System, method and apparatus for using optical data to monitor RF generator operations

• US 10,325,760 B2
• Filed: 03/28/2017
• Issued: 06/18/2019
• Est. Priority Date: 08/29/2014
• Status: Active Grant

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Valcore, Jr., John C., San, Tony, Lee, Seonkyung
• Primary Examiner(s): Lee, John R
• Application Number:
  US15/471,661
• Publication Number:
  US 20170200592A1
• Time in Patent Office: 812 Days
• CPC Class Codes: G01J 1/42 using electric radiation detectors optical or mechanical part G01J1/04; by comparison with a reference light or electric value G01J1/10
• CPC Class Codes: H01J 37/32183 Matching circuits
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: H01J 37/32972 Spectral analysis

Abstract

A system and method monitoring a plasma with an optical sensor to determine the operations of a pulsed RF signal for plasma processing including a plasma chamber with an optical sensor directed toward a plasma region. An RF generator coupled to the plasma chamber through a match circuit. An RF timing system coupled to the RF generator. A system controller is coupled to the plasma chamber, the RF generator, the optical sensor, the RF timing system and the match circuit. The system controller includes a central processing unit, a memory system, a set of RF generator settings and an optical pulsed plasma analyzer coupled to the optical sensor and being capable to determine a timing of a change in state of an optical emission received in the optical sensor and/or a set of amplitude statistics corresponding to an amplitude of the optical emission received in the optical sensor.

Claims

1. A method comprising:

receiving an optical sensor signal from an optical sensor of a plasma chamber when a radio frequency (RF) signal is supplied from an RF generator, wherein the RF signal transitions between a low state and a high state to create a plurality of pulses during a plasma process;

dividing each of the plurality of pulses of the RF signal into a plurality of subdivisions;

dividing the optical sensor signal into a plurality of subdivisions;

examining a characteristic of the optical sensor signal during each of the plurality of subdivisions of the optical sensor signal; and

adjusting the RF signal for one or more of the plurality of subdivisions of the RF signal based on the characteristic for a corresponding one or more of the plurality of subdivisions of the optical sensor signal to change the characteristic to be within a threshold.

2. The method of claim 1, wherein the RF signal is divided into the same number of subdivisions for each of the low state and the high state of the RF signal.

3. The method of claim 2, wherein the plurality of subdivisions of the optical sensor signal include a first number of subdivisions and a second number of subdivisions, wherein the optical sensor signal is divided into the first number of subdivisions during a time period in which the RF signal is in the high state, wherein the optical sensor signal is divided into the second number of subdivisions during a time period in which the RF signal is in the low state, wherein the first number is the same as the second number.

4. The method of claim 3, wherein the characteristic is examined to generate an amplitude statistic, wherein the amplitude statistic is a maximum of amplitude values of the optical sensor signal, or a minimum of the amplitude values of the optical sensor signal, or a mean of the amplitude values of the optical sensor signal.

5. The method of claim 1, wherein the characteristic of the RF signal includes a frequency and power of the RF signal.

6. The method of claim 1, wherein one of the plurality of subdivisions of the RF signal has the same time period as that of a corresponding one of the plurality of subdivisions of the optical sensor signal, wherein the time period starts at a time and ends at a time.

7. The method claim 1, wherein the characteristic is examined to generate an amplitude statistic, the method further comprising controlling a plurality of parameters of the plasma chamber for one of the plurality of subdivisions of the RF signal based on the amplitude statistic for a corresponding one of the plurality of subdivisions of the optical sensor signal, wherein the plurality of parameters include a pressure, a temperature of the plasma chamber, and a distance between an upper electrode of the plasma chamber and a lower electrode of the plasma chamber.

