Wire lineend to via overlap optimization

• US 10,394,992 B2
• Filed: 11/07/2017
• Issued: 08/27/2019
• Est. Priority Date: 11/07/2017
• Status: Active Grant

• Current Assignee: International Business Machines Corporation
• Original Assignee: International Business Machines Corporation
• Inventors: Topaloglu, Rasit O.
• Primary Examiner(s): Lin, Sun J
• Application Number:
  US15/805,178
• Publication Number:
  US 20190138681A1
• Time in Patent Office: 658 Days
• Field of Search: 716 50, 716 54, 716 55
• CPC Class Codes: G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
• CPC Class Codes: G03F 7/2022 Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
• CPC Class Codes: G06F 2111/20 Configuration CAD, e.g. designing by assembling or positioning modules selected from libraries of predesigned modules
• CPC Class Codes: G06F 2119/18 Manufacturability analysis or optimisation for manufacturability
• CPC Class Codes: G06F 30/39 Circuit design at the physical level physical level design for reconfigurable circuits G06F30/347
• CPC Class Codes: Y02P 90/02 Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Abstract

An approach for shifting a cut associated with a lineend of an interconnect in a manufacturing system. The approach selects one or more polygons associated with the lineend and determines whether a first cut is spanning the one or more polygons. The approach responds to the first cut does span, determines a presence of a first via on a first interconnect and determines a first distance of the first via to the first cut. The approach determines whether the first distance is greater than a first threshold and responds to the first distance is greater and determines whether the first distance is greater and determines a second distance of the first cut to a second cut. The approach determines whether the second distance is greater than a second threshold and responds to the second distance is greater and generates a shift associated with the first cut and outputs the shift.

Claims

1. A computer-implemented method for shifting a cut associated with a lineend of an interconnect in an advanced manufacturing system, the method comprising:

selecting, by a circuit design component, one or more polygons associated with a lineend of an interconnect;

determining, by the circuit design component, whether a first cut is spanning the one or more polygons;

determining, by the circuit design component, a presence of a first via on a first interconnect;

determining, by the circuit design component, a first distance of the first via to the first cut;

determining, by the circuit design component, whether the first distance is greater than a first pre-determined threshold;

determining, by the circuit design component, a second distance of the first cut to a second cut;

determining, by the circuit design component, whether the second distance is greater than a second pre-determined threshold;

generating, by the circuit design component, a shift associated with the first cut; and

outputting, by the circuit design component, the shift for moving the first cut.

2. The method of claim 1, wherein the determining whether the first cut is spanning the one or more polygons comprises:

identifying, by the circuit design component, a location of the first cut;

identifying, by the circuit design component, a location of one or more lineends; and

determining, by the circuit design component, whether the first cut intersects the one or more lineends.

3. The method of claim 1, further comprising:

determining, by the circuit design component, whether there is a second via on a second interconnect;

determining, by the circuit design component, whether the second distance is greater than the second pre-determined threshold;

generating, by the circuit design component, a shift associated with the second cut; and

outputting, by the circuit design component, the shift for moving the second cut.

4. The method of claim 1, further comprises:

determining, by the circuit design component, whether there is a second via on a second interconnect;

determining, by the circuit design component, a third distance of the second via to the second cut;

determining, by the circuit design component, whether the third distance is greater than the first pre-determined threshold;

determining, by the circuit design component, whether the second distance is greater than the second pre-determined threshold;

generating, by the circuit design component, a shift associated with the second cut; and

outputting, by the circuit design component, the shift for moving the second cut.

5. The method of claim 4, wherein the outputting the shift for moving the first cut comprises:

creating, by the circuit design component, a cut mask that is used to manufacture a semiconductor chip based on the shift for moving the first cut.

6. The method of claim 1, wherein the determining the first distance of the first via to the first cut comprises:

identifying, by the circuit design component, a location of the first via;

identifying, by the circuit design component, a location of the first cut; and

calculating, by the circuit design component, the first distance of the first via to the first cut.

7. The method of claim 1, wherein the determining the second distance of the first cut to the second cut comprises:

identifying, by the circuit design component, a location of the first cut;

identifying, by the circuit design component, a location of the second cut; and

calculating, by the circuit design component, the second distance of the first cut to the second cut.

