Advanced polishing pads having compositional gradients by use of an additive manufacturing process
First Claim
1. A polishing article having a polishing surface that is configured to polish a surface of a substrate during a polishing process, comprising:
- an array of first polishing elements that are distributed in a first pattern, whereineach of the first polishing elements is formed of a stacked plurality of first polymer layers,a surface of at least one of the plurality of first polymer layers forms the polishing surface,each of the first polymer layers comprises a plurality of first material containing regions and a plurality of second material containing regions,the second material containing regions are formed from a resin precursor component comprising an aliphatic multifunctional urethane acrylate having a functionality that is greater than or equal to 2, anda ratio of the first material containing regions to the second material containing regions within at least a portion of each of the first polishing elements varies across a first plane that is parallel to the polishing surface; and
one or more second polishing elements formed of a stacked plurality of second polymer layers, wherein each of the second polymer layers comprises a plurality of the first material containing regions.
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Abstract
Embodiments herein relate to advanced polishing pads with tunable chemical, material and structural properties, and manufacturing methods related thereto. According to one or more embodiments herein, a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments herein thus may provide an advanced polishing pad having discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, addition polymer precursor compounds, catalysts, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one polymer precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. Embodiments herein further provide a polishing pad with polymeric layers that may be interpenetrating polymer networks.
260 Citations
21 Claims
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1. A polishing article having a polishing surface that is configured to polish a surface of a substrate during a polishing process, comprising:
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an array of first polishing elements that are distributed in a first pattern, wherein each of the first polishing elements is formed of a stacked plurality of first polymer layers, a surface of at least one of the plurality of first polymer layers forms the polishing surface, each of the first polymer layers comprises a plurality of first material containing regions and a plurality of second material containing regions, the second material containing regions are formed from a resin precursor component comprising an aliphatic multifunctional urethane acrylate having a functionality that is greater than or equal to 2, and a ratio of the first material containing regions to the second material containing regions within at least a portion of each of the first polishing elements varies across a first plane that is parallel to the polishing surface; and one or more second polishing elements formed of a stacked plurality of second polymer layers, wherein each of the second polymer layers comprises a plurality of the first material containing regions. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 12, 13, 14)
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11. A polishing article having a polishing surface that is configured to polish a surface of a substrate during a polishing process, comprising
an array of first polishing elements that are distributed in a first pattern, wherein each of the first polishing elements is formed of a stacked plurality of first polymer layers, a surface of at least one of the plurality of first polymer layers forms the polishing surface, each of the first polymer layers comprises a plurality of first material containing regions and a plurality of second material containing regions, the first and the second material containing regions each comprise a material that is formed from a first amount of an oligomer and a second amount of a monomer, and a ratio of the first amount to the second amount by weight is from about 3: - 1 to about 1;
3, anda ratio of the first material containing regions to the second material containing regions within at least a portion of each of the first polishing elements varies across a first plane that is parallel to the polishing surface; and one or more second polishing elements formed of a stacked plurality of second polymer layers, wherein each of the second polymer layers comprise a plurality of the first material containing regions.
- 1 to about 1;
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15. A method of forming a polishing article, comprising sequentially forming a plurality of polymer layers, wherein forming the plurality of polymer layers comprises:
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forming a first layer of a plurality of first polishing elements of the polishing article, wherein forming the first layer comprises; forming a first pattern of first material containing regions on a surface on which the first layer is formed; and forming a second pattern of second material containing regions on the surface on which the first layer is formed, wherein the first layer comprises a first ratio of the first material containing regions to the second material containing regions, and the first and the second material containing regions each comprises a material that is formed from a first resin precursor component that comprises an aliphatic multifunctional urethane acrylate that has a functionality that is greater than or equal to 2; and forming a second layer of the plurality of first polishing elements, wherein the formed second layer is disposed on a surface of the first layer and comprises; forming a third pattern of first material containing regions on the surface of the first layer; and forming a fourth pattern of second material containing regions on the surface of the first layer, wherein second layer comprises a second ratio of the first material containing regions to the second material containing regions, and the first ratio is different from the second ratio. - View Dependent Claims (16, 17, 18, 19, 20, 21)
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Specification