8. A plasma processing system comprising:

a plasma chamber associated with an optical sensor directed toward a plasma region in the plasma chamber;

an RF generator coupled to the plasma chamber through a match circuit, wherein the RF generator is configured to generate an RF signal and provide the RF signal via the match circuit to the plasma chamber, wherein the RF signal transitions between a low state and a high state to create a plurality of pulses during a plasma process;

a system controller coupled to the plasma chamber and the RF generator, the system controller configured to;

receive an optical sensor signal from the optical sensor when the RF signal is supplied to the plasma chamber;

divide each of the plurality of pulses of the RF signal into a plurality of subdivisions;

divide the optical sensor signal into a plurality of subdivisions;

examine a characteristic of the optical sensor signal during each of the plurality of subdivisions of the optical sensor signal; and

adjust the RF signal for one or more of the plurality of subdivisions of the RF signal based on the characteristic for a corresponding one or more of the plurality of subdivisions of the optical sensor signal to change the characteristic to be within a threshold.

9. The plasma system of claim 8, wherein the RF signal is divided into the same number of subdivisions for each of the low state and the high state of the RF signal.

10. The plasma system of claim 9, wherein the plurality of subdivisions of the optical sensor signal include a first number of subdivisions and a second number of subdivisions, wherein the optical sensor signal is divided into the first number of subdivisions during a time period in which the RF signal is in the high state, wherein the optical sensor signal is divided into the second number of subdivisions during a time period in which the RF signal is in the low state, wherein the first number is the same as the second number.

11. The plasma system of claim 10, wherein the characteristic is examined to generate an amplitude statistic, wherein the amplitude statistic is a maximum of amplitude values of the optical sensor signal, or a minimum of the amplitude values of the optical sensor signal, or a mean of the amplitude values of the optical sensor signal.

12. The plasma system of claim 8, wherein the characteristic of the RF signal includes a frequency and power of the RF signal.

13. The plasma system of claim 8, wherein one of the plurality of subdivisions of the RF signal has the same time period as that of a corresponding one of the plurality of subdivisions of the optical sensor signal, wherein the time period starts at a time and ends at a time.

14. The plasma system of claim 8, wherein the characteristic is examined to generate an amplitude statistic, wherein the system controller is configured to control a plurality of parameters of the plasma chamber for one of the plurality of subdivisions of the RF signal based on the amplitude statistic for a corresponding one of the plurality of subdivisions of the optical sensor signal, wherein the plurality of parameters include a pressure, a temperature of the plasma chamber, and a distance between an upper electrode of the plasma chamber and a lower electrode of the plasma chamber.

15. A non-transitory computer-readable storage medium having stored thereon a computer program, the computer program comprising instructions for causing a processor to perform a plurality of operations of:

receiving an optical sensor signal from an optical sensor associated with a plasma chamber when a radio frequency (RF) signal is supplied from an RF generator, wherein the RF signal transitions between a low state and a high state to create a plurality of pulses during a plasma process;

dividing each of the plurality of pulses of the RF signal into a plurality of subdivisions;

dividing the optical sensor signal into a plurality of subdivisions;

examining a characteristic of the optical sensor signal during each of the plurality of subdivisions of the optical sensor signal; and

adjusting the RF signal for one or more of the plurality of subdivisions of the RF signal based on the characteristic for a corresponding one or more of the plurality of subdivisions of the optical sensor signal to change the characteristic to be within a threshold.

16. The non-transitory computer-readable storage medium of claim 15, wherein the RF signal is divided into the same number of subdivisions for each of the low state and the high state of the RF signal.

17. The non-transitory computer-readable storage medium of claim 15, wherein the plurality of subdivisions of the optical sensor signal include a first number of subdivisions and a second number of subdivisions, wherein the optical sensor signal is divided into the first number of subdivisions during a time period in which the RF signal is in the high state, wherein the optical sensor signal is divided into the second number of subdivisions during a time period in which the RF signal is in the low state, wherein the first number is the same as the second number.

18. The non-transitory computer-readable storage medium of claim 17, wherein the characteristic is examined to generate an amplitude statistic, wherein the amplitude statistic is a maximum of amplitude values of the optical sensor signal, or a minimum of the amplitude values of the optical sensor signal, or a mean of the amplitude values of the optical sensor signal.

19. The non-transitory computer-readable storage medium of claim 15, wherein the characteristic of the RF signal includes a frequency and power of the RF signal.

20. The non-transitory computer-readable storage medium of claim 15, wherein one of the plurality of subdivisions of the RF signal has the same time period as that of a corresponding one of the plurality of subdivisions of the optical sensor signal, wherein the time period starts at a time and ends at a time.