Variable adjustment for precise matching of multiple chamber cavity housings

• US 10,312,129 B2
• Filed: 02/09/2018
• Issued: 06/04/2019
• Est. Priority Date: 09/29/2015
• Status: Active Grant

• Current Assignee: ASM IP Holding B.V. (ASM International NV)
• Original Assignee: ASM IP Holding B.V. (ASM International NV)
• Inventors: Coomer, Stephen Dale
• Primary Examiner(s): Pence, Jethro M.
• Application Number:
  US15/892,756
• Publication Number:
  US 20180166315A1
• Time in Patent Office: 480 Days
• Field of Search: None
• CPC Class Codes: H01L 21/68 for positioning, orientation or alignment
• CPC Class Codes: H01L 21/68742 characterised by a lifting arrangement, e.g. lift pins
• CPC Class Codes: H01L 21/68785 characterised by the mechanical construction of the susceptor, stage or support
• CPC Class Codes: H01L 21/68792 characterised by the construction of the shaft

Abstract

A vertical adjustment assembly is disclosed in order to provide for matching vertical positions of two substrates within separate chambers or cavities of a reaction system for processing of semiconductor substrates. The vertical adjustment assembly, in cooperation with a main lift driver, can provide for a more accurate positioning of the substrates to account for a tolerance stack-up error.

Claims

1. A reaction system for processing multiple semiconductor substrates, comprising:

a first chamber cavity for processing a first substrate;

a second chamber cavity for processing a second substrate;

a first susceptor in the first chamber cavity, the first susceptor configured to hold the first substrate;

a second susceptor in the second chamber cavity, the second susceptor configured to hold the second substrate;

a main lift assembly configured to move the first susceptor and the second susceptor in a vertical direction, the main lift assembly comprising;

a main lift drive;

a horizontal bar configured to be moved by the main lift drive;

a first baseplate attached to a first side of the horizontal bar, the first baseplate configured to guide the first susceptor; and

a second baseplate attached to a second side of the horizontal bar, the second baseplate configured to guide the second susceptor; and

a slave vertical lift assembly assigned to the second chamber cavity, the slave vertical lift assembly comprising;

a reference bar configured to have a fixed position relative to a main lift bar;

a movable tie bar configured to move in a vertical position relative to the reference bar;

a first set of movable blocks coupled to the movable tie bar;

a first set of sliding brackets mounted to the first set of movable blocks, the first set of sliding brackets configured to hold the second baseplate and a first bellows mounting plate;

a set of rails for guiding movement of the first set of movable blocks; and

a jacking screw mounted within the reference bar and the movable tie bar, wherein a rotation of the jacking screw causes a vertical movement of the second susceptor.

2. The system of claim 1, wherein the jacking screw raises or lowers the second susceptor to match a position of the second substrate in the second chamber cavity with a position of the first substrate in the first chamber cavity.

3. The system of claim 1, further comprising a lower threaded nut, a thrust bearing race, an upper threaded nut, and a helicoil insert in contact with the jacking screw.

4. The system of claim 3, wherein the thrust bearing race comprises a lower thrust bearing race, a thrust bearing roller and cage, and an upper thrust bearing race.

5. The system of claim 1, wherein the rotation of the jacking screw is performed by a human operator or a programmable robot.

6. The system of claim 1, further comprising a set of micrometers to provide a tripod leveling to the first bellows mounting plate.