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System, method and computer program product for systematic and stochastic characterization of pattern defects identified from a semiconductor wafer

  • US 10,262,408 B2
  • Filed: 08/22/2017
  • Issued: 04/16/2019
  • Est. Priority Date: 04/12/2017
  • Status: Active Grant
First Claim
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1. A non-transitory computer readable medium storing a computer program product having code executable by a processor to perform a method comprising:

  • identifying a plurality of pattern defects detected from a fabricated component;

    analyzing attributes of each of the pattern defects, based on predefined criteria;

    determining, from the analysis, a first set of pattern defects of the plurality of pattern defects to be systematic pattern defects and a second set of pattern defects of the plurality of pattern defects to be stochastic pattern defects;

    performing a first action for the determined systematic pattern defects; and

    performing a second action for the determined stochastic pattern defects.

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