8. A computer program product for shifting a cut associated with a lineend of an interconnect in an advanced manufacturing system, the computer program product comprising:

one or more non-transitory computer readable storage media and program instructions stored thereon program instructions which, when executed by one or more computer processors, cause the one or more processors to perform actions comprising;

selecting one or more polygons associated with a lineend of an interconnect;

determining whether a first cut is spanning the one or more polygons;

determining a presence of a first via on a first interconnect;

determining a first distance of the first via to the first cut;

determining whether the first distance is greater than a first pre-determined threshold;

determining a second distance of the first cut to a second cut;

determining whether the second distance is greater than a second pre-determined threshold;

generating a shift associated with the first cut; and

outputting the shift for moving the first cut.

9. The computer program product of claim 8, wherein the determining whether the first cut is spanning the one or more polygons comprises:

identifying a location of the first cut;

identifying a location of one or more lineends; and

determining whether the first cut intersects the one or more lineends.

10. The computer program product of claim 8, the instructions further cause the one or more processors to perform actions comprising:

determining whether there is a second via on a second interconnect;

determining whether the second distance is greater than the second pre-determined threshold;

generating a shift associated with the second cut; and

outputting the shift for moving the second cut.

13. The computer program product of claim 8, wherein the determining the first distance of the first via to the first cut comprises:

identifying a location of the first via;

identifying a location of the first cut; and

calculating the distance of the first via to the first cut.

14. The computer program product of claim 8, wherein the determining the second distance of the first cut to the second cut comprises:

identifying a location of the first cut;

identifying a location of the second cut; and

calculating the second distance of the first cut to the second cut.

11. The computer program product of 8, the instructions further cause the one or more processors to perform actions comprising:

determining whether there is a second via on a second interconnect;

determining a third distance of the second via to the second cut;

determining whether the third distance is greater than the first pre-determined threshold;

determining whether the second distance is greater than the second pre-determined threshold;

generating a shift associated with the second cut; and

outputting the shift for moving the second cut.

12. The computer program product of claim 11, wherein the outputting the shift for moving the first cut comprises:

creating a cut mask that is used to manufacture a semiconductor chip based on the shift for moving the first cut.

15. A computer system for shifting a cut associated with a lineend of an interconnect in an advanced manufacturing system, the computer system comprising:

one or more computer processors;

one or more computer non-transitory readable storage media;

program instructions stored on the one or more non-transitory computer readable storage media for causing the one or more computer processors to execute actions comprising;

select one or more polygons associated with a lineend of an interconnect;

determining whether a first cut is spanning the one or more polygons;

determining a presence of a first via on a first interconnect;

determining a first distance of the first via to the first cut;

determining whether the first distance is greater than a first pre-determined threshold;

determining a second distance of the first cut to a second cut;

determining whether the second distance is greater than the second pre-determined threshold;

generating a shift associated with the first cut; and

outputting the shift for moving the first cut.

16. The computer system of claim 15, wherein the determining whether the first cut is spanning the one or more polygons comprises:

identifying a location of the first cut;

identifying a location of one or more lineends; and

determining whether the first cut intersects the one or more lineends.

17. The computer system of claim 15, the instructions further cause the one or more processors to perform actions comprising:

determining whether there is a second via on a second interconnect;

determining whether the second distance is greater than the second pre-determined threshold;

generating a shift associated with the second cut; and

outputting the shift for moving the second cut.

19. The computer system of claim 15, wherein the determining the first distance of the first via to the first cut comprises:

identifying a location of the first via;

identifying a location of the first cut; and

calculating the distance of the first via to the first cut.

20. The computer system of claim 15, wherein the outputting the shift for moving the first cut comprises:

creating a cut mask that is used to manufacture a semiconductor chip based on the shift for moving the first cut.

18. The computer system of 15, the instructions further cause the one or more processors to perform actions comprising:

determining whether there is a second via on a second interconnect;

determining a third distance of the second via to the second cut;

determining whether the third distance is greater than the first pre-determined threshold;

determining whether the second distance is greater than the second pre-determined threshold;

generating a shift associated with the second cut; and

outputting the shift for moving the second cut.