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Apparatus and methods for wafer rotation in carousel susceptor

  • US 10,262,888 B2
  • Filed: 03/30/2017
  • Issued: 04/16/2019
  • Est. Priority Date: 04/02/2016
  • Status: Expired due to Fees
First Claim
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1. An apparatus comprising:

  • a susceptor assembly having a top surface and a bottom surface defining a thickness, the susceptor assembly including a plurality of recesses in the top surface, each of the recesses having a recess bottom spaced a distance from the top surface of the susceptor assembly, each of the recesses having a lift pocket with a lift pocket bottom surface spaced a distance from the recess bottom defining a depth of the lift pocket;

    a lift assembly including a lift plate having a top surface and bottom surface defining a thickness, a lift shaft extending from the lift plate opposite the top surface and a lift friction pad with a bottom surface at an end of the lift shaft, the lift plate positioned within the lift pocket and the lift shaft positioned within an opening in the susceptor assembly and extending a distance from the bottom of the susceptor assembly; and

    a rotation assembly comprising a rotation friction pad with a top surface and a rotation shaft extending from the rotation friction pad, the top surface of the rotation friction pad in vertical alignment with the bottom surface of the lift friction pad, the rotation assembly having a pulley connected to the rotation shaft,wherein when the lift assembly is in a lowest position, the lift plate is resting against the lift pocket bottom surface and the lift friction pad is not in contact with and is spaced a distance from the rotation friction pad.

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