Controller for optical device, exposure method and apparatus, and method for manufacturing device

• US 10,261,421 B2
• Filed: 03/14/2018
• Issued: 04/16/2019
• Est. Priority Date: 11/06/2007
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Owa, Soichi
• Primary Examiner(s): Sullivan, Caleen O
• Application Number:
  US15/920,834
• Publication Number:
  US 20180203363A1
• Time in Patent Office: 398 Days
• Field of Search: 430311, 355 77, 355 71
• CPC Class Codes: G03F 7/20 Exposure; Apparatus therefor photographic printing apparatus for making copies G03B27/00
• CPC Class Codes: G03F 7/70091 Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
• CPC Class Codes: G03F 7/70108 Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
• CPC Class Codes: G03F 7/70116 Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
• CPC Class Codes: G03F 7/70141 Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
• CPC Class Codes: G03F 7/702 Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

An exposure method for exposing a mask pattern, which includes plural types of patterns, with a high throughput and optimal illumination conditions for each type of pattern. The method includes guiding light from a first spatial light modulator illuminated with pulse lights of illumination light to a second spatial light modulator and exposing a wafer with light from the second spatial light modulator, accompanied by: controlling a conversion state of the second spatial light modulator including a plurality of second mirror elements; and controlling a conversion state of the first spatial light modulator including a plurality of first mirror elements to control intensity distribution of the illumination light on a predetermined plane between the first spatial light modulator and the second spatial light modulator.

Claims

1. An exposure apparatus that exposes an object with an exposure light from a light source, the exposure apparatus comprising:

a polarization state setter arranged on an optical path of the exposure light from the light source to set a polarization state of the exposure light;

a first mirror array arranged on an optical path of the exposure light from the polarization state setter, the first mirror array including a plurality of mirrors;

a first optical system arranged on an optical path of the exposure light passing via the first mirror array to irradiate an illumination pupil with the exposure light passing via the first mirror array to form a predetermined light intensity distribution on the illumination pupil;

a second optical system arranged on an optical path of the exposure light passing through the first optical system to illuminate an irradiated plane with the exposure light passing via the first optical system;

a second mirror array arranged on the irradiated plane, the second mirror array including a plurality of mirrors;

a projection optical system configured to project a predetermined pattern on the object with the exposure light passing via the second mirror array; and

a controller configured to control states of the plurality of mirrors of the first and second mirror arrays.

2. The exposure apparatus according to claim 1, wherein the polarization state setter changes a polarization state of the exposure light from the light source, from a first polarization state to a second polarization state, which is different from the first polarization state.

3. The exposure apparatus according to claim 1, wherein the controller changes the states of the plurality of mirrors of the second mirror array in accordance with a pattern that is to be formed on the object.

4. The exposure apparatus according to claim 1, wherein the exposure light is a pulsed light, and the states of the plurality of mirrors of the second mirror array are changed whenever a predetermined number of pulsed lights is emitted.

5. The exposure apparatus according to claim 1, wherein the first optical system includes:

a relay optical system having a front focal point located in a plane on which the plurality of mirrors of the first mirror array are aligned, and

a fly'"'"'s eye optical system including a plurality of optical surfaces which are two-dimensionally aligned and are arranged on an optical path of light via the relay optical system.

6. The exposure apparatus according to claim 5, wherein a rear focal point of the relay optical system is located in a plane on which the plurality of optical surfaces of the fly'"'"'s eye optical system are aligned.

7. The exposure apparatus according to claim 1, wherein the projection optical system includes an aperture stop.

8. The exposure apparatus according to claim 7, wherein the illumination pupil is optically conjugated with the aperture stop of the projection optical system.

9. The exposure apparatus according to claim 1, wherein the controller controls the first mirror array to change the light intensity distribution of the exposure light distributed on the illumination pupil.

10. The exposure apparatus according to claim 9, wherein the controller changes the states of the plurality of mirrors of the second mirror array in accordance with a pattern that is to be formed on the object.

11. The exposure apparatus according to claim 10, comprising:

a stage configured to support the object; and

a drive system configured to move the stage in a scanning direction.

12. The exposure apparatus according to claim 11, wherein

the stage is moved to move the object relative to the exposure light during exposure,

the second mirror array is controlled to generate different patterns by the second mirror array during the exposure, and

the first mirror array is controlled to generate mutually different light intensity distributions with the different patterns.