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Vapor phase growth apparatus and vapor phase growth method

  • US 10,385,474 B2
  • Filed: 08/23/2016
  • Issued: 08/20/2019
  • Est. Priority Date: 08/28/2015
  • Status: Active Grant
First Claim
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1. A vapor phase growth apparatus comprising:

  • n (n is an integer equal to or greater than

         2) reactors performing a deposition process for a plurality of substrates at the same time;

    a first main gas supply path distributing an amount of first process gas including a group-III element and supplying the first process gas to the n reactors at the same time;

    a second main gas supply path distributing an amount of second process gas including a group-V element and supplying the second process gas to the n reactors at the same time;

    a controller controlling a flow rate of the first process gas and a flow rate of the second process gas, on the basis of control values of flow rates of the first process gas and the second process gas supplied to the n reactors, the controller independently controlling at least one process parameter in the n reactors, on the basis of control values of the at least one process parameter independently set for each of the n reactors;

    a rotary driver provided in each of the n reactors and rotating each of the plurality of substrates; and

    a heater provided in each of the n reactors and heating each of the plurality of substrates, whereinthe controller includes a calculator that obtains information about a correlation between characteristics of a film including film thickness and film composition obtained in each of the n reactors and the at least one process parameter in advance, and the calculator calculates the control values of the at least one process parameter from the obtained information for each of the n reactors.

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