Post UV cure for gapfill improvement
First Claim
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1. A method for semiconductor processing, the method comprising:
- performing a first deposition process to form a conformal film over a bottom surface and along sidewall surfaces of a feature on a substrate;
performing an etch process to remove a portion of the conformal film;
repeating the first deposition process and the etch process to fill the feature with the conformal film; and
exposing the conformal film to ultraviolet light.
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Abstract
Embodiments disclosed herein relate generally to forming a gate layer in high aspect ratio trenches using a cyclic deposition-etch process. In an embodiment, a method for semiconductor processing is provided. The method includes performing a first deposition process to form a conformal film over a bottom surface and along sidewall surfaces of a feature on a substrate. The method includes performing an etch process to remove a portion of the conformal film. The method includes repeating the first deposition process and the etch process to fill the feature with the conformal film. The method includes exposing the conformal film to ultraviolet light.
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Citations
20 Claims
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1. A method for semiconductor processing, the method comprising:
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performing a first deposition process to form a conformal film over a bottom surface and along sidewall surfaces of a feature on a substrate; performing an etch process to remove a portion of the conformal film; repeating the first deposition process and the etch process to fill the feature with the conformal film; and exposing the conformal film to ultraviolet light. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for semiconductor processing, the method comprising:
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forming fins on a substrate, sidewalls of the fins and a bottom surface between the sidewalls of the fins defining a trench therebetween; forming a gate layer in the trench and over the fins, forming the gate layer comprising; depositing at least a portion of the gate layer in the trench by performing a cyclic deposition-etch process, the at least the portion of the gate layer merging by lateral growth from the sidewalls of the fins; exposing the at least the portion of the gate layer to ultraviolet light; and after forming the gate layer, patterning the gate layer to form a gate structure over the fins. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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17. A method for semiconductor processing, the method comprising:
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forming fins on a substrate, sidewalls of the fins and a bottom surface defining a trench therebetween; forming a dummy gate structure over the fins, wherein forming the dummy gate structure comprises; performing a cyclic deposition-etch process to deposit a first film over the fins, the first film comprising a portion of a dummy gate layer; performing an ultraviolet (UV) curing process to expose the first film to ultraviolet light; and performing a deposition process to deposit a second film over the first film, the second film comprising a remaining portion of the dummy gate layer; removing the dummy gate structure to form an opening; and forming a replacement gate structure over the fins in the opening. - View Dependent Claims (18, 19, 20)
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Specification