Monitoring a discharge in a plasma process

• US 10,290,477 B2
• Filed: 08/05/2016
• Issued: 05/14/2019
• Est. Priority Date: 02/07/2014
• Status: Active Grant

• Current Assignee: TRUMPF Huettinger Sp zoo (Trumpf GmbH + Company KG)
• Original Assignee: TRUMPF Huettinger Sp zoo (Trumpf GmbH + Company KG)
• Inventors: Gieraltowski, Andrzej, Grabowski, Adam, Lach, Piotr, Zelechowski, Marcin
• Primary Examiner(s): Ferguson, Dion
• Assistant Examiner(s): Sathiraju, Srinivas
• Application Number:
  US15/230,017
• Publication Number:
  US 20160343549A1
• Time in Patent Office: 1,012 Days
• Field of Search: None
• CPC Class Codes: G01R 19/165 Indicating that current or voltage is either above or below a predetermined value or within or outside a predetermined range of values
• CPC Class Codes: H01J 37/32128 using particular waveforms, e.g. polarised waves
• CPC Class Codes: H01J 37/32917 Plasma diagnostics
• CPC Class Codes: H01J 37/32926 Software, data control or modelling
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: H01J 37/32944 Arc detection

Abstract

Systems and methods of monitoring a discharge in a plasma process are disclosed. The methods include supplying the plasma process with a periodic power supply signal, determining a first signal waveform in a first time interval within a first period of the power supply signal, determining a second signal waveform in a second time interval within a second period of the power supply signal, the second time interval being at a position within the second period corresponding to a position of the first time interval within the first period, comparing the second signal waveform with a reference signal waveform to obtain a first comparison result, determining that the first comparison result corresponds to a given first comparison result, and in response, time-shifting one of the second signal waveform and the reference signal waveform, and comparing the time-shifted signal waveform with the non-time-shifted signal waveform to obtain a second comparison result.

Claims

1. A method of monitoring a discharge in a plasma process, the method comprising:

supplying a plasma process with a periodic power supply signal;

determining a first power supply signal waveform in a first time interval within a first period of the power supply signal;

determining a second power supply signal waveform in a second time interval within a second period of the power supply signal, wherein the second time interval is at a position within the second period corresponding to a position of the first time interval within the first period;

comparing the second power supply signal waveform of the second time interval with a reference signal waveform associated with the first power supply signal waveform of the first time interval to thereby obtain a first comparison result;

if the first comparison result corresponds to a given first comparison result, time-shifting one of the second power supply signal waveform and the reference signal waveform, and comparing the time-shifted signal waveform with the other one of the second power supply signal waveform and the reference signal waveform that was not time-shifted to thereby obtain a second comparison result; and

generating an arc detection signal indicating an arc is present in the plasma process if the first comparison result corresponds to the first given comparison result and the second comparison result corresponds to a second given comparison result, respectively.

2. The method of claim 1, further comprising:

determining that no arc is present in the plasma process if the first comparison result corresponds to the first given comparison result and the second comparison result does not correspond to a second given comparison result.

3. The method of claim 1, wherein obtaining the first comparison result comprises:

determining a difference between the second power supply waveform and the reference signal waveform; and

determining if the difference is above or below a given reference value.

4. The method of claim 1, wherein obtaining the second comparison result comprises:

determining a difference between the time-shifted signal waveform and the other signal waveform that was not time-shifted; and

determining if the difference is above or below a given reference value.

5. The method of claim 1, wherein obtaining the first comparison result comprises monitoring if the second signal waveform intersects the reference signal waveform.

6. The method of claim 1, wherein obtaining the second comparison result comprises monitoring if the time-shifted signal waveform intersects the other signal waveform that was not time-shifted.

7. A method of monitoring a discharge in a plasma process, the method comprising:

supplying a plasma process with a periodic power supply signal;

determining a first power supply signal waveform in a first time interval within a first period of the power supply signal;

determining a second power supply signal waveform in a second time interval within a second period of the power supply signal, wherein the second time interval is at a position within the second period corresponding to a position of the first time interval within the first period;

comparing the second power supply signal waveform of the second time interval with a reference signal waveform associated with the first power supply signal waveform of the first time interval to thereby obtain a first comparison result;

if the first comparison result corresponds to a given first comparison result, time-shifting one of the second power supply signal waveform and the reference signal waveform in a first direction, and comparing the time-shifted signal waveform with the other one of the second power supply signal waveform and the reference signal waveform that was not time-shifted to thereby obtain a second comparison result;

time-shifting the signal waveform that was time-shifted in a second direction opposite to the first direction; and

comparing the time-shifted signal waveform in the second direction to the other signal waveform that was not time-shifted to thereby obtain a third comparison result.

