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Advanced polishing pads having compositional gradients by use of an additive manufacturing process

  • US 10,399,201 B2
  • Filed: 10/17/2016
  • Issued: 09/03/2019
  • Est. Priority Date: 10/17/2014
  • Status: Active Grant
First Claim
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1. A polishing article having a polishing surface that is configured to polish a surface of a substrate during a polishing process, comprising:

  • an array of first polishing elements that are distributed in a first pattern, whereineach of the first polishing elements is formed of a stacked plurality of first polymer layers,a surface of at least one of the plurality of first polymer layers forms the polishing surface,each of the first polymer layers comprises a plurality of first material containing regions and a plurality of second material containing regions,the second material containing regions are formed from a resin precursor component comprising an aliphatic multifunctional urethane acrylate having a functionality that is greater than or equal to 2, anda ratio of the first material containing regions to the second material containing regions within at least a portion of each of the first polishing elements varies across a first plane that is parallel to the polishing surface; and

    one or more second polishing elements formed of a stacked plurality of second polymer layers, wherein each of the second polymer layers comprises a plurality of the first material containing regions.

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