Exposure apparatus and method for exposure of transparent substrate

• US 10,254,659 B1
• Filed: 10/18/2017
• Issued: 04/09/2019
• Est. Priority Date: 09/27/2017
• Status: Active Grant

• Current Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd. (TCL Technology Group Corp.)
• Original Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd. (TCL Technology Group Corp.)
• Inventors: Ding, Lei
• Primary Examiner(s): Gordon, Steven Whitesell
• Application Number:
  US15/739,782
• Publication Number:
  US 20190094696A1
• Time in Patent Office: 538 Days
• CPC Class Codes: G03F 7/7035 Proximity or contact printers
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70758 Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
• CPC Class Codes: G03F 7/70791 Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Abstract

An exposure apparatus includes a carrying device and a UV light generation device that irradiate a transparent substrate positioned on the carrying device. The carrying device includes a base, a linear electric machine, an exposure table, and a pneumatic lift device that is arranged between the exposure table and the base and supports the exposure table on the base. A stator of the linear electric machine is fixed to the base, and a rotor of the linear electric machine is fixedly coupled to the exposure table. The linear electric machine drives the exposure table to move relative to the base. A method for exposure of a transparent substrate is also provided. The linear electric machine only needs to drive the movement of the exposure table thereby helping increase exposure speed and exposure accuracy. The pneumatic lift device provides an additional function of cushioning.

Claims

1. An exposure apparatus, comprising a carrying device and an ultraviolet (UV) light generation device, the UV light generation device being operable to irradiate a transparent substrate carried on the carrying device, wherein the carrying device comprises a base, a linear electric machine, an exposure table, and a pneumatic lift device, the pneumatic lift device being arranged between the exposure table and the base, the pneumatic lift device supporting the exposure table on the base, the linear electric machine comprising a stator fixed to the base, the linear electric machine comprising a rotor fixedly coupled to the exposure table, the linear electric machine being operable to drive the exposure table to move relative to the base;

and

wherein the pneumatic lift device comprises a main body and a first air bladder and a second air bladder respectively coupled to two opposite sides of the main body, the first air bladder being positioned on the base, the second air bladder abutting and supporting the exposure table, the main body being operable to control inflation or deflection of each of the first air bladder and the second air bladder.

2. The exposure apparatus according to claim 1, wherein the first air bladder and the second air bladder are each provided in a plural number and the plural first air bladders and the plurals second air bladder are arranged symmetric with respect to the main body.

3. The exposure apparatus according to claim 2, wherein the carrying device further comprises a support frame, the support frame comprising a support board and an extendible vertical post, the support board being fixed through the extendible vertical post to the base, the support board being arranged between the pneumatic lift device and the exposure table, the second air bladder being set in abutting engagement with the support board through the exposure table.

4. The exposure apparatus according to claim 3, wherein the exposure apparatus further comprises a shock-resistant chassis, the shock-resistant chassis being adapted to mount through an elastic post to a working plane, the carrying device being mounted to the shock-resistant chassis.

5. The exposure apparatus according to claim 4, wherein the shock-resistant chassis comprises a trough formed therein, the trough being provided therein with an electric machine, a screw rod and a nut mounted to the screw rod, the nut being connected to the carrying device, the screw rod being arranged in a direction that forms an angle with respect to a movement direction of the linear electric machine, the electric machine being operable to drive the carrying device to move.

6. The exposure apparatus according to claim 3, wherein the exposure table is provided, on a surface thereof facing the base, with rollers, the rollers being in contact engagement with the support board and rollable on the support board.

7. The exposure apparatus according to claim 1, wherein the linear electric machine is provided in a number of at least two and the stators of the linear electric machine are mounted, in a symmetric manner, to two opposite sides of the base.

8. A method for exposure of a transparent substrate, comprising:

providing an exposure apparatus, wherein the exposure apparatus comprises a carrying device and an ultraviolet (UV) light generation device, the carrying device comprising a base, a linear electric machine, an exposure table, and a pneumatic lift device, the pneumatic lift device being arranged between the exposure table and the base, the pneumatic lift device supporting the exposure table on the base, wherein the pneumatic lift device comprises a main body and a first air bladder and a second air bladder respectively coupled to two opposite sides of the main body, the first air bladder being positioned on the base, the second air bladder abutting and supporting the exposure table, the main body being operable to control inflation or deflection of each of the first air bladder and the second air bladder, the linear electric machine comprising a stator fixed to the base, the linear electric machine comprising a rotor fixedly coupled to the exposure table;

positioning a transparent substrate having a surface coated with a photosensitive material on the exposure table;

inflating or deflating the pneumatic lift device to adjust a height of the exposure table; and

positioning a mask between the transparent substrate and the UV light generation device such that UV light emitting from the UV light generation device is allowed to irradiate the photosensitive material, wherein the linear electric machine is operable to drive the transparent substrate to move relative to the UV light.

9. The method for exposure of a transparent substrate according to claim 8, wherein the exposure apparatus further comprises a shock-resistant chassis, the shock-resistant chassis comprising a trough formed therein, the trough being provided therein with an electric machine, a screw rod, and a nut mounted to the screw rod, the nut being connected to the carrying device, wherein during an operation of the linear electric machine driving the transparent substrate to move relative to the UV light, the electric machine drives the transparent substrate to move in a direction that is different from a movement direction of the linear electric machine.

10. The method for exposure of a transparent substrate according to claim 8, wherein the first air bladder and the second air bladder are each provided in a plural number and the plural first air bladders and the plurals second air bladder are arranged symmetric with respect to the main body.

11. The method for exposure of a transparent substrate according to claim 10, wherein the carrying device further comprises a support frame, the support frame comprising a support board and an extendible vertical post, the support board being fixed through the extendible vertical post to the base, the support board being arranged between the pneumatic lift device and the exposure table, the second air bladder being set in abutting engagement with the support board through the exposure table.

12. The method for exposure of a transparent substrate according to claim 11, wherein the exposure apparatus further comprises a shock-resistant chassis, the shock-resistant chassis being adapted to mount through an elastic post to a working plane, the carrying device being mounted to the shock-resistant chassis.

13. The method for exposure of a transparent substrate according to claim 12, wherein the exposure table is provided, on a surface thereof facing the base, with rollers, the rollers being in contact engagement with the support board and rollable on the support board.

14. The method for exposure of a transparent substrate according to claim 8, wherein the linear electric machine is provided in a number of at least two and the stators of the linear electric machine are mounted, in a symmetric manner, to two opposite sides of the base.