Hotspot aware dose correction
First Claim
Patent Images
1. A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method comprising:
- obtaining a relationship of a characteristic of one or more features in the portion with respect to dose;
obtaining a value of the characteristic; and
obtaining, by a hardware computer, a target dose based on the value of the characteristic and the relationship and on a dose associated with an anchor feature.
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Abstract
A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: obtaining a relationship of a characteristic of one or more features in the portion with respect to dose; obtaining a value of the characteristic; and obtaining a target dose based on the value of the characteristic and the relationship.
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Citations
20 Claims
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1. A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method comprising:
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obtaining a relationship of a characteristic of one or more features in the portion with respect to dose; obtaining a value of the characteristic; and obtaining, by a hardware computer, a target dose based on the value of the characteristic and the relationship and on a dose associated with an anchor feature. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method comprising:
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selecting a subset of one or more features from a plurality of features of a region of a patterning device pattern into a group of one or more selected features, based on a sensitivity of the feature to an optical parameter; and determining a target optical parameter for the region from a characteristic of the group of one or more selected features in the region. - View Dependent Claims (9, 10, 11)
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12. A computer program product comprising a non-transitory computer readable medium having instructions recorded thereon, the instructions configured to cause a hardware computer system to at least:
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obtain a relationship of a characteristic of one or more features in a portion of a design layout with respect to dose, wherein the design layout is for being imaged onto a substrate using a lithographic apparatus as part of a lithographic process; obtain a value of the characteristic; and obtain a target dose based on the value of the characteristic and the relationship and on a dose associated with an anchor feature. - View Dependent Claims (13, 14, 15)
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16. A computer program product comprising a non-transitory computer readable medium having instructions recorded thereon, the instructions configured to cause a hardware computer system to at least:
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selecting a subset of one or more features from a plurality of features of a region of a patterning device pattern into a group of one or more selected features, based on a sensitivity of the feature to an optical parameter; and determining a target optical parameter for the region from a characteristic of the group of selected features in the region. - View Dependent Claims (17, 18, 19, 20)
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Specification