Apparatus and methods for wafer rotation in carousel susceptor
First Claim
1. An apparatus comprising:
- a susceptor assembly having a top surface and a bottom surface defining a thickness, the susceptor assembly including a plurality of recesses in the top surface, each of the recesses having a recess bottom spaced a distance from the top surface of the susceptor assembly, each of the recesses having a lift pocket with a lift pocket bottom surface spaced a distance from the recess bottom defining a depth of the lift pocket;
a lift assembly including a lift plate having a top surface and bottom surface defining a thickness, a lift shaft extending from the lift plate opposite the top surface and a lift friction pad with a bottom surface at an end of the lift shaft, the lift plate positioned within the lift pocket and the lift shaft positioned within an opening in the susceptor assembly and extending a distance from the bottom of the susceptor assembly; and
a rotation assembly comprising a rotation friction pad with a top surface and a rotation shaft extending from the rotation friction pad, the top surface of the rotation friction pad in vertical alignment with the bottom surface of the lift friction pad, the rotation assembly having a pulley connected to the rotation shaft,wherein when the lift assembly is in a lowest position, the lift plate is resting against the lift pocket bottom surface and the lift friction pad is not in contact with and is spaced a distance from the rotation friction pad.
1 Assignment
0 Petitions
Accused Products
Abstract
Apparatus and method for processing a plurality of substrates in a batch processing chamber are described. The apparatus comprises a susceptor assembly, a lift assembly and a rotation assembly. The susceptor assembly has a top surface and a bottom surface with a plurality of recesses in the top surface. Each of the recesses has a lift pocket in the recess bottom. The lift assembly including a lift plate having a top surface to contact the substrate. The lift plate is connected to a lift shaft that extends through the susceptor assembly and connects to a lift friction pad. The rotation assembly has a rotation friction pad that contacts the lift friction pad. The rotation friction pad is connected to a rotation shaft and can be vertically aligned with the lift friction pad.
-
Citations
18 Claims
-
1. An apparatus comprising:
-
a susceptor assembly having a top surface and a bottom surface defining a thickness, the susceptor assembly including a plurality of recesses in the top surface, each of the recesses having a recess bottom spaced a distance from the top surface of the susceptor assembly, each of the recesses having a lift pocket with a lift pocket bottom surface spaced a distance from the recess bottom defining a depth of the lift pocket; a lift assembly including a lift plate having a top surface and bottom surface defining a thickness, a lift shaft extending from the lift plate opposite the top surface and a lift friction pad with a bottom surface at an end of the lift shaft, the lift plate positioned within the lift pocket and the lift shaft positioned within an opening in the susceptor assembly and extending a distance from the bottom of the susceptor assembly; and a rotation assembly comprising a rotation friction pad with a top surface and a rotation shaft extending from the rotation friction pad, the top surface of the rotation friction pad in vertical alignment with the bottom surface of the lift friction pad, the rotation assembly having a pulley connected to the rotation shaft, wherein when the lift assembly is in a lowest position, the lift plate is resting against the lift pocket bottom surface and the lift friction pad is not in contact with and is spaced a distance from the rotation friction pad. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
-
-
18. An apparatus comprising:
-
a processing chamber including a bottom, top and sidewall defining a processing region within; a susceptor assembly inside the processing chamber, the susceptor assembly having a top surface and a bottom surface defining a thickness, the susceptor assembly including a plurality of recesses in the top surface, each of the recesses having a recess bottom spaced a distance from the top surface of the susceptor assembly, each of the recesses having a lift pocket substantially centered within the recess, each lift pocket having a lift pocket bottom surface spaced a distance from the recess bottom defining a depth of the lift pocket; a lift assembly positioned within each of the plurality of recesses, the lift assemblies including a lift plate having a top surface and bottom surface defining a thickness within ±
2 mm of the depth of the lift pocket, a lift shaft extending from the bottom surface of the lift plate, the lift shaft having a length sufficient to pass through the susceptor assembly and extend the lift plate above the recess bottom by a distance greater than or equal to about 1 mm, the lift assembly including a lift friction pad with a bottom surface at an end of the lift shaft, the lift plate positioned within the lift pocket and the lift shaft positioned within an opening in the susceptor assembly and extending a distance from the bottom of the susceptor assembly;a plurality of rotation assemblies, each rotation assembly comprising a rotation friction pad with a top surface and a rotation shaft extending from the rotation friction pad, the top surface of the rotation friction pad in vertical alignment with the bottom surface of the lift friction pad, a flange with an opening sized to allow the rotation shaft to pass through and a bottom surface with a plurality of bolt holes therethrough, the flange positioned adjacent to and connected to the bottom of the processing chamber outside of the processing region; a pulley connected to the rotation shaft of each of the rotation assemblies; and a rotation motor having a belt sized to contact the pulley on each of the rotation assemblies so that all of the rotation assemblies are rotated at the same time, wherein when the lift assembly is in a lowest position, the lift plate is resting against the lift pocket bottom surface and the lift friction pad is not in contact with and is spaced a distance from the rotation friction pad.
-
Specification