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Resolution enhanced digital lithography with anti-blazed DMD

  • US 10,372,042 B2
  • Filed: 01/15/2018
  • Issued: 08/06/2019
  • Est. Priority Date: 01/20/2017
  • Status: Active Grant
First Claim
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1. A digital lithography method, comprising:

  • forming a first image having at least two pixels on a substrate, wherein the at least two pixels correspond to a first pair of adjacent spatial light modulator pixels of a plurality of spatial light modulator pixels of a spatial light modulator, the first pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween; and

    forming a second image having at least two pixels on the substrate, wherein the second image partially overlaps the first image.

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