Compact vertical inductors extending in vertical planes

• US 10,276,295 B2
• Filed: 01/30/2017
• Issued: 04/30/2019
• Est. Priority Date: 04/21/2011
• Status: Active Grant

• Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Original Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Inventors: Yen, Hsiao-Tsung, Chen, Huan-Neng, Lin, Yu-Ling, Kuo, Chin-Wei, Chen, Mei-Show, Chen, Ho-Hsiang, Jeng, Min-Chie
• Primary Examiner(s): Chan, Tszfung J
• Application Number:
  US15/419,894
• Publication Number:
  US 20170140867A1
• Time in Patent Office: 820 Days
• Field of Search: 336200, 336232
• CPC Class Codes: H01F 17/0013 with stacked layers
• CPC Class Codes: H01F 2017/002 Details of via holes for interconnecting the layers
• CPC Class Codes: H01F 2017/004 with the coil helically wound around an axis without a core
• CPC Class Codes: H01F 2027/2809 on stacked layers
• CPC Class Codes: H01F 27/2804 Printed windings
• CPC Class Codes: H01L 23/5227 Inductive arrangements or effects of, or between, wiring layers other inductive arrangements H01L23/645
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

A device includes a substrate, and a vertical inductor over the substrate. The vertical inductor includes a plurality of parts formed of metal, wherein each of the parts extends in one of a plurality of planes perpendicular to a major surface of the substrate. Metal lines interconnect neighboring ones of the plurality of parts of the vertical inductor.

Claims

1. An inductor comprising:

a first spiral feature in a first plane over a substrate;

a second spiral feature in a second plane over the substrate; and

a third spiral feature in a third plane over the substrate, each of the first plane, the second plane, and the third plane being perpendicular to a major surface of the substrate, wherein each of the first spiral feature and the second spiral feature comprises a first metal line and a second metal line disconnected from the first metal line, the first metal line extending continuously between adjacent spiral features of the first spiral feature, the second spiral feature, and the third spiral feature, the first metal line forming a part of each of adjacent spiral features, wherein a gap in the first plane between the first metal line and the second metal line is in a different location than a gap in the second plane between the first metal line and the second metal line such that a length of the first metal line in the first plane is different than a length of the first metal line in the second plane, wherein the first metal line and the second metal line in each of the first spiral feature, the second spiral feature, and the third spiral feature are in a same metallization layer.

2. The inductor of claim 1, wherein each spiral feature comprises the first metal line in a first metallization layer and a third metal line in a second metallization layer, the first metal line being electrically coupled to the third metal line by a plurality of vias.

3. The inductor of claim 2, wherein the third metal line is a straight metal line in single plane.

4. The inductor of claim 3, wherein the third metal line is closer to the substrate than the first metal line.

5. The inductor of claim 3, wherein the first metal line comprises a first segment in one plane, a second segment in another plane, and an intermediate segment connecting the first segment to the second segment.

6. The inductor of claim 1, wherein the first spiral feature has a different shape than the second spiral feature, wherein the first plane is adjacent to the second plane.

7. The inductor of claim 6, wherein the third spiral feature has a different shape than the first spiral feature and the second spiral feature, wherein the third plane is adjacent the second plane.

8. A inductor comprising:

a first spiral feature in a first plane over a substrate;

a second spiral feature in a second plane over the substrate; and

a third spiral feature in a third plane over the substrate, each of the first plane, the second plane, and the third plane being perpendicular to a major surface of the substrate;

wherein the first spiral feature and the second spiral feature comprise a first metal line, the first metal line extending in the first plane from a first via and in the second plane to a second via, the first metal line comprising a first interconnect segment extending from the first plane to the second plane; and

wherein the second spiral feature and the third spiral feature comprise a second metal line, the second metal line extending in the second plane from a third via and in the third plane to a fourth via, the second metal line comprising a second interconnect segment extending from the second plane to the third plane, the first interconnect segment being positioned at a different location in the first plane than the second interconnect segment is positioned in the second plane such that an axis perpendicular to the first plane intersects the first interconnect segment but not the second interconnect segment, wherein the first metal line and the second metal line are in a same metallization layer.

9. The inductor of claim 8, wherein the first spiral feature comprises a third metal line, the third metal line not extending between the first plane and an adjacent plane.

10. The inductor of claim 9, wherein the first metal line and the third metal line are separated by a plurality of metallization layers, the first metal line being electrically coupled to the third metal line by a plurality of metal pads and vias.

11. The inductor of claim 8, wherein a first gap in the first spiral feature in the first plane is at a different relative location than a second gap in the second spiral feature in the second plane, the first spiral feature and the second spiral feature being adjacent spiral features.

12. The inductor of claim 11, wherein a third gap in the third spiral feature in the third plane is at a different relative location than the second gap in the second spiral feature in the second plane, the third spiral feature and the second spiral feature being adjacent spiral features.

13. The inductor of claim 12, wherein the first gap is at a different relative location than the third gap.

14. The inductor of claim 8, further comprising a first port line and a second port line, a longitudinal axis of the first port line intersecting a longitudinal axis of the second port line.

15. An inductor comprising:

a first spiral feature in a first plane over a substrate, the first spiral feature comprising a first lower line and a first upper line electrically coupled by a first conductive column;

a second spiral feature in a second plane over the substrate, the second spiral feature comprising a second lower line and a second upper line electrically coupled by a second conductive column; and

a third spiral feature in a third plane over the substrate, the third spiral feature comprising a third lower line and a third upper line electrically coupled by a third conductive column, each of the first plane, the second plane, and the third plane being perpendicular to a major surface of the substrate;

wherein the first upper line extends along the first plane and the second plane, the second upper line extends along the second plane and the third plane;

wherein the first upper line is coupled to the second lower line by a fourth conductive column;

wherein the second upper line is coupled to the third lower line by a fifth conductive column; and

wherein a location of a gap in the second plane between the first upper line and the second upper line is at a different relative location than a location of a gap between the second upper line and the third upper line in the third plane such that an axis perpendicular to the first plane intersects the gap in the second plane but not the gap in the third plane.

16. The inductor of claim 15, wherein the first lower line, the second lower line and the third lower line are a same length.

17. The inductor of claim 15, wherein the first conductive column comprises at least one metal pad and a plurality of metal vias.

18. The inductor of claim 15, further comprising a first port line and a second port line, a first longitudinal axis of the first port line intersecting a second longitudinal axis of the second port line.

19. The inductor of claim 18, wherein the first longitudinal axis is perpendicular to the second longitudinal axis.

20. The inductor of claim 15, wherein a longitudinal axis of a first input/output port is perpendicular to a second input/output port.