Method and apparatus for design of a metrology target

• US 10,296,692 B2
• Filed: 12/19/2014
• Issued: 05/21/2019
• Est. Priority Date: 12/30/2013
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Chen, Guangqing, Ghan, Justin, Whysong, David Harold
• Primary Examiner(s): Chiang, Jack
• Assistant Examiner(s): Bowers, Brandon
• Application Number:
  US14/577,901
• Publication Number:
  US 20150186582A1
• Time in Patent Office: 1,614 Days
• Field of Search: 716 54
• CPC Class Codes: G03F 7/70625 Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
• CPC Class Codes: G03F 7/70633 Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
• CPC Class Codes: G03F 7/70641 Focus
• CPC Class Codes: G03F 7/70683 Mark designs
• CPC Class Codes: G03F 9/7046 Strategy, e.g. mark, sensor or wavelength selection
• CPC Class Codes: G03F 9/7076 Mark details, e.g. phase grating mark, temporary mark
• CPC Class Codes: G06F 30/39 Circuit design at the physical level physical level design for reconfigurable circuits G06F30/347

Abstract

A method of metrology target design is described. The method includes providing a range or a plurality of values for design parameter of a metrology target and by a processor, selecting, by solving for and/or sampling within the range or the plurality of values for the design parameters, a plurality of metrology target designs having one or more design parameters meeting a constraint for a design parameter of the metrology target.

Claims

1. A method for a metrology process, the method comprising:

providing a range, or a plurality of values, for respective design parameters of a metrology target for formation, as part of or for the metrology process, as a physical metrology target structure in or on a layer or underlying substrate of a physical resist-coated substrate, the design parameters defining one or more selected from;

a geometric characteristic of the metrology target, a characteristic of measurement of the metrology target, and/or a metrology target type;

by a hardware processor system comprising a memory, selecting, by sampling within the range or the plurality of values for the design parameters, a plurality of metrology target designs having one or more design parameters meeting a constraint for a design parameter of the metrology target;

simulating, by the hardware processor system, at least part of the formation and/or measurement of the plurality of metrology target designs using a model; and

storing electronic data of at least one of the simulated metrology target designs in a memory of the hardware processor system,

where the at least one simulated metrology target design is configured for implementation within a physical measurement target structure, and

where the metrology process comprises a step of physically forming the physical measurement target structure based on the stored electronic data, or information derived therefrom, or comprises a step of physically measuring the physical measurement target structure implementing the at least one simulated metrology target design.

2. The method of claim 1, wherein at least one of the design parameters comprises a geometric dimension of the metrology target.

3. The method of claim 1, wherein the constraint is for a design parameter different than the ones for which a range or a plurality of values have been provided.

4. The method of claim 1, wherein providing the range or the plurality of values comprises selection of the range or the plurality of values by a user.

5. The method of claim 1, wherein the constraint is defined by a user.

6. The method of claim 1, wherein the constraint comprises a linear algebraic expression.

7. The method of claim 1, wherein the constraint comprises a relationship between two different geometric dimensions of the metrology target.

8. The method of claim 1, wherein the metrology target design comprises a plurality of layers and the constraint is between a dimension of one layer and a dimension of another layer.

9. The method of claim 1, wherein the design parameters comprise pitch, critical dimension and/or trench width.

10. The method of claim 1, wherein the constraint comprises a physical limitation due to a metrology system used to measure the target.

11. The method of claim 10, wherein the physical limitation includes one or more selected from:

a wavelength of radiation used in the metrology system, polarization of radiation used in the metrology system, numerical aperture of the metrology system, target type, and/or a process parameter.

12. The method of claim 1, wherein selecting by sampling within the range or the plurality of values for the design parameters comprising applying a fixed sampling interval to respective design parameters.

13. The method of claim 12, wherein the sampling interval for one design parameter is different than for another design parameter.

14. The method of claim 1, wherein selecting by sampling within the range or the plurality of values for the design parameters comprising applying a sampling interval to a design parameter and further comprising simulating a performance index for a sampling interval and iteratively reducing the sampling interval until a reducing in the sampling interval does not significantly change the performance index.

15. The method of claim 1, further comprising applying the constraint to the range, or the plurality of values, of the design parameters prior to selecting, by sampling within the range or the plurality of values for the design parameters, the plurality of metrology target designs.

16. The method of claim 1, further comprising solving for a metrology target design having one or more design parameters meeting the constraint.

17. A non-transitory computer readable medium comprising instructions that, when executed, cause a hardware computer system comprising a memory, to:

obtain a range, or a plurality of values, for respective design parameters of a metrology target for formation, as part of or for a metrology process, as a physical metrology target structure in or on a layer or underlying substrate of a physical resist-coated substrate, the design parameters defining one or more selected from;

a geometric characteristic of the metrology target, a characteristic of measurement of the metrology target, and/or a metrology target type;

select, by sampling within the range or the plurality of values for the design parameters, a plurality of metrology target designs having one or more design parameters meeting a constraint for a design parameter of the metrology target;

simulate at least part of the formation and/or measurement of the plurality of metrology target designs using a model; and

storing electronic data of at least one of the simulated metrology target designs in a memory of the hardware processor system,

where the at least one simulated metrology target design is configured for implementation within a physical measurement target structure, and

where the metrology process comprises a step of physically forming the physical measurement target structure based on the stored electronic data, or information derived therefrom, or comprises a step of physically measuring the physical measurement target structure implementing the at least one simulated metrology target design.

18. The non-transitory computer readable medium of claim 17, wherein the instructions are further configured to cause the hardware computer system to solve for a metrology target design having one or more design parameters meeting the constraint.

19. The non-transitory computer readable medium of claim 17, wherein the constraint is for a design parameter different than the ones for which a range or a plurality of values have been provided.

20. The non-transitory computer readable medium of claim 17, wherein the constraint comprises a relationship between two different geometric dimensions of the metrology target.