Plasma monitoring device
First Claim
1. A plasma monitoring device for a reaction chamber having a reaction space in which plasma is formed, the monitoring device comprising:
- a fixing unit configured to be coupled to a side wall of the reaction chamber so as to abut an observation window provided in the side wall;
a plasma measuring unit in contact with a rear end of the fixing unit and configured to measure a luminous intensity of light emitted by the plasma within the reaction chamber via the observation window and to output a luminous intensity measurement value;
a reference light source unit configured to irradiate reference light having a uniform luminous intensity to the plasma measuring unit at a predetermined interval of time; and
a control unit configured to;
receive the luminous intensity measurement value and to calculate a luminous intensity value of the emitted light;
control a voltage applied to the reference light source unit to uniformly control a luminous intensity of the reference light;
compare the luminous intensity of the reference light with a previously stored luminous intensity reference value to detect a correction factor; and
apply the correction factor to a luminous intensity value of the emitted light to correct the luminous intensity measurement value.
2 Assignments
0 Petitions
Accused Products
Abstract
A plasma monitoring device includes a fixing unit, a plasma measuring unit disposed to be in contact with the fixing unit, and measuring a luminous intensity of emitted light of a plasma to output a luminous intensity measurement value, a reference light source unit irradiating reference light having a uniform luminous intensity to the plasma measuring unit, and a control unit receiving the luminous intensity measurement value to calculate a luminous intensity value of the emitted light, controlling a voltage applied to the reference light source unit to uniformly control a luminous intensity of the reference light, comparing a luminous intensity of the reference light irradiated to the plasma measuring unit with a previously stored luminous intensity reference value to detect a correction factor, and applying the correction factor to a luminous intensity value of the emitted light to correct the luminous intensity measurement value.
-
Citations
20 Claims
-
1. A plasma monitoring device for a reaction chamber having a reaction space in which plasma is formed, the monitoring device comprising:
-
a fixing unit configured to be coupled to a side wall of the reaction chamber so as to abut an observation window provided in the side wall; a plasma measuring unit in contact with a rear end of the fixing unit and configured to measure a luminous intensity of light emitted by the plasma within the reaction chamber via the observation window and to output a luminous intensity measurement value; a reference light source unit configured to irradiate reference light having a uniform luminous intensity to the plasma measuring unit at a predetermined interval of time; and a control unit configured to; receive the luminous intensity measurement value and to calculate a luminous intensity value of the emitted light; control a voltage applied to the reference light source unit to uniformly control a luminous intensity of the reference light; compare the luminous intensity of the reference light with a previously stored luminous intensity reference value to detect a correction factor; and apply the correction factor to a luminous intensity value of the emitted light to correct the luminous intensity measurement value. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
-
-
13. A plasma monitoring device for a reaction chamber having a reaction space in which plasma is formed, the monitoring device comprising:
-
a fixing unit configured to be coupled to a side wall of the reaction chamber so as to abut an observation window provided in the side wall; a plasma measuring unit in contact with a rear end of the fixing unit and configured to measure a luminous intensity of light emitted by the plasma within the reaction chamber via the observation window and to output a luminous intensity measurement value; a reference light source unit configured to irradiate reference light having a uniform luminous intensity to the plasma measuring unit at a predetermined interval of time; a temperature measuring unit configured to measure temperatures of the plasma measuring unit and the reference light source unit and to output temperature measurement values; and a control unit configured to; receive the luminous intensity measurement value and to calculate a luminous intensity value of the emitted light; control a voltage applied to the reference light source unit to uniformly control a luminous intensity of the reference light; receive the temperature measurement value and to determine whether the plasma measuring unit and the reference light source unit are operating within a temperature reference range; compare a luminous intensity of the reference light with a previously stored luminous intensity reference value to calculate a difference value; and apply the difference value to the luminous intensity measurement value to correct the luminous intensity measurement value. - View Dependent Claims (14, 15)
-
-
16. A plasma monitoring device for a reaction chamber in which plasma is formed, the monitoring device comprising:
-
a body configured to be attached to a side wall of the reaction chamber so as to abut an observation window in the side wall; a plasma measuring unit located within the body that is configured to measure intensity of light emitted by the plasma within the reaction chamber via the observation window; at least one lens located within the body and configured to direct the emitted light from the observation window to the plasma measuring unit; a reference light source located within the body that is configured to irradiate the plasma measuring unit with a reference light; and a control unit configured to; receive a luminous intensity measurement value from the plasma measuring unit and to calculate a luminous intensity value of the emitted light; control a voltage applied to the reference light source unit to uniformly control a luminous intensity of the reference light; compare the luminous intensity of the reference light with a previously stored luminous intensity reference value to detect a correction factor; and apply the correction factor to the luminous intensity measurement value. - View Dependent Claims (17, 18, 19, 20)
-
Specification