Counter flow mixer for process chamber

• US 10,322,384 B2
• Filed: 03/10/2016
• Issued: 06/18/2019
• Est. Priority Date: 11/09/2015
• Status: Active Grant

• Current Assignee: ASM IP Holding B.V. (ASM International NV)
• Original Assignee: ASM IP Holding B.V. (ASM International NV)
• Inventors: Stumpf, John F., Wuester, Chris
• Primary Examiner(s): Zervigon, Rudy
• Application Number:
  US15/067,028
• Publication Number:
  US 20170130332A1
• Time in Patent Office: 1,195 Days
• Field of Search: 118715, 15634533
• CPC Class Codes: B01F 2025/918 Counter current flow, i.e. flows moving in opposite direction and colliding
• CPC Class Codes: B01F 23/10 Mixing gases with gases
• CPC Class Codes: B01F 25/25 Mixing by jets impinging against collision plates
• CPC Class Codes: B01F 25/3131 with additional mixing means other than injector mixers, e.g. screens, baffles or rotating elements
• CPC Class Codes: B01F 25/3133 characterised by the specific design of the injector
• CPC Class Codes: B01F 25/4334 Mixers with a converging cross-section
• CPC Class Codes: H01J 37/32357 Generation remote from the workpiece, e.g. down-stream
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32449 Gas control, e.g. control of the gas flow

Abstract

A counterflow mixing device for a process chamber is disclosed, comprising an injection tube that introduces a fluid in a manner counter to a flow of a post-plasma gas mixture traveling downward from a plasma source. The invention allows for proper mixing of the fluid as well as avoiding recombination of generated ions and radicals.

Claims

1. An apparatus for mixing at least one gas, comprising:

a conical member comprising a top end and a bottom end, the conical member configured to receive a first gas in a first direction at the top end;

a counter flow injector disposed within the conical member, the counter flow injector introducing a second gas in a second direction, wherein the first direction is opposite to the second direction;

a configurable orifice plate mounted at the bottom of the conical member, the configurable orifice plate defining an opening through which the first gas and the second gas pass through;

wherein the conical member promotes a mixing of the first gas and the second gas between the top end and the bottom end; and

wherein changing a size of the opening of the configurable orifice plate changes an extent of the mixing of the first gas and the second gas.

2. The apparatus of claim 1, wherein the first gas and the second gas pass on into a reactor system having a plenum and a showerhead.

3. The apparatus of claim 1, wherein the first gas comprises at least one of:

argon (Ar);

nitrogen fluoride (NF₃);

tungsten fluoride (WF₆);

or a fluorine-containing gas.

4. The apparatus of claim 1, wherein the second gas comprises at least one of:

ammonia (NH₃);

amines;

or hydrogen (H₂).

5. The apparatus of claim 1, wherein the conical member comprises at least one of:

aluminum;

anodized aluminum;

plasma electrolytic oxide (PEO) coated aluminum;

alumina;

aluminum nitride;

silicon carbide;

nickel;

nickel plated aluminum;

or nickel-plated stainless steel.

6. The apparatus of claim 1, wherein the counter flow injector is sized to minimize recombination of radicals within the mixture of the first gas and the second gas.

7. The apparatus of claim 1, wherein the counter flow injector comprises at least one of:

nickel;

nickel-plated stainless steel;

anodized aluminum base material;

PEO coated aluminum base material;

ALD Al₂O₃ coated aluminum base material;

aluminum oxide ceramic;

aluminum nitride ceramic;

or silicon carbide.

16. The apparatus of claim 1, further comprising a plate within the conical member, the plate configured to spread the second gas radially.

17. The apparatus of claim 1, wherein the plate is supported by radial arms.

18. The apparatus of claim 1, further comprising a seal, wherein the first gas passes through the seal toward the bottom end.

19. The apparatus of claim 1, wherein the a configurable orifice plate is between the conical member and a reaction chamber.

8. A reaction system for forming a film, comprising:

a plasma source, the plasma source generating a first gas;

a conical member, the conical member configured to receive the first gas in a first direction;

a counter flow injector, the counter flow injector introducing a second gas in a second direction, wherein the first direction is opposite to the second direction;

an adjustable orifice plate mounted at the bottom of the conical member, the adjustable orifice plate defining an opening through which the plasma gas and the first fluid pass through;

a reaction chamber that receives the first gas and the second gas, the reaction chamber comprising;

a housing defining a plenum to receive the first gas and the second gas; and

a showerhead with a plurality of holes for passing the first gas and the second gas onto a substrate to be processed;

wherein the conical member promotes a mixing of the first gas and the second gas; and

wherein adjusting a size of the opening of the adjustable orifice plate changes an extent of the mixing of the first gas and the second gas.

9. The reaction system of claim 8, further comprising a plate having at least one radial arm, the plate being configured to enhance a spread of the second gas radially.

10. The reaction system of claim 8, further comprising an injector gas source for generating the second gas.

11. The reaction system of claim 8, wherein the plasma gas comprises at least one of:

argon (Ar);

nitrogen fluoride (NF₃);

tungsten fluoride (WF₆);

or a fluorine-containing gas.

12. The reaction system of claim 8, wherein the first fluid comprises at least one of:

ammonia (NH₃);

amines;

or hydrogen (H₂).

13. The reaction system of claim 8, wherein the conical member comprises at least one of:

aluminum;

anodized aluminum;

PEO coated aluminum;

alumina;

aluminum nitride;

silicon carbide;

nickel;

nickel plated aluminum;

or nickel-plated stainless steel.

14. The reaction system of claim 8, wherein the counter flow injector is sized to minimize recombination of radicals within the mixture of the plasma gas and the first fluid.

15. The reaction system of claim 8, wherein the counter flow injector comprises at least one of:

nickel;

nickel-plated stainless steel;

anodized aluminum base material;

PEO coated aluminum base material;

ALD Al₂O₃ coated aluminum base material;

aluminum oxide ceramic;

aluminum nitride ceramic;

or silicon carbide.