Exhaust apparatus and substrate processing apparatus having an exhaust line with a first ring having at least one hole on a lateral side thereof placed in the exhaust line
First Claim
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1. An exhaust apparatus comprising:
- a first exhaust line;
a second exhaust line connected to the first exhaust line;
a third exhaust line connected to the first exhaust line;
a first ring placed in the second exhaust line, the first ring having at least one hole on a lateral side thereof; and
a first gas line connected to the second exhaust line through the first ring,wherein when gas is supplied to the first gas line, the first exhaust line does not communicate with the second exhaust line but communicates with the third exhaust line.
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Abstract
An exhaust apparatus using a gas curtain instead of a mechanical opening/closing structure is provided. The exhaust apparatus includes: a first region; a second region connected to the first region; a third region connected to the first region; and a first gas line connected to the second region, wherein when gas is supplied to the first gas line, the first region does not communicate with the second region but communicates with the third region.
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Citations
25 Claims
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1. An exhaust apparatus comprising:
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a first exhaust line; a second exhaust line connected to the first exhaust line; a third exhaust line connected to the first exhaust line; a first ring placed in the second exhaust line, the first ring having at least one hole on a lateral side thereof; and a first gas line connected to the second exhaust line through the first ring, wherein when gas is supplied to the first gas line, the first exhaust line does not communicate with the second exhaust line but communicates with the third exhaust line. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. An exhaust apparatus comprising:
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a main exhaust line; an upper plate connected to the main exhaust line; a body having a first exhaust path and a second exhaust path that branch off from the main exhaust line; at least one ring inserted into the body, the ring having at least one hole on a lateral side thereof; a lower plate having a portion connected to the ring; a first sub-exhaust line connected to the first exhaust path; and a second sub-exhaust line. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19)
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20. A substrate processing apparatus comprising:
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a gas supply unit; a reactor; an exhaust unit; and an exhaust pump unit, wherein the gas supply unit comprises; at least one gas line through which gas is supplied to the reactor from the gas supply unit; a bypass line branching off from the gas line and connected to the exhaust unit; and a purge gas line connected from the gas supply unit to the exhaust unit, wherein the exhaust unit comprises; a main exhaust line; an upper plate connected to the main exhaust line; a body having a first exhaust path and a second exhaust path that branch off from the main exhaust line; at least one ring inserted into the body, the ring having at least one hole on a lateral side thereof; a lower plate having a portion connected to the ring; a first sub-exhaust line connected to the first exhaust path; a second sub-exhaust line connected to the second exhaust path; and at least one purge gas supply path penetrating the body and connected to the ring. - View Dependent Claims (21, 22, 23, 24, 25)
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Specification