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System for and method of manufacturing a layout design of an integrated circuit

  • US 10,366,200 B2
  • Filed: 09/07/2016
  • Issued: 07/30/2019
  • Est. Priority Date: 09/07/2016
  • Status: Active Grant
First Claim
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1. A method of fabricating an integrated circuit, the method comprising:

  • generating a first layout of the integrated circuit based on design criteria, the first layout having a first set of vias arranged in first rows and first columns, the first rows of the first set of vias being arranged in a first direction, the first columns of the first set of vias being arranged in a second direction different from the first direction, the first set of vias being divided into sub-sets of vias based on a corresponding color, the color indicating that vias of the sub-set of vias with a same color are to be formed on a same mask of a multiple mask set and vias of the sub-set of vias with a different color are to be formed on a different mask of the multiple mask set;

    generating a standard cell layout of the integrated circuit, the standard cell layout having standard cells and a second set of vias arranged in the standard cells, each via of the second set of vias being separated from each other by at least a minimum pitch;

    generating a via color layout of the integrated circuit based on the first layout and the standard cell layout, the via color layout having a third set of vias, the third set of vias including a portion of the second set of vias and corresponding locations, and color of the corresponding sub-set of vias;

    performing a color check on the via color layout based on design rules, andat least one of the above operations being performed by a hardware processor, andfabricating the integrated circuit based on at least the via color layout.

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