Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process

• US 10,391,605 B2
• Filed: 10/06/2016
• Issued: 08/27/2019
• Est. Priority Date: 01/19/2016
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Ganapathiappan, Sivapackia, Fu, Boyi, Chockalingam, Ashwin, Redfield, Daniel, Bajaj, Rajeev, Orilall, Mahendra C., Ng, Hou T., Fung, Jason G., Yamamura, Mayu
• Primary Examiner(s): Dunn, Colleen P
• Assistant Examiner(s): Christie, Ross J
• Application Number:
  US15/287,665
• Publication Number:
  US 20170203408A1
• Time in Patent Office: 1,055 Days
• Field of Search: None
• CPC Class Codes: B24B 37/24 characterised by the composition or properties of the pad materials

Abstract

Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, addition polymer precursor compounds, catalysts, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one polymer precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. Embodiments of the disclosure further provide a polishing pad with polymeric layers that may be interpenetrating polymer networks.

Claims

1. A polishing article, comprising:

a first polishing element formed of a plurality of sequentially formed layers, wherein the plurality of sequentially formed layers comprise;

a first layer, comprising;

a first pattern of porosity-forming agent containing regions that are disposed on a surface on which the first layer is formed; and

a first structural material containing region, wherein the first structural material containing region is disposed on the surface and between adjacently positioned porosity-forming agent containing regions of the first pattern; and

a second layer disposed on a surface of the first layer, the second layer comprising;

a second pattern of porosity-forming agent containing regions that are disposed on the surface of the first layer; and

a second structural material containing region, wherein the second structural material containing region is disposed on the surface of the first layer and between adjacently positioned porosity-forming agent containing regions of the second pattern, and wherein the first and the second structural material containing regions each comprise a material that is formed from a first resin precursor component, a second resin precursor component, and a first curing agent.

2. The polishing article of claim 1, wherein the first pattern and the second pattern of porosity-forming agent containing regions each comprise a porosity-forming agent material that degrades when exposed to an aqueous solution.

3. The polishing article of claim 2, wherein the porosity-forming agent material further comprises an acrylate.

4. The polishing article of claim 1, wherein the first and the second structural material containing regions each comprise a material that comprises an acrylate.

5. The polishing article of claim 1, wherein a structural material formed within the first structural material containing region has a gradient in material composition in at least one direction parallel to the surface on which the first layer is formed.

6. The polishing article of claim 5, wherein a structural material formed within the second structural material containing region has a gradient in material composition in at least one direction parallel to the surface of the first layer.

7. The polishing article of claim 1, wherein the first pattern of porosity-forming agent containing regions is staggered a distance from the second pattern of porosity-forming agent containing regions in a direction parallel to the surface of the first layer.

10. The polishing article of claim 1, wherein the first and the second structural material containing regions each comprise a material formed by partially curing an amount of a first precursor formulation that comprises a multifunctional urethane oligomer, a polyester acrylate oligomer, a polyether acrylate oligomer, an epoxy acrylate oligomer, a monofunctional acrylate monomer or a multifunctional acrylate monomer.

11. The polishing article of claim 1, wherein

the first structural material containing region is formed by dispensing and curing a plurality of droplets that are disposed on the surface on which the first layer is formed,

the cured droplets have a contact angle relative to the surface that is greater than or equal to 50 degrees,

the second structural material containing region is formed by dispensing and curing a plurality of droplets that are disposed on the surface of the first layer, and

wherein the cured droplets have a contact angle relative to the surface that is greater than or equal to 50 degrees.

12. The polishing article of claim 1, further comprising:

one or more second polishing elements that each comprise a plurality of polymer layers that have a material composition that is different from the first and the second layers, wherein at least a region of each of the one or more second polishing elements is disposed between the first polishing element and a supporting surface of the polishing article.

8. A polishing article, comprising:

a first polishing element formed of a plurality of sequentially formed layers, wherein the plurality of sequentially formed layers comprise;

a first layer, comprising;

a first pattern of porosity-forming agent containing regions that are disposed on a surface on which the first layer is formed; and

a first structural material containing region, wherein the first structural material containing region is disposed on the surface and between adjacently positioned porosity-forming agent containing regions of the first pattern; and

a second layer disposed on a surface of the first layer, the second layer comprising;

a second pattern of porosity-forming agent containing regions that are disposed on the surface of the first layer; and

a second structural material containing region, wherein the second structural material containing region is disposed on the surface of the first layer and between adjacently positioned porosity-forming agent containing regions of the second pattern,

wherein the first and the second structural material containing regions each comprise a material that is formed from a resin precursor component that comprises an aliphatic multifunctional urethane acrylate that has a functionality that is greater than or equal to 2.

9. A polishing article, comprising:

a first polishing element formed of a plurality of sequentially formed layers, wherein the plurality of sequentially formed layers comprise;

a first layer, comprising;

a first pattern of porosity-forming agent containing regions that are disposed on a surface on which the first layer is formed; and

a first structural material containing region, wherein the first structural material containing region is disposed on the surface and between adjacently positioned porosity-forming agent containing regions of the first pattern; and

a second layer disposed on a surface of the first layer, the second layer comprising;

a second pattern of porosity-forming agent containing regions that are disposed on the surface of the first layer; and

a second structural material containing region, wherein the second structural material containing region is disposed on the surface of the first layer and between adjacently positioned porosity-forming agent containing regions of the second pattern,

wherein the first and the second structural material containing regions each comprise a material that is formed from a first amount of an oligomer and a second amount of a monomer, and a ratio of the first amount to the second amount by weight is from about 3;

1 to about 1;

3.