System for and method of manufacturing a layout design of an integrated circuit
First Claim
1. A method of fabricating an integrated circuit, the method comprising:
- generating a first layout of the integrated circuit based on design criteria, the first layout having a first set of vias arranged in first rows and first columns, the first rows of the first set of vias being arranged in a first direction, the first columns of the first set of vias being arranged in a second direction different from the first direction, the first set of vias being divided into sub-sets of vias based on a corresponding color, the color indicating that vias of the sub-set of vias with a same color are to be formed on a same mask of a multiple mask set and vias of the sub-set of vias with a different color are to be formed on a different mask of the multiple mask set;
generating a standard cell layout of the integrated circuit, the standard cell layout having standard cells and a second set of vias arranged in the standard cells, each via of the second set of vias being separated from each other by at least a minimum pitch;
generating a via color layout of the integrated circuit based on the first layout and the standard cell layout, the via color layout having a third set of vias, the third set of vias including a portion of the second set of vias and corresponding locations, and color of the corresponding sub-set of vias;
performing a color check on the via color layout based on design rules, andat least one of the above operations being performed by a hardware processor, andfabricating the integrated circuit based on at least the via color layout.
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Accused Products
Abstract
A method of forming a layout design for fabricating an integrated circuit is disclosed. The method includes generating a first layout of the integrated circuit based on design criteria, generating a standard cell layout of the integrated circuit, generating a via color layout of the integrated circuit based on the first layout and the standard cell layout and performing a color check on the via color layout based on design rules. The first layout having a first set of vias arranged in first rows and first columns. The standard cell layout having standard cells and a second set of vias arranged in the standard cells. The via color layout having a third set of vias. The third set of vias including a portion of the second set of vias and corresponding locations, and color of corresponding sub-set of vias.
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Citations
20 Claims
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1. A method of fabricating an integrated circuit, the method comprising:
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generating a first layout of the integrated circuit based on design criteria, the first layout having a first set of vias arranged in first rows and first columns, the first rows of the first set of vias being arranged in a first direction, the first columns of the first set of vias being arranged in a second direction different from the first direction, the first set of vias being divided into sub-sets of vias based on a corresponding color, the color indicating that vias of the sub-set of vias with a same color are to be formed on a same mask of a multiple mask set and vias of the sub-set of vias with a different color are to be formed on a different mask of the multiple mask set; generating a standard cell layout of the integrated circuit, the standard cell layout having standard cells and a second set of vias arranged in the standard cells, each via of the second set of vias being separated from each other by at least a minimum pitch; generating a via color layout of the integrated circuit based on the first layout and the standard cell layout, the via color layout having a third set of vias, the third set of vias including a portion of the second set of vias and corresponding locations, and color of the corresponding sub-set of vias; performing a color check on the via color layout based on design rules, and at least one of the above operations being performed by a hardware processor, and fabricating the integrated circuit based on at least the via color layout. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A system for manufacturing an integrated circuit, the system comprises:
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a non-transitory computer readable medium configured to store executable instructions; and a processor coupled to the non-transitory computer readable medium, wherein the processor is configured to execute the instructions for; generating a first layout of the integrated circuit based on at least design criteria, the first layout having a first set of vias arranged in first rows and first columns, the first rows of the first set of vias being arranged in a first direction, the first columns of the first set of vias being arranged in a second direction different from the first direction, the first set of vias being divided into sub-sets of vias based on a corresponding color, the color indicating that vias of the sub-set of vias with a same color are to be formed on a same mask of a multiple mask set and vias of the sub-set of vias with a different color are to be formed on a different mask of the multiple mask set, the design criteria including a mask count corresponding to a number of masks in the multiple mask set; generating a standard cell layout of the integrated circuit, the standard cell layout having standard cells and a second set of vias arranged in the standard cells, each via of the second set of vias being separated from each other by at least a minimum pitch; generating a via color layout of the integrated circuit based on the first layout and the standard cell layout, the via color layout having a third set of vias, the third set of vias including a portion of the second set of vias and corresponding locations, and color of the corresponding sub-set of vias; performing a color check on the via color layout based on design rules; and
,manufacturing the integrated circuit based on at least the via color layout. - View Dependent Claims (12, 13, 14, 15)
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16. A method of manufacturing an integrated circuit, the method comprising:
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generating a first layout of the integrated circuit based on design criteria, the first layout having a first set of vias arranged in first rows and first columns, the first rows of the first set of vias being arranged in a first direction, the first columns of the first set of vias being arranged in a second direction different from the first direction, the first set of vias being divided into sub-sets of vias based on a corresponding color, the color indicating that vias of the sub-set of vias with a same color are to be formed on a same mask of a multiple mask set and vias of the sub-set of vias with a different color are to be formed on a different mask of the multiple mask set; generating a standard cell layout of the integrated circuit, the standard cell layout having standard cells and a second set of vias arranged in the standard cells, each via of the second set of vias being separated from each other by at least a minimum pitch; performing a color mapping between the first layout and the standard cell layout thereby generating a via color layout of the integrated circuit, the via color layout having a third set of vias, the third set of vias including a portion of the second set of vias and corresponding locations, and color of the corresponding sub-set of vias; performing a color check on the via color layout based on design rules comprising determining if two or more vias of the third set of vias are aligned in the first direction or the second direction; at least one of the above operations being performed by a hardware processor, and manufacturing the integrated circuit based on at least the via color layout. - View Dependent Claims (17, 18, 19, 20)
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Specification