8. The method of claim 7, further comprising:

generating an arc detection signal indicating that an arc is present in the plasma process if the first comparison result corresponds to the first given comparison result and at least one of the second comparison result or the third comparison result corresponds to a second given comparison result or a third given comparison result, respectively.

9. A method of monitoring a discharge in a plasma process, the method comprising:

supplying a plasma process with a periodic power supply signal;

determining a first power supply signal waveform in a first time interval within a first period of the power supply signal;

determining a second power supply signal waveform in a second time interval within a second period of the power supply signal, wherein the second time interval is at a position within the second period corresponding to a position of the first time interval within the first period;

comparing the second power supply signal waveform of the second time interval with a reference signal waveform associated with the first power supply signal waveform of the first time interval to thereby obtain a first comparison result;

if the first comparison result corresponds to a given first comparison result, time-shifting one of the second power supply signal waveform and the reference signal waveform, and comparing the time-shifted signal waveform with the other one of the second power supply signal waveform and the reference signal waveform that was not time-shifted to thereby obtain a second comparison result; and

determining the reference signal waveform by one of;

multiplying the first power supply signal waveform in the first interval with a given value, and

adding or subtracting a constant value from the first power supply signal waveform in the first interval.

10. A monitoring device for monitoring a discharge in a plasma process supplied by a power supply signal, comprising:

a first determining device arranged to determine a first power supply signal waveform within a first time interval within a first period of the power supply signal;

a second determining device arranged to determine a second power supply signal waveform within a second time interval within a second period of the power supply signal, wherein the second time interval is at a position in the second period corresponding to a position of the first time interval within the first period;

a first comparator arranged to compare the second power supply signal waveform of the second time interval with a reference signal waveform associated with the first power supply signal waveform of the first time interval and determining a first comparison result;

a first time-shifter arranged to time-shift one of the second power supply signal waveform and the reference signal waveform; and

a second comparator arranged to compare the time-shifted signal with the other one of the second power supply signal waveform and the reference signal waveform that was not time-shifted and determining a second comparison result.

11. The monitoring device of claim 10, further comprising an arc signal generator connected to the first comparator and the second comparator.

12. The monitoring device of claim 11, wherein the arc signal generator is configured to generate an arc detection signal indicating that an arc is present in the plasma process if the first comparison result corresponds to a first given comparison result and the second comparison result corresponds to a second given comparison result, respectively.

13. The monitoring device of claim 10, where at least one of the first comparator or the second comparator is configured to:

determine that no arc is present in the plasma process if the first comparison result does not correspond to a first given comparison result; and

determine that no arc is present in the plasma process if the first comparison result corresponds to the first given comparison result and the second comparison result does not correspond to a second given comparison result.

14. The monitoring device of claim 10, wherein at least one of the first and second comparator comprises a subtracting device for subtracting one signal waveform from another signal waveform.

15. The monitoring device of claim 10, further comprising a reference signal waveform generator arranged to generate the reference signal waveform based on the first power supply signal waveform of the first time interval.

16. The monitoring device of claim 10, further comprising a second time-shifter arranged to time-shift a signal waveform in an opposite direction compared to the time-shift performed by the first time-shifter.

17. The monitoring device of claim 16, further comprising a third comparator for comparing an output signal of the second time-shifter with another signal waveform that has not been time-shifted and determining a third comparison result.

18. The monitoring device of claim 17, further comprising an arc signal generator connected to the first comparator and at least one of the second comparator or the third comparator and configured to generate an arc detection signal indicating that an arc is present in the plasma process if the first comparison result corresponds to the first given comparison result and at least one of the second comparison result or the third comparison result corresponds to a second given comparison result or a third given comparison result, respectively.

19. A plasma process system comprising:

a power supply configured to supply power to a plasma process with a periodic power supply signal; and

a plasma discharge monitor configured to monitor a discharge in the plasma process, comprising;

a first determining device configured to determine a first power supply

signal waveform within a first time interval within a first period of the power supply signal;

a second determining device configured to determine a second power

supply signal waveform within a second time interval within a second period of the power supply signal, wherein the second time interval is at a position in the second period that corresponds to a position of the first time interval within the first period;

a first comparator configured to compare the second power supply signal

waveform of the second time interval with a reference signal waveform associated with the first power supply signal waveform of the first time interval and determining a first comparison result;

a first time-shifter configured to time-shift one of the second power supply

signal waveform and the reference signal waveform; and

a second comparator configured to compare the time-shifted signal with

the other one of the second power supply signal waveform and the reference signal waveform that was not time-shifted and determining a second comparison result.