Micro LED display
First Claim
Patent Images
1. A display substrate comprising:
- a plurality of separate micro LED devices bonded to a corresponding plurality of separate driver contacts; and
a common contact line formed of a transparent material directly over and in electrical contact with a top surface of each of the plurality of separate micro LED devices, wherein each of the plurality of separate micro LED devices comprises;
a p-n diode including;
a bottom surface directly beneath the top surface;
a p-doped layer;
an n-doped layer; and
a quantum well layer between the n-doped layer and the p-doped layer;
wherein the p-n diode is less than 3 μ
m thick and less than 10 μ
m wide; and
a lower metallization layer including a top surface and a bottom surface, wherein the top surface of the lower metallization layer is underneath the bottom surface of the p-n diode, and the bottom surface of the lower metallization layer is directly over and bonded to a corresponding driver contact;
wherein a maximum thickness between the top surface of the p-n diode and the bottom surface of the lower metallization layer is less than 5 μ
m.
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Abstract
A micro light emitting diode (LED) and a method of forming an array of micro LEDs for transfer to a receiving substrate are described. The micro LED structure may include a micro p-n diode and a metallization layer, with the metallization layer between the micro p-n diode and a bonding layer. A conformal dielectric barrier layer may span sidewalls of the micro p-n diode. The micro LED structure and micro LED array may be picked up and transferred to a receiving substrate.
211 Citations
20 Claims
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1. A display substrate comprising:
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a plurality of separate micro LED devices bonded to a corresponding plurality of separate driver contacts; and a common contact line formed of a transparent material directly over and in electrical contact with a top surface of each of the plurality of separate micro LED devices, wherein each of the plurality of separate micro LED devices comprises; a p-n diode including; a bottom surface directly beneath the top surface; a p-doped layer; an n-doped layer; and a quantum well layer between the n-doped layer and the p-doped layer; wherein the p-n diode is less than 3 μ
m thick and less than 10 μ
m wide; anda lower metallization layer including a top surface and a bottom surface, wherein the top surface of the lower metallization layer is underneath the bottom surface of the p-n diode, and the bottom surface of the lower metallization layer is directly over and bonded to a corresponding driver contact; wherein a maximum thickness between the top surface of the p-n diode and the bottom surface of the lower metallization layer is less than 5 μ
m. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification