Radio-frequency isolation using cavity formed in interface layer
First Claim
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1. A method for fabricating a semiconductor device, the method comprising:
- providing a transistor device;
forming one or more electrical connections to the transistor device;
forming one or more dielectric layers over at least a portion of the electrical connections;
applying an interface material over at least a portion of the one or more dielectric layers;
removing at least a portion of the interface material to form a trench; and
covering at least a portion of the interface material and the trench with a substrate layer to form a cavity.
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Abstract
A method for fabricating a semiconductor device involves providing a transistor device, forming one or more electrical connections to the transistor device, forming one or more dielectric layers over at least a portion of the electrical connections, applying an interface material over at least a portion of the one or more dielectric layers, removing at least a portion of the interface material to form a trench, and covering at least a portion of the interface material and the trench with a substrate layer to form a cavity.
45 Citations
20 Claims
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1. A method for fabricating a semiconductor device, the method comprising:
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providing a transistor device; forming one or more electrical connections to the transistor device; forming one or more dielectric layers over at least a portion of the electrical connections; applying an interface material over at least a portion of the one or more dielectric layers; removing at least a portion of the interface material to form a trench; and covering at least a portion of the interface material and the trench with a substrate layer to form a cavity. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A semiconductor device comprising:
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a transistor device implemented over a semiconductor substrate; one or more dielectric layers formed over at least a portion of the transistor device; an interface layer covering at least a portion of the one or more dielectric layers, the interface layer having a trench therein; and a substrate layer covering at least a portion of the interface layer and the trench to form a cavity. - View Dependent Claims (9, 10, 11, 12, 13)
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14. A semiconductor die comprising:
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a semiconductor substrate; a transistor device implemented over the semiconductor substrate; one or more dielectric layers formed over at least a portion of the transistor device; an interface layer covering at least a portion of the one or more dielectric layers and having a trench therein; and a substrate layer covering at least a portion of the interface layer and the trench to form a cavity. - View Dependent Claims (15, 16, 17, 18, 19, 20)
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Specification