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Controlling the uniformity of PECVD deposition

  • US 10,363,370 B2
  • Filed: 09/01/2017
  • Issued: 07/30/2019
  • Est. Priority Date: 11/30/2012
  • Status: Active Grant
First Claim
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1. A method of plasma modifying a vessel having a lumen defined at least in part by a surface to be treated, the method comprising:

  • providing plasma in or near the surface by providing an outer electrode outside the vessel and an inner electrode at least partially inside the lumen of the vessel and energizing the electrodes using radio frequency energy under conditions effective for plasma modification of the surface of the vessel; and

    at least part of the time while providing plasma, providing a magnetic field in or near the plasma, the magnetic field having a position, orientation, and field strength effective to improve the uniformity, density, or both of plasma modification of the surface of the vessel;

    in which the plasma modification of the surface comprises plasma enhanced chemical vapor deposition (PECVD) and the plasma does not include a substantial amount of hollow cathode plasma.

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