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Variable adjustment for precise matching of multiple chamber cavity housings

  • US 10,312,129 B2
  • Filed: 02/09/2018
  • Issued: 06/04/2019
  • Est. Priority Date: 09/29/2015
  • Status: Active Grant
First Claim
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1. A reaction system for processing multiple semiconductor substrates, comprising:

  • a first chamber cavity for processing a first substrate;

    a second chamber cavity for processing a second substrate;

    a first susceptor in the first chamber cavity, the first susceptor configured to hold the first substrate;

    a second susceptor in the second chamber cavity, the second susceptor configured to hold the second substrate;

    a main lift assembly configured to move the first susceptor and the second susceptor in a vertical direction, the main lift assembly comprising;

    a main lift drive;

    a horizontal bar configured to be moved by the main lift drive;

    a first baseplate attached to a first side of the horizontal bar, the first baseplate configured to guide the first susceptor; and

    a second baseplate attached to a second side of the horizontal bar, the second baseplate configured to guide the second susceptor; and

    a slave vertical lift assembly assigned to the second chamber cavity, the slave vertical lift assembly comprising;

    a reference bar configured to have a fixed position relative to a main lift bar;

    a movable tie bar configured to move in a vertical position relative to the reference bar;

    a first set of movable blocks coupled to the movable tie bar;

    a first set of sliding brackets mounted to the first set of movable blocks, the first set of sliding brackets configured to hold the second baseplate and a first bellows mounting plate;

    a set of rails for guiding movement of the first set of movable blocks; and

    a jacking screw mounted within the reference bar and the movable tie bar, wherein a rotation of the jacking screw causes a vertical movement of the second susceptor.

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