Multi-zone reactor, system including the reactor, and method of using the same

• US 10,276,355 B2
• Filed: 03/12/2015
• Issued: 04/30/2019
• Est. Priority Date: 03/12/2015
• Status: Active Grant

• Current Assignee: ASM IP Holding B.V. (ASM International NV)
• Original Assignee: ASM IP Holding B.V. (ASM International NV)
• Inventors: White, Carl Louis, Verghese, Mohith, Shero, Eric James, Dunn, Todd Robert
• Primary Examiner(s): Hassanzadeh, Parviz
• Assistant Examiner(s): Ford, Nathan K
• Application Number:
  US14/656,588
• Publication Number:
  US 20160268107A1
• Time in Patent Office: 1,510 Days
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32513 Sealing means, e.g. sealing between different parts of the vessel
• CPC Class Codes: H01J 37/32715 Workpiece holder
• CPC Class Codes: H01J 37/32733 Means for moving the material to be treated
• CPC Class Codes: H01J 37/32899 Multiple chambers, e.g. cluster tools

Abstract

Multi-zone reactors, systems including a multi-zone reactor, and methods of using the systems and reactors are disclosed. Exemplary multi-zone reactors include a movable susceptor assembly and a moveable plate. The movable susceptor assembly and movable plate can move vertically between reaction zones of a reactor to expose a substrate to multiple processes or reactants.

Claims

1. A multi-zone gas-phase reactor comprising:

a plurality of vertically-stacked reaction zones comprising a first reaction zone and a second reaction zone, wherein each reaction zone comprises a gas inlet on a first side of the multi-zone gas-phase reactor and an exhaust outlet on a second side of the multi-zone gas-phase reactor;

a moveable top plate comprising a bottom surface; and

a movable susceptor assembly comprising a susceptor having a top surface,

wherein a movable processing region comprises the bottom surface, the top surface and one or more reaction zones,

wherein the moveable top plate and the susceptor assembly are each configured to move independently in a vertical direction within the multi-zone gas-phase reactor during processing of a substrate, and

wherein the substrate is disposed on the top surface and is exposed to a first process in the first reaction zone and a second process in the second reaction zone.

2. The multi-zone gas-phase reactor of claim 1, wherein the processing region comprises a cross-flow processing region.

3. The multi-zone gas-phase reactor of claim 1, wherein the susceptor retains a plurality of substrates.

4. The multi-zone gas-phase reactor of claim 1, further comprising a gas curtain between two of the reaction zones.

5. The multi-zone gas-phase reactor of claim 4, wherein the gas curtain comprises an inert gas inlet proximate the exhaust outlet, wherein inert gas travels in a vertical direction from the inert gas inlet to the exhaust outlet.

6. The multi-zone gas-phase reactor of claim 4, wherein the gas curtain comprises an inert gas inlet that runs through a conduit coupled to the moveable top plate.

7. The multi-zone gas-phase reactor of claim 4, wherein the gas curtain comprises an inert gas inlet that runs through a conduit coupled to the susceptor.

8. The multi-zone gas-phase reactor of claim 1, further comprising an inert gas valve system coupled to the gas inlet.

9. The multi-zone gas-phase reactor of claim 1, wherein a number of zones is selected from the group consisting of 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, and 13.

10. The multi-zone gas-phase reactor of claim 1, wherein the susceptor comprises a heater.

11. The multi-zone gas-phase reactor of claim 1, wherein the processing region comprises a direct plasma system.

12. The multi-zone gas-phase reactor of claim 1, further comprising a remote plasma unit coupled to one or more of the reaction zones.

13. The multi-zone gas-phase reactor of claim 1, wherein the moveable top plate comprises a heater.

14. The multi-zone gas-phase reactor of claim 1, wherein the moveable top plate and the susceptor assembly rotate independently.

15. The multi-zone gas-phase reactor of claim 1, wherein the moveable top plate is configured to move continuously through the multi-zone gas-phase reactor.

16. The multi-zone gas-phase reactor of claim 1, wherein movement of the moveable top plate is indexed.

17. The multi-zone gas-phase reactor of claim 16, wherein the susceptor rotates.

18. The multi-zone gas-phase reactor of claim 16, wherein the moveable top plate comprises a showerhead gas distribution system.

19. The multi-zone gas-phase reactor of claim 18, wherein the showerhead gas distribution system is an isothermal gas distribution system.

20. The multi-zone gas-phase reactor of claim 1, wherein the susceptor is configured to move continuously through the multi-zone gas-phase reactor.

21. The multi-zone gas-phase reactor of claim 1, wherein movement of the susceptor is indexed.

22. The multi-zone gas-phase reactor of claim 1, wherein the plurality of vertically-stacked reaction zones comprises a precursor reaction zone and a purge reaction zone.

23. The multi-zone gas-phase reactor of claim 22, wherein the plurality of vertically-stacked reaction zones comprises a precursor reaction zone and two adjacent other precursor reaction zones on either side of the precursor reaction zone.

24. The multi-zone gas-phase reactor of claim 22, wherein an inlet of the precursor reaction zone and an inlet of the purge reaction zone are offset.

25. The multi-zone gas-phase reactor of claim 1, wherein the processing region is dynamically changed.

26. The multi-zone gas-phase reactor of claim 1, wherein the processing region comprises a plurality of reaction zones.

27. A multi-zone gas-phase reactor system comprising:

the multi-zone gas-phase reactor of claim 1;

a reactant gas source coupled to the multi-zone gas-phase reactor;

a purge gas source coupled to the multi-zone gas-phase reactor; and

a vacuum source coupled to the multi-zone gas-phase reactor.