Resolution enhanced digital lithography with anti-blazed DMD

• US 10,372,042 B2
• Filed: 01/15/2018
• Issued: 08/06/2019
• Est. Priority Date: 01/20/2017
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Laidig, Thomas L., Jeong, Hwan J.
• Primary Examiner(s): Nguyen, Hung
• Application Number:
  US15/871,302
• Publication Number:
  US 20180210346A1
• Time in Patent Office: 568 Days
• Field of Search: 355 67, 359291, 359292
• CPC Class Codes: G02B 26/0833 the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD G02B26/0825 takes precedence; micromechanical devices in general B81B
• CPC Class Codes: G03F 7/702 Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

Embodiments of the present disclosure generally relate to methods and apparatus for processing one or more substrates, and more specifically to improved spatial light modulators for digital lithography systems and digital lithography methods using improved spatial light modulators. The spatial light modulator is configured such that there is a 180-degree phase shift between adjacent spatial light modulator pixels. The spatial light modulator is useful for pixel blending by forming a plurality of partially overlapping images, at least one of the plurality of partially overlapping images having at least two pixels formed by a first pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween. The spatial light modulator results in improved resolution, depth of focus, and pixel blending.

Claims

1. A digital lithography method, comprising:

forming a first image having at least two pixels on a substrate, wherein the at least two pixels correspond to a first pair of adjacent spatial light modulator pixels of a plurality of spatial light modulator pixels of a spatial light modulator, the first pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween; and

forming a second image having at least two pixels on the substrate, wherein the second image partially overlaps the first image.

2. The method of claim 1, further comprising:

varying a voltage applied to the spatial light modulator, the voltage being selected to achieve the 180-degree phase shift between the first pair of adjacent spatial light modulator pixels.

3. The method of claim 1, further comprising:

introducing a gas having a predetermined index of refraction into the spatial light modulator, the index of refraction being selected to achieve the 180-degree phase shift between the first pair of adjacent spatial light modulator pixels.

4. The method of claim 1, wherein the at least two pixels of the second image correspond to a second pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween.

5. The method of claim 1, wherein the spatial light modulator is a digital micromirror device, and wherein the spatial light modulator pixels are tiltable micromirrors.

6. The method of claim 5, further comprising:

positioning a first micromirror of the tiltable micromirrors at a first angle; and

positioning a second micromirror of the tiltable micromirrors adjacent to the first micromirror at a second angle, the first angle and the second angle being selected to achieve a 180-degree phase shift between the first micromirror and the second micromirror.