Integrated photonics including germanium
First Claim
Patent Images
1. A photonic structure comprising:
- dielectric material formed over silicon;
a trench formed in the dielectric material extending to the silicon;
a germanium formation formed in the trench;
a top doping region formed in an area of the germanium formation so that the top doping region is spaced from the trench by a spacing distance equal to or greater than a threshold distance;
a top contact formed on the top doping region, wherein the top contact is formed of a semiconductor compatible metallization material that is reflective to wavelengths in the range of from about 900 nm to about 1600 nm.
1 Assignment
0 Petitions
Accused Products
Abstract
A photonic structure can include in one aspect one or more waveguides formed by patterning of waveguiding material adapted to propagate light energy. Such waveguiding material may include one or more of silicon (single-, poly-, or non-crystalline) and silicon nitride.
204 Citations
20 Claims
-
1. A photonic structure comprising:
-
dielectric material formed over silicon; a trench formed in the dielectric material extending to the silicon; a germanium formation formed in the trench; a top doping region formed in an area of the germanium formation so that the top doping region is spaced from the trench by a spacing distance equal to or greater than a threshold distance; a top contact formed on the top doping region, wherein the top contact is formed of a semiconductor compatible metallization material that is reflective to wavelengths in the range of from about 900 nm to about 1600 nm. - View Dependent Claims (2, 3, 4, 5, 6, 7)
-
-
8. A photonic structure comprising:
-
silicon having a doping region; a germanium formation adapted to receive light transmitted by the silicon; an oppositely doped doping region formed on the germanium formation; a silicide formation formed on the doping region of the silicon; a conductive material formation formed on the silicide formation; and a conductive material formation formed on the germanium formation. - View Dependent Claims (9, 10, 11, 12, 13, 14)
-
-
15. A photonic structure comprising:
-
dielectric material formed on silicon; a trench defined in the dielectric material; a germanium formation disposed within the trench and formed on the silicon; a top doping region and a top contact; and a bottom doping region; and
a bottom contact, wherein the dielectric material is disposed on a horizontally extending surface of the silicon, the horizontally extending surface of the silicon being at a first elevation, and wherein the germanium formation has a bottom elevation in common with the first elevation. - View Dependent Claims (16, 17, 18, 19, 20)
-
Specification