Arrays of integrated analytical devices and methods for production

• US 10,310,178 B2
• Filed: 04/16/2018
• Issued: 06/04/2019
• Est. Priority Date: 06/17/2012
• Status: Active Grant

• Current Assignee: Pacific Bioscience of California Incorporated (L'Oreal SA)
• Original Assignee: Pacific Bioscience of California Incorporated (L'Oreal SA)
• Inventors: Saxena, Ravi, Ru, Michael Tzu, Orimoto, Takashi Whitney, Grot, Annette, Foquet, Mathieu, Chou, Hou-Pu
• Primary Examiner(s): Lepisto, Ryan A
• Application Number:
  US15/953,792
• Publication Number:
  US 20180239087A1
• Time in Patent Office: 414 Days
• CPC Class Codes: B29D 11/0073 Optical laminates
• CPC Class Codes: B29D 17/007 Forming the relief pattern on a support larger than the record
• CPC Class Codes: B29L 2011/005 Fresnel lenses
• CPC Class Codes: B29L 2011/0066 Optical filters
• CPC Class Codes: B29L 2011/0075 Light guides, optical cables
• CPC Class Codes: C12Q 1/6869 Methods for sequencing
• CPC Class Codes: G01N 2021/6467 Axial flow and illumination
• CPC Class Codes: G01N 2021/6471 Special filters, filter wheel
• CPC Class Codes: G01N 2021/6478 Special lenses
• CPC Class Codes: G01N 2021/7713 in core
• CPC Class Codes: G01N 21/6454 using an integrated detector array
• CPC Class Codes: G01N 21/648 using evanescent coupling or surface plasmon coupling for the excitation of fluorescence
• CPC Class Codes: G01N 2201/0873 Using optically integrated constructions
• CPC Class Codes: G02B 2006/12038 Glass (SiO2 based materials)
• CPC Class Codes: G02B 2006/12109 Filter
• CPC Class Codes: G02B 5/189 Structurally combined with optical elements not having diffractive power
• CPC Class Codes: G02B 6/02123 characterised by the method of manufacture of the grating photolithography G03F7/0005
• CPC Class Codes: G02B 6/12002 Three-dimensional structures
• CPC Class Codes: G02B 6/12004 Combinations of two or more optical elements
• CPC Class Codes: G02B 6/124 Geodesic lenses or integrated gratings
• CPC Class Codes: G02B 6/136 : by etching

Abstract

Arrays of integrated analytical devices and their methods for production are provided. The arrays are useful in the analysis of highly multiplexed optical reactions in large numbers at high densities, including biochemical reactions, such as nucleic acid sequencing reactions. The integrated devices allow the highly sensitive discrimination of optical signals using features such as spectra, amplitude, and time resolution, or combinations thereof. The arrays and methods of the invention make use of silicon chip fabrication and manufacturing techniques developed for the electronics industry and highly suited for miniaturization and high throughput.

Claims

1. An array of integrated analytical devices comprising:

a substrate layer;

a waveguide module layer disposed on the substrate layer;

wherein the waveguide module layer comprises a lower waveguide cladding material, a waveguide core material, an upper waveguide cladding material, and an etch hardmask layer disposed between the waveguide core material and the upper waveguide cladding material;

a zero-mode waveguide module layer disposed on the waveguide module layer;

wherein the zero-mode waveguide module layer comprises a plurality of nanometer-scale apertures penetrating to the waveguide module layer.

2. The array of claim 1, wherein the plurality of nanometer-scale apertures is formed by etching up to the etch hardmask layer.

3. The array of claim 1, wherein the upper waveguide cladding material is SiO₂.

4. The array of claim 1, wherein the waveguide core material is Si₃N₄.

5. The array of claim 1, wherein the at least one of the plurality of nanometer-scale apertures is partially backfilled.

6. The array of claim 5, wherein the at least one nanometer-scale aperture is partially backfilled using atomic layer deposition or low pressure chemical vapor deposition.

7. The array of claim 1, wherein the substrate layer is a detector layer.

8. The array of claim 7, wherein the detector layer comprises a color-separation layer.

9. The array of claim 1, wherein the substrate layer is a CMOS wafer.

10. The array of claim 1, further comprising a collection module layer disposed between the substrate layer and the waveguide module layer.

11. The array of claim 10, wherein the collection module layer comprises a Fresnel lens structure.

12. The array of claim 11, wherein the Fresnel lens structure is a phase Fresnel zone plate.

13. The array of claim 10, further comprising a filter module layer disposed between the substrate layer and the collection module layer.

14. The array of claim 13, wherein the filter module layer comprises a dielectric filter.

15. The array of claim 13, wherein the filter module layer comprises an absorptive filter.

16. The array of claim 1, wherein at least one of the plurality of nanometer-scale apertures comprises a fluid sample comprising a fluorescent species.

17. The array of claim 16, wherein the fluorescent species is a fluorescently labeled nucleotide analog.

18. The array of claim 1, wherein the plurality of nanometer-scale apertures comprise at least 100 nanometer-scale apertures.

19. The array of claim 1, wherein the plurality of nanometer-scale apertures have a density of at least 1000 apertures per cm².