Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide

• US 10,340,124 B2
• Filed: 06/13/2016
• Issued: 07/02/2019
• Est. Priority Date: 10/29/2015
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Kobayashi, Satoru, Sugai, Hideo, Tran, Toan, Park, Soonam, Lubomirsky, Dmitry
• Primary Examiner(s): Dhingra, Rakesh K
• Application Number:
  US15/180,425
• Publication Number:
  US 20170125219A1
• Time in Patent Office: 1,114 Days
• Field of Search: 118723 MW, 15634541
• CPC Class Codes: H01J 2237/334 Etching
• CPC Class Codes: H01J 37/32192 Microwave generated discharge H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence
• CPC Class Codes: H01J 37/32211 Means for coupling power to the plasma
• CPC Class Codes: H01J 37/32229 Waveguides
• CPC Class Codes: H01J 37/32293 using particular waveforms, e.g. polarised waves
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge

Abstract

A rotating microwave is established for any resonant mode TE_mnl or TM_mnl of a cavity, where the user is free to choose the values of the mode indices m, n and l. The fast rotation, the rotation frequency of which is equal to an operational microwave frequency, is accomplished by setting the temporal phase difference ΔØ and the azimuthal angle Δθ between two microwave input ports P and Q as functions of m, n and l. The slow rotation of frequency Ω_α (typically 1-1000 Hz), is established by transforming dual field inputs α cos Ω_αt and ±α sin Ω_αt in the orthogonal input system into an oblique system defined by the angle Δθ between two microwave ports P and Q.

Claims

1. A plasma reactor comprising:

a workpiece processing chamber;

a cylindrical microwave cavity overlying the workpiece processing chamber, and a plurality of microwave input ports arranged asymmetrically about a center axis of the cylindrical microwave cavity, the plurality of microwave input ports including first and second input ports, P and Q, in a sidewall of said cylindrical microwave cavity spaced apart by an oblique azimuthal offset angle Δ

θ

;

a microwave source having first microwave modules that provides a first microwave source output having a microwave frequency, and a second microwave module that provides a second microwave source output having the microwave frequency and separated by a temporal phase difference Δ

Ø

from the first microwave source output;

a pair of respective waveguides, each of said respective waveguides having a microwave input end coupled to a respective one of said microwave source outputs and a microwave output end coupled to a respective one of said first and second input ports;

a seed signal generator having a first output signal coupled to the first microwave module and a second output signal coupled to the second microwave module, the seed signal generator configured to generate first and second output signals that generate rotating microwaves of mode TE_mnl or TM_mnl in said cylindrical microwave cavity, wherein m, n and l are user-selected values of a TE or TM mode.

2. The plasma reactor of claim 1, further comprising a controller configured to adjust said temporal phase difference Δ

Ø

to a value which is a function of at least two of said user-selected TE or TM mode indices m, n and l so as to produce the rotating microwaves of mode TE_mnl or TM_mnl in said cylindrical microwave cavity.

3. The plasma reactor of claim 2, further comprising a plurality of monitoring antennas positioned to receive microwave signals in the cylindrical microwave cavity, and the controller is configured to perform feedback loop control based on received signals from the plurality of monitoring antennas to determine an adjustment for said temporal phase difference Δ

Ø

.

4. The plasma reactor of claim 3, wherein the antennas are orthogonally placed in said cylindrical microwave cavity.

5. The plasma reactor of claim 1, wherein said rotating microwaves rotate clockwise with a rotation frequency equal to an operational microwave frequency.

6. The plasma reactor of claim 1, wherein the workpiece processing chamber includes a workpiece support to hold a workpiece, and wherein the first and second input ports, P and Q, are positioned in a portion of the sidewall having a diameter greater than that of the workpiece support.

7. The plasma reactor of claim 6, wherein the cylindrical microwave cavity includes a floor that separates the cylindrical microwave cavity from the workpiece processing chamber and that includes a plurality of apertures for microwave energy to pass into the workpiece processing chamber.

8. The plasma reactor of claim 7, comprising:

a coupling aperture plate at said output end, and a rectangular coupling aperture in said coupling aperture plate,

an iris plate between said coupling aperture plate and said microwave input end, and a rectangular iris opening in said iris plate.

9. The plasma reactor of claim 8 wherein said rectangular coupling aperture and said rectangular iris opening have respective parallel axes along a long dimension of a respective one of said coupling aperture and said iris opening, said respective parallel axes being parallel to an axis of symmetry of said cylindrical microwave cavity.

10. The plasma reactor of claim 8 wherein each of said waveguides has a microwave propagation direction between the microwave input end and the microwave output end, said microwave propagation direction extending toward an axis of symmetry of said cylindrical microwave cavity.

11. The plasma reactor of claim 8 wherein:

said rectangular coupling aperture has long and short dimensions e and f, respectively, corresponding to a user-selected impedance.

12. The plasma reactor of claim 11 wherein:

said rectangular iris opening has long and short dimensions c and d, respectively, corresponding to a user-selected resonance.

13. The plasma reactor of claim 12 wherein said rectangular iris is a capacitive iris and has a long dimension parallel to an axis of symmetry of said cylindrical microwave cavity.

14. The plasma reactor of claim 12 wherein said rectangular iris is an inductive iris and has a short dimension parallel to an axis of symmetry of said cylindrical microwave cavity.

15. The plasma reactor of claim 8, wherein each of said respective waveguides has a cross-sectional height normal to a first plane greater than a height between the floor and ceiling of said cylindrical microwave cavity.

16. The plasma reactor of claim 8, wherein each of said respective waveguides is a rectangular waveguide.

17. The plasma reactor of claim 16, wherein said rectangular coupling aperture and said rectangular iris opening each have a dimension along an axis normal to a first plane that is less than a distance between a floor and a ceiling of said rectangular waveguide.

18. The plasma reactor of claim 17, wherein said rectangular coupling aperture and said rectangular iris opening each have a dimension along an axis parallel to a first plane that is less than a distance between parallel sidewalls of said rectangular waveguide.

19. The plasma reactor of claim 1, wherein the plurality of microwave input ports consists of exactly two microwave input ports.