Metrology method, target and substrate

• US 10,379,445 B2
• Filed: 10/30/2018
• Issued: 08/13/2019
• Est. Priority Date: 12/23/2015
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Jak, Martin Jacobus Johan, Den Boef, Arie Jeffrey, Ebert, Martin
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US16/174,398
• Publication Number:
  US 20190064677A1
• Time in Patent Office: 287 Days
• CPC Class Codes: G01B 11/26 for measuring angles or tapers; for testing the alignment of axes
• CPC Class Codes: G01N 21/21 Polarisation-affecting properties G01N21/19 takes precedence
• CPC Class Codes: G01N 21/4788 Diffraction for sizing particles G01N15/0205
• CPC Class Codes: G01N 21/9501 Semiconductor wafers manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10
• CPC Class Codes: G02B 27/4255 for alignment or positioning purposes optical displacement encoding scales G01D5/347
• CPC Class Codes: G02B 27/4272 having plural diffractive elements positioned sequentially along the optical path
• CPC Class Codes: G02B 5/1819 Plural gratings positioned on the same surface, e.g. array of gratings plural diffractive elements positioned sequentially along the optical path G02B27/4272
• CPC Class Codes: G02B 5/1823 in an overlapping or superposed manner
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
• CPC Class Codes: G03F 7/70616 Monitoring the printed patterns
• CPC Class Codes: G03F 7/70633 Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
• CPC Class Codes: G03F 7/70683 Mark designs
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 9/7049 Technique, e.g. interferometric
• CPC Class Codes: G03F 9/7076 Mark details, e.g. phase grating mark, temporary mark

Abstract

A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.

Claims

1. A method, comprising:

illuminating at least a first periodic structure of a metrology target with radiation having a first polarization;

illuminating at least a second periodic structure of the metrology target with radiation having a second different polarization, wherein the radiation having the first polarization and the radiation having the second polarization form a single beam spot on the metrology target or form respective beam spots that overlap on the metrology target;

combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference;

detecting the combined radiation using a detector; and

determining a parameter of interest from the detected combined radiation.

2. The method of claim 1, wherein the second polarization is substantially orthogonal to the first polarization.

3. The method of claim 1, wherein the radiation having the first polarization and the radiation having the second polarization form respective beam spots that overlap on the metrology target and wherein respective radiation beams associated with the respective beam spots are coherent with respect to each other.

4. The method of claim 1, wherein the radiation having the first polarization and the radiation having the second polarization form respective beam spots that overlap on the metrology target and wherein a central portion of a first beam spot of the beam spots on the metrology target is laterally displaced from a central portion of a second beam spot of the beam spots on the metrology target.

5. The method of claim 4, wherein at least part of the second periodic structure does not overlie at least part of the first periodic structure and the central portion of the first beam spot is incident on the at least part of the first periodic structure and the central portion of the second beam spot is not incident on the at least part of the first periodic structure.

6. The method of claim 1, further comprising determining the parameter of interest from a value of an intensity difference or ratio determined using the detected combined radiation.

7. The method of claim 1, further comprising changing an intensity ratio between the radiation having the first polarization and the radiation having the second polarization.

8. The method of claim 1, further comprising changing a phase between the radiation having the first polarization and the radiation having the second polarization.

9. The method of claim 1, wherein determining the parameter of interest comprises determining a parameter of interest for the target from the combined radiation and determining a parameter of interest specific to the first periodic structure and/or the second periodic structure from the combined radiation.

10. A metrology apparatus comprising:

an optical system configured to provide radiation having a first polarization onto at least a first periodic structure of a metrology target and radiation having a second polarization onto at least a second periodic structure of the metrology target, wherein the optical system is configured to provide the radiation having the first polarization and the radiation having the second polarization as a single beam spot on the metrology target or as respective beam spots that overlap on the metrology target;

a detector configured to detect radiation from the radiation having the first and second polarizations diffracted by the respective first and second periodic structures, wherein the diffracted radiation from the first and second periodic structures is combined and interferes; and

a control system configured to determine a parameter of interest from the detected combined diffracted radiation.

11. The apparatus of claim 10, wherein the second polarization is substantially orthogonal to the first polarization.

12. The apparatus of claim 10, wherein the radiation having the first polarization and the radiation having the second polarization form respective beam spots that overlap on the metrology target and wherein respective radiation beams associated with the respective beam spots are coherent with respect to each other.

13. The apparatus of claim 10, wherein the radiation having the first polarization and the radiation having the second polarization form respective beam spots that overlap on the metrology target and wherein the optical system is configured to provide a central portion of a first beam spot of the beam spots on the metrology target at a laterally displaced position from a central portion of a second beam spot of the beam spots on the metrology target.

14. The apparatus of claim 10, further comprising a polarizer or retarder configured to change an intensity ratio between the radiation having the first polarization and the radiation having the second polarization.

15. The apparatus of claim 10, further comprising a retarder configured to change a phase between the radiation having the first polarization and the radiation having the second polarization.

16. The apparatus of claim 10, wherein the control system configured to determine a parameter of interest from the detected combined radiation is configured to determine a parameter of interest for the target from the combined radiation and determine a parameter of interest specific to the first periodic structure and/or the second periodic structure from the combined radiation.

17. The apparatus of claim 10, wherein the control system is configured to determine the parameter of interest from a value of an intensity difference or ratio determined using the detected combined radiation.

18. A non-transitory computer program product comprising machine-readable instructions that, when executed by a computer system, are configured to cause the computer system to at least:

enable illumination of at least a first periodic structure of a metrology target with radiation having a first polarization;

enable illumination of at least a second periodic structure of the metrology target with radiation having a second different polarization, wherein radiation diffracted from the first periodic structure combines with radiation diffracted from the second periodic structure to cause interference;

enable detection of the combined radiation using a detector; and

determine a parameter of interest from a value of an intensity difference or ratio determined using the detected combined radiation.

19. The computer program product of claim 18, wherein the radiation having the first polarization and the radiation having the second polarization are formed as a single beam spot on the metrology target or as respective beam spots that overlap on the metrology target.

20. A system comprising:

an inspection apparatus configured to provide a beam on a diffraction metrology target on a substrate and to detect radiation diffracted by the metrology target to determine a parameter of interest of a patterning process; and

the non-transitory computer program product of claim 18.