Plasma etching of dielectric sacrificial material from reentrant multi-layer metal structures
First Claim
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1. A batch method for forming a plurality of three-dimensional structures simultaneously, comprising:
- (A) forming a plurality of successively formed multi-material layers, wherein each successive multi-material layer comprises at least two materials and is formed on and adhered to a previously formed multi-material layer, wherein one of the at least two materials is a structural material and the other of the at least two materials is a sacrificial material, and wherein each successive multi-material layer defines a successive cross-section of the plurality of three-dimensional structures, and wherein the forming of each of the plurality of successive multi-material layers comprises;
(i) depositing a first of the at least two materials;
(ii) depositing a second of the at least two materials;
(iii) planarizing the first and second materials to set a boundary level for the multi-material layer; and
wherein the forming of a given one of the plurality of successively formed multi-material layers comprises;
(i) applying a first patternable mold material (PMM), a portion of which forms a sacrificial material portion of the given multi-material layer;
(ii) patterning the first PMM to form a first pattern of sacrificial material of the given multi-material layer;
(iii) depositing a structural material in openings in the first pattern of sacrificial material to form another portion of the given multi-material layer;
(iv) planarizing the sacrificial material and the structural material to set a boundary level for the given multi-material layer; and
(B) after the forming of the plurality of successive multi-material layers, separating at least a portion of the sacrificial material from the structural material of multiple multi-material layers via plasma etching,wherein after formation of a selected multi-material layer but prior to the completion of the formation of all multi-material layers, at least one intermediate release operation is performed to release at least selected regions of the sacrificial material from multiple multi-material layers including at least one reentrant region existing under the selected layer and formed by at least one region of structural material overlaying sacrificial material and thereafter depositing a second sacrificial material and thereafter forming at least one additional multi-material layer above the selected layer and the second sacrificial material.
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Abstract
Embodiments are directed to forming reentrant multi-layer micro-scale or millimeter scale three dimensional structures, parts, components, or devices where each layer is formed from a plurality of deposited materials and more specifically where each layer is formed from at least one metal structural material and at least one organic sacrificial material (e.g. polymer) that are co-planarized and a portion of the sacrificial material located on a plurality of layers is removed after formation of the plurality of layers via one or more plasma etching operations.
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Citations
24 Claims
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1. A batch method for forming a plurality of three-dimensional structures simultaneously, comprising:
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(A) forming a plurality of successively formed multi-material layers, wherein each successive multi-material layer comprises at least two materials and is formed on and adhered to a previously formed multi-material layer, wherein one of the at least two materials is a structural material and the other of the at least two materials is a sacrificial material, and wherein each successive multi-material layer defines a successive cross-section of the plurality of three-dimensional structures, and wherein the forming of each of the plurality of successive multi-material layers comprises; (i) depositing a first of the at least two materials; (ii) depositing a second of the at least two materials; (iii) planarizing the first and second materials to set a boundary level for the multi-material layer; and wherein the forming of a given one of the plurality of successively formed multi-material layers comprises; (i) applying a first patternable mold material (PMM), a portion of which forms a sacrificial material portion of the given multi-material layer; (ii) patterning the first PMM to form a first pattern of sacrificial material of the given multi-material layer; (iii) depositing a structural material in openings in the first pattern of sacrificial material to form another portion of the given multi-material layer; (iv) planarizing the sacrificial material and the structural material to set a boundary level for the given multi-material layer; and (B) after the forming of the plurality of successive multi-material layers, separating at least a portion of the sacrificial material from the structural material of multiple multi-material layers via plasma etching, wherein after formation of a selected multi-material layer but prior to the completion of the formation of all multi-material layers, at least one intermediate release operation is performed to release at least selected regions of the sacrificial material from multiple multi-material layers including at least one reentrant region existing under the selected layer and formed by at least one region of structural material overlaying sacrificial material and thereafter depositing a second sacrificial material and thereafter forming at least one additional multi-material layer above the selected layer and the second sacrificial material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 23)
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22. A method for the batch formation of a plurality of multi-layer structures, comprising:
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successively forming a plurality of multi-material layers, wherein each successive multi-material layer is formed on and adhered to a preceding multi-material layer, and wherein each of the plurality of multi-material layers comprises both a structural material and a sacrificial material; and after forming the plurality of adhered multi-material layers, removing the sacrificial material from the plurality of multi-material layers to leave a plurality of multi-layer structures comprising the structural material, wherein the plurality of multi-layer structures each comprise at least one reentrant feature formed from structural material overlaying sacrificial material, wherein the sacrificial material comprises an organic material that is removed at least in part by plasma etching, and wherein after formation of a selected multi-material layer but prior to the completion of the formation of all multi-material layers, at least one intermediate release operation is performed to release at least selected regions of the sacrificial material from multiple multi-material layers including at least one reentrant region existing under the selected layer and formed by at least one region of structural material overlaying sacrificial material and thereafter depositing a second sacrificial material and thereafter forming at least one additional multi-material layer above the selected layer and the second sacrificial material. - View Dependent Claims (24)
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Specification