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System and method for thermal management using vapor chamber

  • US 10,356,945 B2
  • Filed: 08/04/2016
  • Issued: 07/16/2019
  • Est. Priority Date: 01/08/2015
  • Status: Active Grant
First Claim
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1. A thermal management system for electronics, comprising:

  • at least one vapor chamber that at least partially envelops the electronics, wherein the at least one vapor chamber comprises a vapor chamber case with a component side and an opposing vapor side;

    a working fluid contained within the vapor chamber, introduced into the vapor chamber case and used to dissipate heat from at least a part of a heated portion of the electronics; and

    a precision sintered 3D wick structure independently created on at least some of the interior of the vapor chamber, deployed within the internal space of the vapor chamber and disposed on at least the component side of the vapor chamber case, wherein the precision sintered 3D wick structure transports the working fluid by capillary action from at least one working fluid receptacle to the at least a part of the heated portion of the electronics,wherein the precision sintered 3D wick structure comprises a plurality of layers of metal build powder particles,wherein a first collection of metal build powder particles from each of a first group of layers from the plurality of layers of metal build powder particles is sintered to create a 3D porous zone, andfurther wherein a second collection of metal build powder particles from each of a second group of layers from the plurality of layers of metal build powder particles is melted to create a 3D nonporous zone.

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