Process for forming a film on a substrate using multi-port injection assemblies
First Claim
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1. A process for forming a film on a substrate, comprising:
- providing a reaction chamber, the reaction chamber holding a substrate to be processed;
providing a first multiple port injector assembly, the first multiple port injector assembly comprising a first plurality of individual port injectors for providing a first gas from a first gas source to the substrate;
providing a second multiple port injector assembly, the second multiple port injector assembly comprising a second plurality of individual port injectors for providing a second gas from a second gas source to the substrate;
flowing the first gas onto the substrate with the first multiple port injector assembly; and
flowing the second gas onto the substrate with the second multiple port injector assembly, wherein one or more of;
the first multiple port injector assembly has an asymmetric bias of the first plurality of individual port injectors, andthe second multiple port injector assembly has an asymmetric bias of the second plurality of individual port injectors;
wherein a substantially uniform distribution of the first gas and the second gas across the substrate is achieved; and
wherein a reaction takes place between the first gas and the second gas on the substrate to form a first film.
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Abstract
A gas distribution system is disclosed in order to obtain better film uniformity on a substrate in a cross-flow reactor. The better film uniformity may be achieved by an asymmetric bias on individual injection ports of the gas distribution system. The gas distribution may allow for varied tunability of the film properties.
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Citations
14 Claims
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1. A process for forming a film on a substrate, comprising:
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providing a reaction chamber, the reaction chamber holding a substrate to be processed; providing a first multiple port injector assembly, the first multiple port injector assembly comprising a first plurality of individual port injectors for providing a first gas from a first gas source to the substrate; providing a second multiple port injector assembly, the second multiple port injector assembly comprising a second plurality of individual port injectors for providing a second gas from a second gas source to the substrate; flowing the first gas onto the substrate with the first multiple port injector assembly; and flowing the second gas onto the substrate with the second multiple port injector assembly, wherein one or more of; the first multiple port injector assembly has an asymmetric bias of the first plurality of individual port injectors, and the second multiple port injector assembly has an asymmetric bias of the second plurality of individual port injectors; wherein a substantially uniform distribution of the first gas and the second gas across the substrate is achieved; and wherein a reaction takes place between the first gas and the second gas on the substrate to form a first film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A process for forming a film on a substrate, comprising:
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providing a reaction chamber, the reaction chamber holding a substrate to be processed; providing a first multiple port injector assembly, the first multiple port injector assembly comprising a first plurality of individual port injectors for providing a first gas from a first gas source to the substrate; providing a second multiple port injector assembly, the second multiple port injector assembly comprising a second plurality of individual port injectors for providing a second gas from a second gas source to the substrate; flowing the first gas onto the substrate with the first multiple port injector assembly, wherein the first multiple port injector assembly has an asymmetric bias of the first plurality of individual port injectors; and flowing the second gas onto the substrate with the second multiple port injector assembly, wherein the second multiple port injector assembly has an asymmetric bias of the second plurality of individual port injectors; wherein a substantially uniform distribution of the first gas and the second gas across the substrate is achieved; and wherein a reaction takes place between the first gas and the second gas on the substrate to form the film. - View Dependent Claims (14)
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Specification