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Semiconductor device

  • US 10,312,233 B2
  • Filed: 09/16/2015
  • Issued: 06/04/2019
  • Est. Priority Date: 09/30/2014
  • Status: Active Grant
First Claim
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1. A semiconductor device, comprising:

  • a substrate;

    a drift layer of a first conductivity type provided on said substrate;

    a base region of a second conductivity type formed on said drift layer;

    a source region of the first conductivity type located in said base region;

    a trench passing through said base region and said source region, a bottom of the trench reaching said drift layer, the trench dividing the semiconductor device into a plurality of regions including cell regions and protective contact regions in a plan view;

    a protective diffusion layer of the second conductivity type disposed on the bottom of said trench in said drift layer, the protective diffusion layer spanning an entire width of the trench in a cross-sectional view;

    a gate insulating film formed on an inner wall of said trench;

    a gate electrode embedded in said trench with said gate insulating film therebetween; and

    a source electrode electrically connected to said source region,whereinthree of the protective contact regions closest to one another are disposed at vertices of a triangle in the plan view, the vertices of the triangle corresponding to centers of the three of said-protective contact regions, the triangle being an acute triangle,each of the protective contact regions connects said protective diffusion layer to said source electrode,andsaid cell regions and said protective contact regions each have a same width in the plan view.

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