Lithographic apparatus and device manufacturing method

• US 10,261,428 B2
• Filed: 06/17/2016
• Issued: 04/16/2019
• Est. Priority Date: 11/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Lof, Joeri, Bijlaart, Erik Theodorus Maria, Butler, Hans, Donders, Sjoerd Nicolaas Lambertus, Hoogendam, Christiaan Alexander, Kolesnychenko, Aleksey Yurievich, Loopstra, Erik Roelof, Meijer, Hendricus Johannes Maria, Mertens, Jeroen Johannes Sophia Maria, Mulkens, Johannes Catharinus Hubertus, Ritsema, Roelof Aeilko Siebrand, Van Schaik, Frank, Sengers, Timotheus Franciscus, Simon, Klaus, De Smit, Joannes Theodoor, Straaijer, Alexander, Streefkerk, Bob, Van Santen, Helmar
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US15/185,626
• Publication Number:
  US 20170010545A1
• Time in Patent Office: 1,033 Days
• Field of Search: 355 72, 355 30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70858 Environment aspects, e.g. pressure of beam-path gas, temperature pollution aspects G03F7/70916

Abstract

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Claims

1. A lithographic projection apparatus comprising:

a projection system configured to project a beam of radiation onto a target portion of a substrate;

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space below the projection system and configured to confine the liquid to a localized area smaller than a surface of the substrate;

a substrate table configured to hold the substrate, the substrate table comprising;

an edge member moveable from a surface of the substrate table, the edge member configured to at least partly surround an edge of the substrate and an object positioned on the substrate table and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the substrate and the object, and

an outlet configured to drain at least part of the liquid passing through a gap between the edge member and the substrate.

2. The apparatus according to claim 1, wherein the edge member is moveable in a plane substantially parallel to the primary surface of the edge member to vary the distance between the edge member and the substrate, the object, or both.

3. The apparatus according to claim 1, wherein the substrate table comprises an actuator configured to move the edge member relative to a remainder of the substrate.

4. The apparatus according to claim 1, wherein the substrate table comprises a hydrophobic layer adjacent an edge portion of the edge member and the substrate, the object, or both, on an opposite side of the primary surface of the edge member and of the substrate, of the object, or both, to the projection system.

5. The apparatus according to claim 4, wherein the liquid has a contact angle of greater than 90°

with the hydrophobic layer.

6. The apparatus according to claim 1, wherein the edge member has a projection with a top surface co-planar with the primary surface of the edge member and extending towards the optical axis of the apparatus.

7. The apparatus according to claim 1, wherein the substrate table comprises a gap seal member configured to abut or at least partly overlap, in the direction of the optical axis, both the edge member and the substrate, the object, or both.

8. The apparatus according to claim 7, wherein the gap seal member is configured to be in contact with the primary surfaces thereby spanning a gap between the edge member and the substrate, the object, or both.

9. The apparatus according to claim 7, wherein the gap seal member has inner and outer edges at least one of which edges is tapered such that the distance of the surface of the gap seal member facing away from the primary surface of the edge member or the substrate, the object, or both, decreases towards the edge of the gap seal member.

10. The apparatus according to claim 1, wherein the object comprises a sensor.

11. The apparatus according to claim 1, wherein the liquid supply system comprises a member configured to at least partly confine the liquid in the space, the member comprising:

an inlet configured to supply the liquid to the space;

an aperture configured to allow the radiation beam and liquid from the inlet to pass therethrough to below a lower surface of the member; and

an outlet, at the lower surface, configured to exhaust at least part of the liquid.

12. A lithographic projection apparatus comprising:

a projection system configured to project a radiation beam onto a target portion of a substrate;

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space below the projection system and configured to confine the liquid to a localized area smaller than a surface of the substrate;

a movable table comprising;

an edge member configured to at least partly surround an edge of an object, when on the table, and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the object, and

an outlet configured to drain at least part of the liquid passing through a gap between the edge member and the object.

13. The apparatus according to claim 12, wherein the edge member is moveable from a surface of the table.

14. The apparatus according to claim 12, wherein the liquid supply system comprises a member configured to at least partly confine the liquid in the space, the member comprising:

an inlet configured to supply the liquid to the space;

an aperture configured to allow the radiation beam and liquid from the inlet to pass therethrough to below a lower surface of the member; and

an outlet, at the lower surface, configured to exhaust at least part of the liquid.

15. The apparatus according to claim 12, further comprising a hydrophobic surface located below the primary surfaces of the edge member and the object and arranged to contact liquid entering a gap between the edge member and the object.

16. The apparatus according to claim 12, wherein the outlet comprises an opening to accept the at least part of the liquid and defined in a surface facing the projection system.

17. A lithographic projection apparatus comprising:

a projection system configured to project a radiation beam onto a target portion of a substrate;

a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space below the projection system and configured to confine the liquid to a localized area smaller than a surface of the substrate;

a movable table comprising;

an edge member configured to at least partly surround an edge of an object, when on the table, and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the object, and

a hydrophobic surface located below the primary surfaces of the edge member and the object and arranged to contact liquid entering a gap between the edge member and the object.

18. The apparatus according to claim 17, wherein the liquid supply system comprises a member configured to at least partly confine the liquid in the space, the member comprising:

an inlet configured to supply the liquid to the space;

an aperture configured to allow the radiation beam and liquid from the inlet to pass therethrough to below a lower surface of the member; and

an outlet, at the lower surface, configured to exhaust at least part of the liquid.

19. The apparatus according to claim 17, wherein the edge member is moveable from a surface of the table.

20. The apparatus according to claim 17, wherein the substrate table further comprises an opening to accept at least part of the liquid passing through a gap between the edge member and the object, the opening defined in a surface facing the projection system.