Haptic effects conflict avoidance

• US 10,380,851 B2
• Filed: 10/12/2018
• Issued: 08/13/2019
• Est. Priority Date: 02/22/2016
• Status: Active Grant

• Current Assignee: Immersion Corporation
• Original Assignee: Immersion Corporation
• Inventors: Levesque, Vincent
• Primary Examiner(s): Blount, Eric
• Application Number:
  US16/159,563
• Publication Number:
  US 20190066461A1
• Time in Patent Office: 305 Days
• Field of Search: 3404071
• CPC Class Codes: G06F 3/016 Input arrangements with force or tactile feedback as computer generated output to the user
• CPC Class Codes: G08B 6/00 Tactile signalling systems, e.g. personal calling systems
• CPC Class Codes: H04M 1/72454 according to context-related or environment-related conditions

Abstract

A method and system for avoiding haptic effects conflict is presented. A haptic enabled device configured to generate haptic effects associated with a first signature is used by a user. The system detects an additional source of haptic effects and determines a second signature associated with the haptic effects produced by the source. The system determines a preferred set of haptic configurations and modifies either the first or second signature based on the preferred set of haptic configurations to achieve a minimal conflict between the first and second signatures.

Claims

1. A method of reducing haptic effect conflicts performed by a haptic enabled device configured to generate a first haptic effect, the method comprising:

determining a first signature associated with the first haptic effect, the first signature being defined by a first haptic characteristic, the first haptic characteristic including at least one of frequency, duration, rhythm, melody, intensity, and actuators used to produce the first haptic effect;

detecting a presence of a second haptic effect;

determining a second signature associated with the second haptic effect, the second signature being defined by a second haptic characteristic, the second haptic characteristic including at least one of frequency, duration, rhythm, melody, intensity, and actuators used to produce the second haptic effect;

identifying a conflict between the first signature and the second signature according to a comparison between the first haptic characteristic and the second haptic characteristic; and

modifying the first haptic effect to reduce the conflict.

2. The method of claim 1, wherein identifying the conflict between the first signature and the second signature includes identifying a similarity between the first haptic characteristic and the second haptic characteristic.

3. The method of claim 1, wherein the first signature is defined by a first plurality of haptic characteristics selected from frequency, duration, rhythm, melody, intensity, and actuator(s) used to produce the first haptic effect, the first plurality of haptic characteristics including the first haptic characteristic, and

the second signature is defined by a second plurality of haptic characteristics selected from frequency, duration, rhythm, melody, intensity, and actuator(s) used to produce the second haptic effect, the second plurality of haptic characteristics including the second haptic characteristic.

4. The method of claim 3, wherein identifying the conflict between the first signature and the second signature further includes a comparison between the first plurality of haptic characteristics and the second plurality of haptic characteristics.

5. The method of claim 1, further comprising:

recording the second haptic effect as a recorded haptic effect, wherein recording the second haptic effect is triggered by a vibration that exceeds a minimal threshold and determining the second signature is performed according to the recorded haptic effect.

6. The method of claim 1, wherein modifying the first haptic effect includes modifying the first haptic characteristic of the first haptic effect.

7. The method of claim 1, wherein modifying the first haptic effect includes modifying a haptic characteristic of the first haptic effect different from the first haptic characteristic.

8. The method of claim 1, wherein modifying the first haptic effect further includes

generating a filter according to similarities between haptic characteristics of the first haptic effect and haptic characteristics of the second haptic effect, and

applying the filter to the first haptic effect such that the haptic characteristics of the first haptic effect that are similar to the haptic characteristics of the second haptic effect are attenuated.

9. The method of claim 1, wherein the first haptic characteristic is a frequency of the first haptic effect and the second haptic characteristic is a frequency of the second haptic effect, and wherein modifying the first haptic effect includes altering the frequency of the first haptic effect.

10. The method of claim 1, wherein the first haptic characteristic is a frequency of the first haptic effect and the second haptic characteristic is a frequency of the second haptic effect, and wherein modifying the first haptic effect includes modifying a rhythm of the first haptic effect.

11. A haptic enabled device configured to generate a first haptic effect, comprising:

at least one actuator configured to output the first haptic effect, the first haptic effect being associated with a first signature defined by a first haptic characteristic, the first haptic characteristic including at least one of frequency, duration, rhythm, melody, intensity, and actuator(s) used to produce the first haptic effect;

at least one sensor configured to detect a presence of a second haptic effect; and

a processor configured to

determine a second signature associated with the second haptic effect, the second signature being defined by a second haptic characteristic, the second haptic characteristic including at least one of frequency, duration, rhythm, melody, intensity, and actuator(s) used to produce the second haptic effect,

identify a conflict between the first signature and the second signature according to a comparison between the first haptic characteristic and the second haptic characteristic, and

modify the first haptic effect to reduce the conflict.

12. The device of claim 11, wherein the processor is further configured to identify the conflict between the first signature and the second signature by identifying a similarity between the first haptic characteristic and the second haptic characteristic.

13. The device of claim 11, wherein the first signature is defined by a first plurality of haptic characteristics selected from frequency, duration, rhythm, melody, intensity, and actuators used to produce the first haptic effect, the first plurality of haptic characteristics including the first haptic characteristic, and

the second signature is defined by a second plurality of haptic characteristics selected from frequency, duration, rhythm, melody, intensity, and actuator(s) used to produce the second haptic effect, the second plurality including the second haptic characteristic.

14. The device of claim 13, wherein the processor is further configured to identify the conflict between the first signature and the second signature by comparing the first plurality of haptic characteristics and the second plurality of haptic characteristics.

15. The device of claim 11, wherein the sensor is further configured to cause recording of the second haptic effect as a recorded haptic effect, the recording of the second haptic effect is triggered by a vibration of the second haptic effect that exceeds a minimal threshold, and the processor is further configured to determine the second signature according to the recorded haptic effect.

16. The device of claim 11, wherein the processor is further configured to modify the first haptic effect by modifying the first haptic characteristic of the first haptic effect.

17. The device of claim 11, wherein the processor is further configured to modify the first haptic effect by modifying a haptic characteristic of the first haptic effect different from the first haptic characteristic.

18. The device of claim 11, wherein the processor is further configured to

generate a filter according to similarities between haptic characteristics of the first haptic effect and haptic characteristics of the second haptic effect, and

apply the filter to the first haptic effect such that the haptic characteristics of the first haptic effect that are similar to the haptic characteristics of the second haptic effect are attenuated.

19. The device of claim 11, wherein the first haptic characteristic is a frequency of the first haptic effect and the second haptic characteristic is a frequency of the second haptic effect, and wherein modifying the first haptic effect includes altering the frequency of the first haptic effect.

20. The device of claim 12, wherein the first haptic characteristic is a frequency of the first haptic effect and the second haptic characteristic is a frequency of the second haptic effect, and wherein modifying the first haptic effect includes modifying at least one of a rhythm and a melody of the first haptic effect.