Process window analysis
First Claim
1. A method comprising:
- acquiring, by a processor, first inspection data collected by using a first inspection modality during a first inspection process of a substrate having multiple instances of a pattern of features, wherein each of the instances of the pattern of features is formed by a fabrication process utilizing different respective sets of process parameters associated with the fabrication process of the substrate;
identifying, by the processor, defects at locations in the instances of the pattern based on the first inspection data;
analyzing, by the processor, characteristics of the defects identified in the first inspection data to select a first set of the locations at which the first inspection data is indicative of an influence of the process parameters associated with the fabrication process on the defects;
responsive to selecting the first set of the locations, causing, by the processor, a second imaging modality to acquire second inspection data of the substrate at the first set of the locations during a second inspection process, wherein the second inspection modality corresponds to a finer resolution than the first inspection modality;
analyzing, by the processor, one or more defects appearing in the second inspection data to select, from the first set of the locations, a second set of the locations at which the second inspection data is indicative of a range of the process parameters, wherein the process parameters comprise a focal adjustment and an exposure level applied in the fabrication process to form one or more of the instances of the pattern of features on the substrate; and
providing the range of the process parameters for fabrication of a target device that is to include the pattern.
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Abstract
A method for process analysis includes acquiring first inspection data, using a first inspection modality, with respect to a substrate having multiple instances of a predefined pattern of features formed thereon using different, respective sets of process parameters. Characteristics of defects identified in the first inspection data are processed so as to select a first set of defect locations in which the first inspection data are indicative of an influence of the process parameters on the defects. Second inspection data are acquired, using a second inspection modality having a finer resolution than the first inspection modality, of the substrate at the locations in the first set. The defects appearing in the second inspection data are analyzed so as to select, from within the first set of the locations, a second set of the locations in which the second inspection data are indicative of an optimal range of the process parameters.
13 Citations
16 Claims
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1. A method comprising:
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acquiring, by a processor, first inspection data collected by using a first inspection modality during a first inspection process of a substrate having multiple instances of a pattern of features, wherein each of the instances of the pattern of features is formed by a fabrication process utilizing different respective sets of process parameters associated with the fabrication process of the substrate; identifying, by the processor, defects at locations in the instances of the pattern based on the first inspection data; analyzing, by the processor, characteristics of the defects identified in the first inspection data to select a first set of the locations at which the first inspection data is indicative of an influence of the process parameters associated with the fabrication process on the defects; responsive to selecting the first set of the locations, causing, by the processor, a second imaging modality to acquire second inspection data of the substrate at the first set of the locations during a second inspection process, wherein the second inspection modality corresponds to a finer resolution than the first inspection modality; analyzing, by the processor, one or more defects appearing in the second inspection data to select, from the first set of the locations, a second set of the locations at which the second inspection data is indicative of a range of the process parameters, wherein the process parameters comprise a focal adjustment and an exposure level applied in the fabrication process to form one or more of the instances of the pattern of features on the substrate; and providing the range of the process parameters for fabrication of a target device that is to include the pattern. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A system comprising:
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a memory; and a processor, operatively coupled with the memory, to; acquire first inspection data collected by using a first inspection modality during a first inspection process of a substrate having multiple instances of a pattern of features, wherein each of the instances of the pattern of features is formed by a fabrication process utilizing different respective sets of process parameters associated with the fabrication process of the substrate; identify defects at locations in the instances of the pattern based on the first inspection data; analyze characteristics of the defects identified in the first inspection data to select a first set of the locations at which the first inspection data is indicative of an influence of the process parameters associated with the fabrication process on the defects; responsive to selecting the first set of the locations, cause a second imaging modality to acquire second inspection data of the substrate at the first set of the locations during a second inspection process, wherein the second inspection modality corresponds to a finer resolution than the first inspection modality; analyze one or more defects appearing in the second inspection data to select, from the first set of the locations, a second set of the locations at which the second inspection data is indicative of a range of the process parameters, wherein the process parameters comprise a focal adjustment and an exposure level applied in the fabrication process to form one or more of the instances of the pattern of features on the substrate; and provide the range of the process parameters for fabrication of a target device that is to include the pattern. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15)
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16. A non-transitory computer-readable medium storing instructions, which when executed by a processor, cause the processor to:
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acquire first inspection data collected by using a first inspection modality during a first inspection process of a substrate having multiple instances of a pattern of features, wherein each of the instances of the pattern of features is formed by a fabrication process utilizing different respective sets of process parameters associated with the fabrication process of the substrate; identify defects at locations in the instances of the pattern based on the first inspection data; analyze characteristics of the defects identified in the first inspection data to select a first set of the locations at which the first inspection data is indicative of an influence of the process parameters associated with the fabrication process on the defects; responsive to selecting the first set of the locations, cause a second imaging modality to acquire second inspection data of the substrate at the first set of the locations during a second inspection process, wherein the second inspection modality corresponds to a finer resolution than the first inspection modality; analyze one or more defects appearing in the second inspection data to select, from the first set of the locations, a second set of the locations at which the second inspection data is indicative of a range of the process parameters, wherein the process parameters comprise a focal adjustment and an exposure level applied in the fabrication process to form one or more of the instances of the pattern of features on the substrate; and provide the range of the process parameters for fabrication of a target device that is to include the pattern.
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Specification