wherein the first part of the insulating layer is patterned to form an open space exposing the n-type electrode, wherein the metal pad layer is disposed at the open space and an uppermost surface of the metal pad layer is disposed at a higher position than the first part of the insulating layer, wherein the second part of the insulating layer is separated from the n-type electrode, and wherein the n-type electrode comprises Ti and Al. - View Dependent Claims (20)
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Specification