Lithographic method and apparatus
First Claim
1. A method comprising:
- receiving dependencies of optical properties of optical elements of a projection system based on a configuration of manipulators configured to manipulate the optical elements so as to adjust the optical properties of the optical elements;
receiving constraints which correspond to physical constraints of the manipulators;
determining a cost function representing a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties of the projection system, wherein the cost function is formulated using the dependencies of the optical properties of the projection system on the configuration of the manipulators;
scaling the cost function into a scaled variable space, wherein the scaling is performed by using the constraints; and
configuring the manipulators to substantially minimize the scaled cost function subject to satisfying the constraints.
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Abstract
A method of determining a configuration of a projection system for a lithographic apparatus, wherein manipulators of the projection system manipulate optical elements so as to adjust its optical properties, the method comprising: receiving dependencies of the optical properties of the projection system on a configuration of the manipulators, receiving a plurality of constraints of the manipulators, formulating a cost function, wherein the cost function represents a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties, wherein the cost function is formulated using the dependency of the optical properties on the configuration of the manipulators, scaling the cost function into a scaled variable space, wherein the scaling is performed by using the plurality of constraints and finding a solution configuration of the manipulators which substantially minimizes the scaled cost function subject to satisfying the plurality of constraints.
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Citations
20 Claims
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1. A method comprising:
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receiving dependencies of optical properties of optical elements of a projection system based on a configuration of manipulators configured to manipulate the optical elements so as to adjust the optical properties of the optical elements; receiving constraints which correspond to physical constraints of the manipulators; determining a cost function representing a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties of the projection system, wherein the cost function is formulated using the dependencies of the optical properties of the projection system on the configuration of the manipulators; scaling the cost function into a scaled variable space, wherein the scaling is performed by using the constraints; and configuring the manipulators to substantially minimize the scaled cost function subject to satisfying the constraints. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A method of performing a lithographic exposure comprising:
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determining a configuration of a projection system of a lithographic apparatus, the determining comprising; receiving dependencies of optical properties of optical elements of the projection system based on a configuration of manipulators configured to manipulate the optical elements so as to adjust the optical properties of the optical elements; receiving constraints which correspond to physical constraints of the manipulators; determining a cost function representing a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties of the projection system;
wherein the cost function is formulated using the dependencies of the optical properties of the projection system on the configuration of the manipulators;scaling the cost function into a scaled variable space, wherein the scaling is performed by using the constraints; and configuring the manipulators to substantially minimize the scaled cost function subject to satisfying the constraints; adjusting the configuring the manipulators using the determined configuration; and projecting a patterned radiation beam onto a substrate using the projection system.
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17. A non-transitory computer readable medium carrying a computer program comprising computer readable instructions configured to cause a computer to perform operations comprising:
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receiving dependencies of optical properties of optical elements of a projection system based on a configuration of manipulators configured to manipulate the optical elements so as to adjust the optical properties of the optical elements; receiving constraints which correspond to physical constraints of the manipulators; determining a cost function representing a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties of the projection system, wherein the cost function is formulated using the dependencies of the optical properties of the projection system on the configuration of the manipulators; scaling the cost function into a scaled variable space, wherein the scaling is performed by using the constraints; and configuring the manipulators to substantially minimize the scaled cost function subject to satisfying the constraints.
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18. A controller configured to control a projection system for a lithographic apparatus, wherein the projection system comprises a plurality of optical elements and a plurality of manipulators operable to manipulate the optical elements so as to adjust the optical properties of the optical elements, thereby adjusting the optical properties of the projection system, the controller being configured to:
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receive dependencies of the optical properties of the projection system on a configuration of the plurality of manipulators; receive a plurality of constraints which correspond to physical constraints of the plurality of manipulators; formulate a cost function, wherein the cost function represents a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties of the projection system, wherein the cost function is formulated using the dependencies of the optical properties of the projection system on the configuration of the manipulators; scale the cost function into a scaled variable space, wherein the scaling is performed by using the plurality of constraints; and find a solution configuration of the manipulators which substantially minimizes the scaled cost function subject to satisfying the plurality of constraints.
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19. A projection system for a lithographic apparatus, the projection system comprising:
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a plurality of optical elements; a plurality of manipulators configured to manipulate the plurality of optical elements so as to adjust optical properties of the plurality of optical elements, thereby adjusting optical properties of the projection system; and a controller configured to control the projection system for lithographic apparatus, the controller configured to; receive dependencies of the optical properties of the projection system on a configuration of the plurality of manipulators; receive a plurality of constraints which correspond to physical constraints of the plurality of manipulators; formulate a cost function, wherein the cost function represents a difference between the optical properties of the projection system for a given configuration of the plurality of manipulators and desired optical properties of the projection system, wherein the cost function is formulated using the dependencies of the optical properties of the projection system on the configuration of the plurality of manipulators; scale the cost function into a scaled variable space, wherein the scaling is performed by using the plurality of constraints; and find a solution configuration of the plurality of manipulators which substantially minimizes the scaled cost function subject to satisfying the plurality of constraints.
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20. A lithographic apparatus comprising:
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an illumination system configured to condition a radiation beam; a support structure constructed to support a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system comprising; a plurality of optical elements; a plurality of manipulators operable to manipulate the plurality of optical elements so as to adjust optical properties of the plurality of optical elements, thereby adjusting optical properties of the projection system; and a controller configured to control the projection system for the lithographic apparatus, the controller being used to; receive dependencies of the optical properties of the projection system on a configuration of the plurality of manipulators; receive a plurality of constraints which correspond to physical constraints of the plurality of manipulators; formulate a cost function, wherein the cost function represents a difference between the optical properties of the projection system for a given configuration of the plurality of manipulators and desired optical properties of the projection system, wherein the cost function is formulated using the dependencies of the optical properties of the projection system on the configuration of the plurality of manipulators; scale the cost function into a scaled variable space, wherein the scaling is performed by using the plurality of constraints; and find a solution configuration of the plurality of manipulators which substantially minimizes the scaled cost function subject to satisfying the plurality of constraints.
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Specification