Selecting feature patterns and corresponding layout positions for viewpoint measurement

• US 10,304,206 B2
• Filed: 01/19/2017
• Issued: 05/28/2019
• Est. Priority Date: 01/19/2016
• Status: Active Grant

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Nakazato, Yusuke, Kotake, Daisuke, Katayama, Akihiro
• Primary Examiner(s): Hung, Yubin
• Application Number:
  US15/410,030
• Publication Number:
  US 20170206676A1
• Time in Patent Office: 859 Days
• CPC Class Codes: G02B 27/32 Fiducial marks and measuring scales within the optical system
• CPC Class Codes: G06T 11/60 Editing figures and text; Combining figures or text
• CPC Class Codes: G06T 2207/10024 Color image
• CPC Class Codes: G06T 2207/30208 Marker matrix
• CPC Class Codes: G06T 7/33 using feature-based methods
• CPC Class Codes: G06T 7/73 using feature-based methods
• CPC Class Codes: G06T 7/74 involving reference images or patches
• CPC Class Codes: G06T 7/75 involving models

Abstract

An information processing apparatus: obtains a feature distribution by calculating a distribution of features, existing in an environment, that can be used to measure a position and orientation of a measurement viewpoint; decides on a feature pattern to be laid out and a layout position of the feature pattern in the environment that enable the obtainment of a feature distribution that enhances an accuracy at which the position and orientation of the measurement viewpoint is calculated; and presents the feature pattern and the layout position of the feature pattern that have been decided on.

Claims

1. An information processing apparatus comprising:

a calculation circuit configured to obtain a feature distribution by calculating a distribution of features, existing in an environment, that can be used to measure a position and orientation of a measurement viewpoint;

a deciding circuit configured to decide on a feature pattern to be laid out and a layout position of the feature pattern in the environment that enable the obtainment of a feature distribution according to a criteria for measuring accuracy at which the position and orientation of the measurement viewpoint is calculated; and

a presenting circuit configured to present the feature pattern and the layout position of the feature pattern decided on by the deciding circuit.

2. The apparatus according to claim 1,

wherein the deciding circuit decides on the feature pattern to be laid out and the layout position of the feature pattern such that a uniformity of the feature distribution in the environment is enhanced.

3. The apparatus according to claim 1,

wherein the deciding circuit decides on the feature pattern to be laid out and the layout position of the feature pattern further taking into consideration an evaluation of a degree to which the feature pattern at the layout position matches the environment.

4. The apparatus according to claim 3,

wherein the degree of matching to the environment is a degree to which attribute information of the environment matches attribute information of the feature pattern.

5. The apparatus according to claim 4,

wherein the deciding circuit obtains the attribute information of the environment by analyzing an image obtained by capturing the environment.

6. The apparatus according to claim 5,

wherein the attribute information of the environment is a ratio of straight lines among detected lines contained in the image.

7. The apparatus according to claim 1,

wherein the deciding circuit decides on the feature pattern to be laid out from among a plurality of feature patterns prepared in advance.

8. The apparatus according to claim 1,

wherein the deciding circuit generates the feature pattern to be laid out by combining graphics.

9. The apparatus according to claim 1,

wherein the deciding circuit lays out a plurality of feature patterns in the layout position.

10. The apparatus according to claim 1,

wherein the deciding circuit specifies a size of a layout surface in a region where the feature pattern is laid out, and decides on a size of the feature pattern on the basis of the specified size.

11. The apparatus according to claim 10,

wherein the deciding circuit decides on the layout surface by carrying out surface fitting, using a range image of the environment, on each of regions obtained by dividing a two-dimensional image of the environment.

12. The apparatus according to claim 1,

wherein the calculation circuit calculates the feature distribution as a distribution of features of the same type as a feature used to calculate the position and orientation of the measurement viewpoint.

13. The apparatus according to claim 12,

wherein the feature used to calculate the position and orientation of the measurement viewpoint is a corner point that exists in the environment.

14. The apparatus according to claim 1, further comprising:

an obtainment circuit configured to obtain a moving range of the measurement viewpoint,

wherein the deciding circuit decides on the feature pattern to be laid out and the layout position of the feature pattern such that the accuracy at which the position and orientation of the measurement viewpoint is calculated is enhanced at a measurement viewpoint within the moving range.

15. The apparatus according to claim 14,

wherein in the case where the same layout position is used for a plurality of measurement viewpoints within the moving range, the deciding circuit decides on the feature pattern having prioritized a measurement viewpoint, among the plurality of measurement viewpoints, that is closest to the layout position of the feature pattern.

16. The apparatus according to claim 14,

wherein for feature pattern layout position candidates determined from each of a plurality of measurement viewpoints within the moving range, the deciding circuit decides on the feature pattern to be laid out from among feature patterns for which a maximum value of a distance from the layout position candidate to the plurality of measurement viewpoints is within a detectable distance range.

17. The apparatus according to claim 1, further comprising:

an output circuit configured to output the feature pattern decided to be laid out by the deciding circuit to an output apparatus which outputs the feature pattern as an object that can actually be laid out.

18. The apparatus according to claim 1, further comprising:

a camera configured to measure the environment,

wherein the calculation circuit calculates the feature distribution on the basis of measured data measured by the camera.

19. The apparatus according to claim 18,

wherein the measured data is an image obtained by capturing the environment using a camera.

20. The apparatus according to claim 19,

wherein the measured data further includes a range image.

21. A control method for an information processing apparatus, the method comprising:

obtaining a feature distribution by calculating a distribution of features, existing in an environment, that can be used to measure a position and orientation of a measurement viewpoint;

deciding on a feature pattern to be laid out and a layout position of the feature pattern in the environment that enable the obtainment of a feature distribution according to a criteria for measuring accuracy at which the position and orientation of the measurement viewpoint is calculated; and

presenting the feature pattern and the layout position of the feature pattern that have been decided on.

22. A non-transitory computer-readable storage medium on which is stored a program for causing a computer to execute an information processing method, the method comprising:

obtaining a feature distribution by calculating a distribution of features, existing in an environment, that can be used to measure a position and orientation of a measurement viewpoint;

deciding on a feature pattern to be laid out and a layout position of the feature pattern in the environment that enable the obtainment of a feature distribution according to a criteria for measuring accuracy at which the position and orientation of the measurement viewpoint is calculated; and

presenting the feature pattern and the layout position of the feature pattern that have been decided on.