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Method and apparatus for design of a metrology target

  • US 10,296,692 B2
  • Filed: 12/19/2014
  • Issued: 05/21/2019
  • Est. Priority Date: 12/30/2013
  • Status: Active Grant
First Claim
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1. A method for a metrology process, the method comprising:

  • providing a range, or a plurality of values, for respective design parameters of a metrology target for formation, as part of or for the metrology process, as a physical metrology target structure in or on a layer or underlying substrate of a physical resist-coated substrate, the design parameters defining one or more selected from;

    a geometric characteristic of the metrology target, a characteristic of measurement of the metrology target, and/or a metrology target type;

    by a hardware processor system comprising a memory, selecting, by sampling within the range or the plurality of values for the design parameters, a plurality of metrology target designs having one or more design parameters meeting a constraint for a design parameter of the metrology target;

    simulating, by the hardware processor system, at least part of the formation and/or measurement of the plurality of metrology target designs using a model; and

    storing electronic data of at least one of the simulated metrology target designs in a memory of the hardware processor system,where the at least one simulated metrology target design is configured for implementation within a physical measurement target structure, andwhere the metrology process comprises a step of physically forming the physical measurement target structure based on the stored electronic data, or information derived therefrom, or comprises a step of physically measuring the physical measurement target structure implementing the at least one simulated metrology target design.

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