Nonvolatile latch circuit and logic circuit, and semiconductor device using the same
First Claim
1. A semiconductor device comprising:
- a first element;
a second element;
an insulating layer over the first element and the second element; and
a data holding portion comprising a transistor and a capacitor,wherein an output of the first element is electrically connected to an input of the second element, and an output of the second element is electrically connected to an input of the first element,wherein each of the first element and the second element comprises a transistor whose channel formation region includes crystalline silicon,wherein a channel formation region of the transistor of the data holding portion includes an oxide semiconductor layer over the insulating layer,wherein one of a source and a drain of the transistor of the data holding portion is electrically connected to one of a pair of electrodes of the capacitor, andwherein the other of the source and the drain of the transistor of the data holding portion is electrically connected to the input of the first element and a wiring supplied with an input signal.
1 Assignment
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Accused Products
Abstract
To provide a novel nonvolatile latch circuit and a semiconductor device using the nonvolatile latch circuit, a nonvolatile latch circuit includes a latch portion having a loop structure where an output of a first element is electrically connected to an input of a second element, and an output of the second element is electrically connected to an input of the first element; and a data holding portion configured to hold data of the latch portion. In the data holding portion, a transistor using an oxide semiconductor as a semiconductor material for forming a channel formation region is used as a switching element. In addition, a capacitor electrically connected to a source electrode or a drain electrode of the transistor is included.
243 Citations
22 Claims
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1. A semiconductor device comprising:
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a first element; a second element; an insulating layer over the first element and the second element; and a data holding portion comprising a transistor and a capacitor, wherein an output of the first element is electrically connected to an input of the second element, and an output of the second element is electrically connected to an input of the first element, wherein each of the first element and the second element comprises a transistor whose channel formation region includes crystalline silicon, wherein a channel formation region of the transistor of the data holding portion includes an oxide semiconductor layer over the insulating layer, wherein one of a source and a drain of the transistor of the data holding portion is electrically connected to one of a pair of electrodes of the capacitor, and wherein the other of the source and the drain of the transistor of the data holding portion is electrically connected to the input of the first element and a wiring supplied with an input signal. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A semiconductor device comprising:
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a first element; a second element; an insulating layer over the first element and the second element; and a data holding portion comprising a first transistor, a second transistor, a first capacitor and a second capacitor, wherein an output of the first element is electrically connected to an input of the second element, and an output of the second element is electrically connected to an input of the first element, wherein each of the first element and the second element comprises a transistor whose channel formation region includes crystalline silicon, wherein a channel formation region of each of the first transistor and the second transistor includes an oxide semiconductor layer over the insulating layer, wherein one of a source and a drain of the first transistor is electrically connected to one of a pair of electrodes of the first capacitor, wherein one of a source and a drain of the second transistor is electrically connected to one of a pair of electrodes of the second capacitor, wherein the other of the source and the drain of the first transistor is electrically connected to the input of the first element, and wherein the other of the source and the drain of the second transistor is electrically connected to the output of the first element. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15)
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16. A semiconductor device comprising:
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a first element; a second element; an insulating layer over the first element and the second element; and a data holding portion comprising a transistor and a capacitor, wherein an output of the first element is electrically connected to an input of the second element, and an output of the second element is electrically connected to an input of the first element, wherein each of the first element and the second element comprises a transistor whose channel formation region is in a crystalline silicon substrate, wherein a channel formation region of the transistor of the data holding portion includes an oxide semiconductor layer over the insulating layer, wherein one of a source and a drain of the transistor of the data holding portion is electrically connected to one of a pair of electrodes of the capacitor, and wherein the other of the source and the drain of the transistor of the data holding portion is electrically connected to the input of the first element and a wiring supplied with an input signal. - View Dependent Claims (17, 18, 19, 20, 21, 22)
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Specification