In-cell touch liquid crystal display apparatus, method of manufacturing the same, method of manufacturing thin film transistor array substrate, and method of manufacturing color filter array substrate

• US 10,310,345 B2
• Filed: 08/29/2017
• Issued: 06/04/2019
• Est. Priority Date: 10/31/2014
• Status: Active Grant

• Current Assignee: LG Display Co., Ltd.
• Original Assignee: LG Display Co., Ltd.
• Inventors: Park, Yong Chan, Kim, Jin Seong, Kim, Seung Kyeom
• Primary Examiner(s): Dudek, James A
• Application Number:
  US15/690,204
• Publication Number:
  US 20180004056A1
• Time in Patent Office: 644 Days
• CPC Class Codes: G02F 1/13338 Input devices, e.g. touch panels
• CPC Class Codes: G02F 1/13394 spacers regularly patterned on the cell subtrate, e.g. walls, pillars G02F1/133377 takes precedence
• CPC Class Codes: G02F 1/136286 Wiring, e.g. gate line, drain line

Abstract

Disclosed are an in-cell touch liquid crystal display (LCD) device based on a twisted nematic (TN) mode, a method of manufacturing the same, a method of manufacturing a thin film transistor (TFT) array substrate, and a method of manufacturing a color filter array substrate. The TFT array substrate includes a TFT disposed in a pixel area defined by an intersecting gate line and data line, a conductive line disposed on the TFT, and a transparent conductive layer in electrical contact with the conductive line. The color filter array substrate includes a light shield layer, a color filter, an overcoat layer covering the light shield layer and the color filter, a column spacer disposed on the overcoat layer, and a common electrode disposed on the overcoat layer and the column spacer, where the conductive line supplies the common electrode with a common voltage or a touch driving signal.

Claims

1. A method of manufacturing a thin film transistor (TFT) array substrate, the method comprising:

forming a data line and a TFT on a first glass substrate;

forming a first passivation layer disposed above the TFT;

forming a conductive line above the first passivation layer in a region horizontally overlapping with the data line;

forming a second passivation layer on the conductive line;

forming a transparent conductive layer on the conductive line and in electrical contact with the conductive line; and

forming a pixel electrode disposed above the first passivation layer and electrically connected to the TFT through a first contact hole in the first passivation layer, the pixel electrode being on a same layer as at least a part of the transparent conductive layer.

2. The method of claim 1, wherein forming the pixel electrode comprises:

forming the first contact hole in the first passivation layer to expose a drain electrode of the TFT.

3. The method of claim 2, wherein the first contact hole is formed through the first passivation layer and the second passivation layer, and wherein the pixel electrode is formed on the second passivation layer around an opening of the first contact hole.

4. The method of claim 2, further comprising forming a second contact hole through the second passivation layer to expose the conductive line, wherein the first contact hole and the second contact hole are formed by a same mask process.

5. The method of claim 1, wherein the pixel electrode and the transparent conductive layer are formed by a same mask process.

6. The method of claim 1, wherein the first passivation layer is formed of photo acryl to have a thickness of 2.0 μ

m to 3.0 μ

m.

7. The method of claim 1, wherein forming the conductive line comprises:

forming a buffer layer on the first passivation layer; and

forming the conductive line on an upper surface of the buffer layer in the region horizontally overlapping with the data line.

8. The method of claim 1, further comprising manufacturing a color filter array substrate, the manufacturing of the color filter array substrate comprising:

forming a light shield layer and a color filter on a second glass substrate;

forming an overcoat layer to cover the light shield layer and the color filter;

forming a column spacer on the overcoat layer to horizontally overlap with the light shield layer;

forming a common electrode on the overcoat layer and the column spacer; and

patterning the common electrode as a plurality of blocks to form a plurality of touch electrodes.

9. The method of claim 8, wherein the column spacer is formed to horizontally overlap with the data line formed on the first glass substrate.

10. The method of claim 8, wherein the column spacer horizontally overlaps with the conductive line and the conductive line is configured to supply the common electrode with a common voltage or a touch driving signal through the transparent conductive layer.

11. The method of claim 1, further comprising manufacturing an in-cell touch liquid crystal display device comprising a TFT array substrate of the TFT, the manufacturing of the in-cell touch liquid crystal display device comprising:

providing a color filter array substrate comprising a common electrode patterned to form a plurality of touch electrodes;

providing a liquid crystal layer between the TFT array substrate and the color filter array substrate; and

bonding the TFT array substrate to the color filter array substrate to bring the conductive line into electrical contact with one of the plurality of touch electrodes via the transparent conductive layer.