Method for aligning a mirror of a microlithographic projection exposure apparatus

• US 10,359,703 B2
• Filed: 10/15/2018
• Issued: 07/23/2019
• Est. Priority Date: 04/04/2014
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Inventors: Freimann, Rolf, Doerband, Bernd, Hetzler, Jochen
• Primary Examiner(s): Asfaw, Mesfin T
• Application Number:
  US16/159,936
• Publication Number:
  US 20190049853A1
• Time in Patent Office: 281 Days
• CPC Class Codes: G02B 5/09 Multifaceted or polygonal mirrors , e.g. polygonal scanning mirrors; Fresnel mirrors
• CPC Class Codes: G03F 7/70141 Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
• CPC Class Codes: G03F 7/70233 Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/706 Aberration measurement

Abstract

A method for aligning a mirror of a microlithographic projection exposure apparatus, according to one formulation, involves: recording a first partial interferogram between a wave reflected at a first mirror segment (101) and a reference wave reflected at a reference surface (110, 310, 510), recording a second partial interferogram between a wave reflected at a second mirror segment (102) and a reference wave reflected at the reference surface, determining a phase offset between the first partial interferogram and the second partial interferogram, and aligning the first mirror segment and the second mirror segment in relation to one another in accordance with the determined phase offset, so that the distance of the relevant mirror segments (101, 102) from a respective predetermined, hypothetical surface in the direction of the respective surface normal is less than λ/10 at each point on the mirror segments, where λ denotes the operating wavelength of the mirror.

Claims

1. A method for aligning a mirror of a microlithographic projection exposure apparatus, wherein the mirror comprises a plurality of mirror segments, said method comprising:

recording a first partial interferogram between a wave reflected at a first mirror segment and a reference wave reflected at a reference surface;

recording a second partial interferogram between a wave reflected at a second mirror segment and a further reference wave reflected at the reference surface;

determining a phase offset between the first partial interferogram and the second partial interferogram; and

aligning the first mirror segment with the second mirror segment in accordance with the determined phase offset, wherein distances of the mirror segments from respective predetermined, hypothetical surfaces in a direction of the respective surface normals are less than λ

/10 at each point on the mirror segments, where λ

denotes an operating wavelength of the mirror.

2. The method as claimed in claim 1, wherein the distances of the mirror segments from the predetermined, hypothetical surfaces in the direction of the respective surface normals is less than λ

/50 at each point on the mirror segments.

3. The method as claimed in claim 1, wherein a quotient of geometric path and wavelength has different values when recording the first partial interferogram and the second partial interferogram for at least two light beams which are incident on a single point on one of the mirror segments.

4. The method as claimed in claim 1, wherein the first partial interferogram and the second partial interferogram are each recorded using light which has a spectral bandwidth in a range of 1-10 nm or which comprises a plurality of discrete wavelengths.

5. The method as claimed in claim 1, wherein the reference wave and/or the further reference wave is guided over a retardation section for at least partly compensating the distance between the reference surface and the respective mirror segment.

6. The method as claimed in claim 1, wherein the first partial interferogram and the second partial interferogram are each recorded using monochromatic light which is guided to a single point on one of the mirror segments over at least two different geometric paths.

7. The method as claimed in claim 1, wherein the first partial interferogram and the second partial interferogram are recorded concurrently with one another.

8. A method for aligning a mirror of a microlithographic projection exposure apparatus, wherein the mirror comprises a plurality of mirror segments, said method comprising:

splitting a first wavefront after reflection at a first mirror segment;

splitting a second wavefront after reflection at a second mirror segment;

interferometrically superposing wavefronts, generated by said splitting of the first wavefront, to generate a first partial interferogram;

interferometrically superposing wavefronts, generated by said splitting of the second wavefront, to generate a second partial interferogram;

determining a phase offset between the first partial interferogram and the second partial interferogram; and

aligning the first mirror segment and the second mirror segment in relation to one another in accordance with the determined phase offset.

9. The method as claimed in claim 8, wherein the first mirror segment is aligned with the second mirror segment in accordance with the determined phase offset such that distances of the mirror segments from respective predetermined, hypothetical surfaces in a direction of the respective surface normals are less than λ

/10 at each point on the mirror segments, where λ

denotes an operating wavelength of the mirror.

10. The method as claimed in claim 8, wherein the first partial interferogram and the second partial interferogram are recorded using a shearing interferometer.

11. The method as claimed in claim 8, wherein the first partial interferogram and the second partial interferogram are recorded using a Talbot interferometer.

12. The method as claimed in claim 8, further comprising replacing at least one of the mirror segments prior to said generating and said aligning.

13. The method as claimed in claim 8, wherein said generating and said aligning are performed during an assembling of the mirror.

14. The method as claimed in claim 8, wherein said generating and said aligning at least partly compensate for an imaging aberration of the microlithographic projection exposure apparatus.

15. The method as claimed in claim 8, further comprising a pre-aligning using electromagnetic radiation at a first wavelength and, subsequent to the pre-aligning, a fine aligning using electromagnetic radiation at a second wavelength, which is shorter than the first wavelength.

16. The method as claimed in claim 8, wherein the mirror is configured for an operating wavelength of less than 200 nm.

17. The method as claimed in claim 8, wherein the mirror is configured for an operating wavelength of less than 30 nm.

18. The method according to claim 8, further comprising:

generating further aerial images from further respective wavefronts reflected at further mirror segments; and

aligning the further mirror segments in relation to the first mirror segment and/or the second mirror segment, to produce the aligned mirror.